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Class Information
Number: 257/E21.528
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Testing or measuring during manufacture or treatment or reliability measurement, i.e., testing of parts followed by no processing which modifies parts as such (epo) > Procedures, i.e., sequence of activities consisting of plurality of measurement and correction, marking or sorting steps (epo) > Acting in response to ongoing measurement without interruption of processing, e.g., endpoint detection, in-situ thickness measurement (epo)
Description: This subclass is indented under subclass E21.525. This subclass is substantially the same in scope as ECLA classification H01L21/66P6.

Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
8685265 Manufacturing method of semiconductor device and semiconductor manufacturing apparatus Apr. 1, 2014
8546152 Enhanced endpoint detection in non-volatile memory fabrication processes Oct. 1, 2013
8532796 Contact processing using multi-input/multi-output (MIMO) models Sep. 10, 2013
8507297 Packaging and testing of multiple MEMS devices on a wafer Aug. 13, 2013
8501499 Adaptive recipe selector Aug. 6, 2013
8465589 Machine and process for sequential multi-sublayer deposition of copper indium gallium diselenide compound semiconductors Jun. 18, 2013
8445296 Apparatus and methods for end point determination in reactive ion etching May. 21, 2013
8420498 Alignment method of chips Apr. 16, 2013
8367429 Adaptive endpoint method for pad life effect on chemical mechanical polishing Feb. 5, 2013
8350393 Apparatus and method for predetermined component placement to a target platform Jan. 8, 2013
8288174 Electrostatic post exposure bake apparatus and method Oct. 16, 2012
8252608 Measurement of a sample using multiple models Aug. 28, 2012
8244482 Photometrically modulated delivery of reagents Aug. 14, 2012
8202738 Endpoint method using peak location of modified spectra Jun. 19, 2012
8193007 Etch process control using optical metrology and sensor devices Jun. 5, 2012
8173451 Etch stage measurement system May. 8, 2012
8173450 Method of designing an etch stage measurement system May. 8, 2012
8173037 Wafer polish monitoring method and device May. 8, 2012
8163571 Multi-step deposition control Apr. 24, 2012
8143074 Semiconductor processing system and method of processing a semiconductor wafer Mar. 27, 2012
8110412 Integrated circuit wafer system with control strategy Feb. 7, 2012
8101513 Manufacture method for semiconductor device using damascene method Jan. 24, 2012
8053256 Variable thickness single mask etch process Nov. 8, 2011
8043870 CMP pad thickness and profile monitoring system Oct. 25, 2011
7993937 DC and RF hybrid processing system Aug. 9, 2011
7977199 Method for measuring dopant concentration during plasma ion implantation Jul. 12, 2011
7968353 Apparatus and methods for manufacturing thin-film solar cells Jun. 28, 2011
7911016 Method and structure for fabricating multiple tiled regions onto a plate using a controlled cleaving process Mar. 22, 2011
7892860 Semiconductor laser chip and method of formation thereof Feb. 22, 2011
7871828 In-situ dose monitoring using optical emission spectroscopy Jan. 18, 2011
7795045 Trench depth monitor for semiconductor manufacturing Sep. 14, 2010
7791085 Semiconductor light emitting apparatus Sep. 7, 2010
7780503 Polishing apparatus and polishing method Aug. 24, 2010
7713757 Method for measuring dopant concentration during plasma ion implantation May. 11, 2010
7701072 Semiconductor device and manufacturing method therefor Apr. 20, 2010
7700378 Method and system for line-dimension control of an etch process Apr. 20, 2010
7700377 Method for reducing etch-induced process uniformities by omitting deposition of an endpoint detection layer during patterning of stressed overlayers in a semiconductor device Apr. 20, 2010
7695984 Use of modeled parameters for real-time semiconductor process metrology applied to semiconductor processes Apr. 13, 2010
7695986 Method and apparatus for modifying process selectivities based on process state information Apr. 13, 2010
7682847 Method for sorting integrated circuit devices Mar. 23, 2010
7682844 Silicon substrate processing method for observing defects in semiconductor devices and defect-detecting method Mar. 23, 2010
7682843 Semiconductor fabrication system, and flow rate correction method and program for semiconductor fabrication system Mar. 23, 2010
7622317 Light emitting diode and method for manufacturing the same Nov. 24, 2009
7605008 Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma Oct. 20, 2009
7588946 Controlling system for gate formation of semiconductor devices Sep. 15, 2009
7572647 Internal balanced coil for inductively coupled high density plasma processing chamber Aug. 11, 2009
7405091 Method for testing contact open in semicoductor device Jul. 29, 2008
7364993 Method of enhancing the photoconductive properties of a semiconductor Apr. 29, 2008
7358187 Coating process for patterned substrate surfaces Apr. 15, 2008
7169625 Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring Jan. 30, 2007

1 2 3 4 5 6 7 8

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