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Class Information
Number: 257/E21.486
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body other than carbon, si, ge, sic, se, te, cu 2 o, cui, and group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than electromagnetic radiation (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Using mask (epo)
Description: This subclass is indented under subclass E21.485. This subclass is substantially the same in scope as ECLA classification H01L21/467.

Patents under this class:

Patent Number Title Of Patent Date Issued
8501528 Radiofrequency plasma reactor and method for manufacturing vacuum process treated substrates Aug. 6, 2013
8440575 Method of fabricating semiconductor device May. 14, 2013
8415257 Enhanced adhesion of PECVD carbon on dielectric materials by providing an adhesion interface Apr. 9, 2013
8377730 Method of manufacturing vertically aligned nanotubes, method of manufacturing sensor structure, and sensor element manufactured thereby Feb. 19, 2013
8329492 Micro electronic device and method for fabricating micro electromechanical system resonator thereof Dec. 11, 2012
8222152 Method for fabricating hole pattern Jul. 17, 2012
8202802 Method of fabricating semiconductor device Jun. 19, 2012
8124542 Method of fabricating semiconductor device Feb. 28, 2012
8039340 Methods of forming an array of memory cells, methods of forming a plurality of field effect transistors, methods of forming source/drain regions and isolation trenches, and methods of forming Oct. 18, 2011
7981812 Methods for forming ultra thin structures on a substrate Jul. 19, 2011
7935641 Thin film etching method May. 3, 2011
7741227 Process for structuring at least one year as well as electrical component with structures from the layer Jun. 22, 2010
7655562 Method of manufacturing semiconductor memory device Feb. 2, 2010
7615482 Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength Nov. 10, 2009
7585780 Method for manufacturing semiconductor device Sep. 8, 2009
7488687 Methods of forming electrical interconnect structures using polymer residues to increase etching selectivity through dielectric layers Feb. 10, 2009
7265056 Method for forming novel BARC open for precision critical dimension control Sep. 4, 2007
6589447 Compound semiconductor single crystal and fabrication process for compound semiconductor device Jul. 8, 2003
6252769 Device for increasing heat transfer Jun. 26, 2001
5647954 Manufacture of etched substrates such as infrared detectors Jul. 15, 1997
5236537 Plasma etching apparatus Aug. 17, 1993
5194119 Method of anisotropic dry etching of thin film semiconductors Mar. 16, 1993
5157000 Method for dry etching openings in integrated circuit layers Oct. 20, 1992
5145554 Method of anisotropic dry etching of thin film semiconductors Sep. 8, 1992
5133830 Method of pretreatment and anisotropic dry etching of thin film semiconductors Jul. 28, 1992
5017511 Method for dry etching vias in integrated circuit layers May. 21, 1991
4435462 Infra-red detector elements Mar. 6, 1984
4414066 Electrochemical photoetching of compound semiconductors Nov. 8, 1983
4391683 Mask structures for photoetching procedures Jul. 5, 1983
4321615 Manufacture of an infra-red detector element, and detection elements so manufactured Mar. 23, 1982
4310583 Manufacture of a group of infra-red detector elements, and a group so manufactured Jan. 12, 1982
4301591 Method of manufacturing infra-red detector elements Nov. 24, 1981
3951728 Method of treating semiconductor wafers Apr. 20, 1976

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