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Class Information
Number: 257/E21.487
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body other than carbon, si, ge, sic, se, te, cu 2 o, cui, and group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than electromagnetic radiation (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic techniques; post treatment of these layers (epo)
Description: This subclass is indented under subclass E21.483. This subclass is substantially the same in scope as ECLA classification H01L21/469.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.493 Inorganic layer (epo) 41
257/E21.492 Organic layer, e.g., photoresist (epo) 37
257/E21.489 Post treatment of insulating layer (epo) 24
257/E21.488 Using mask (epo) 12


Patents under this class:
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Patent Number Title Of Patent Date Issued
8709853 Method of manufacturing crystalline silicon solar cells with improved surface passivation Apr. 29, 2014
8618003 Method of making electronic devices using selective deposition Dec. 31, 2013
8592946 Lithography for printing constant line width features Nov. 26, 2013
8513754 Solar cell, method of forming emitter layer of solar cell, and method of manufacturing solar cell Aug. 20, 2013
8487411 Multiple patterning using improved patternable low-.kappa. dielectric materials Jul. 16, 2013
8409894 Solid state light emitting semiconductor structure and epitaxy growth method thereof Apr. 2, 2013
8304353 Silicon dioxide deposition methods using at least ozone and TEOS as deposition precursors Nov. 6, 2012
8299565 Semiconductor nanowires having mobility-optimized orientations Oct. 30, 2012
8252697 Zinc-tin oxide thin-film transistors Aug. 28, 2012
8242004 Semiconductor device and method of fabricating the same Aug. 14, 2012
8232211 Methods for self-aligned self-assembled patterning enhancement Jul. 31, 2012
8227358 Silicon precursors and method for low temperature CVD of silicon-containing films Jul. 24, 2012
8216927 Method of reducing contamination by providing a removable polymer protection film during microstructure processing Jul. 10, 2012
8168546 Method for selective deposition and devices May. 1, 2012
8163658 Multiple patterning using improved patternable low-k dielectric materials Apr. 24, 2012
8158467 Liquid crystal display device and method of fabricating the same Apr. 17, 2012
8030219 Dielectric coatings and use in capacitors Oct. 4, 2011
8003547 Method of manufacturing semiconductor device Aug. 23, 2011
7998878 Method for selective deposition and devices Aug. 16, 2011
7977257 Methods of manufacturing semiconductor devices Jul. 12, 2011
7972980 Method of forming conformal dielectric film having Si-N bonds by PECVD Jul. 5, 2011
7960291 Porous organosilicate layers, and vapor deposition systems and methods for preparing same Jun. 14, 2011
7955962 Method of reducing contamination by providing a removable polymer protection film during microstructure processing Jun. 7, 2011
7919416 Method of forming conformal dielectric film having Si-N bonds by PECVD Apr. 5, 2011
7880859 Substrate processing system and substrate processing method Feb. 1, 2011
7825037 Fabrication of enclosed nanochannels using silica nanoparticles Nov. 2, 2010
7820458 Test structures and methods Oct. 26, 2010
7821072 Semiconductor device comprising a stress applying insulating film Oct. 26, 2010
7803706 Semiconductor device manufacturing method and semiconductor device Sep. 28, 2010
7803720 Coating process and equipment for reduced resist consumption Sep. 28, 2010
7803722 Methods for forming a dielectric layer within trenches Sep. 28, 2010
7799704 Gas baffle and distributor for semiconductor processing chamber Sep. 21, 2010
7781352 Method for forming inorganic silazane-based dielectric film Aug. 24, 2010
7781311 System and method for filling vias Aug. 24, 2010
7723815 Wafer bonded composite structure for thermally matching a readout circuit (ROIC) and an infrared detector chip both during and after hybridization May. 25, 2010
7696108 Method of forming shadow layer on the wafer bevel Apr. 13, 2010
7678711 Semiconductor device, and method and apparatus for manufacturing the same Mar. 16, 2010
7670961 Reduction of cracking in low-k spin-on dielectric films Mar. 2, 2010
7645713 Substrate processing system and substrate processing method Jan. 12, 2010
7572735 Blanket resist to protect active side of semiconductor Aug. 11, 2009
7521380 Methods for fabricating a stress enhanced semiconductor device having narrow pitch and wide pitch transistors Apr. 21, 2009
7488678 Method of manufacturing interconnect substrate Feb. 10, 2009
7427570 Porous organosilicate layers, and vapor deposition systems and methods for preparing same Sep. 23, 2008
7312138 Semiconductor device and method of manufacture thereof Dec. 25, 2007
7303962 Fabricating method of CMOS and MOS device Dec. 4, 2007
7288424 Integrated driver process flow Oct. 30, 2007
7259109 Electrospray and enhanced electrospray deposition of thin films on semiconductor substrates Aug. 21, 2007
7238628 Energy conversion and storage films and devices by physical vapor deposition of titanium and titanium oxides and sub-oxides Jul. 3, 2007
5747389 Crack resistant passivation layer May. 5, 1998
5599733 Method using cadmium-rich CdTe for lowering the metal vacancy concentrations of HgCdTe surfaces Feb. 4, 1997

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