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Class Information
Number: 257/E21.483
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body other than carbon, si, ge, sic, se, te, cu 2 o, cui, and group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than electromagnetic radiation (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo)
Description: This subclass is indented under subclass E21.482. This subclass is substantially the same in scope as ECLA classification H01L21/461.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.485 Chemical or electrical treatment, e.g., electrolytic etching (epo) 107
257/E21.495 Deposition of noninsulating, e.g., conductive -, resistive -, layer on insulating layer (epo) 132
257/E21.484 Mechanical treatment, e.g., grinding, ultrasonic treatment (epo) 14
257/E21.487 To form insulating layer thereon, e.g., for masking or by using photolithographic techniques; post treatment of these layers (epo) 51

Patents under this class:
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Patent Number Title Of Patent Date Issued
7410901 Submicron device fabrication Aug. 12, 2008
7410814 Process and apparatus for cleaning silicon wafers Aug. 12, 2008
7402530 Method for manufacturing semiconductor device and semiconductor device Jul. 22, 2008
7378349 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method May. 27, 2008
7375024 Method for fabricating metal interconnection line with use of barrier metal layer formed in low temperature May. 20, 2008
7335575 Semiconductor constructions and semiconductor device fabrication methods Feb. 26, 2008
7312155 Forming self-aligned nano-electrodes Dec. 25, 2007
7303962 Fabricating method of CMOS and MOS device Dec. 4, 2007
7265053 Trench photolithography rework for removal of photoresist residue Sep. 4, 2007
7250317 Method of fabricating optical waveguide reflectors Jul. 31, 2007
7247577 Insulated pad conditioner and method of using same Jul. 24, 2007
5318666 Method for via formation and type conversion in group II and group VI materials Jun. 7, 1994
5214261 Method and apparatus for dicing semiconductor substrates using an excimer laser beam May. 25, 1993
5151389 Method for dicing semiconductor substrates using an excimer laser beam Sep. 29, 1992
5018164 Excimer laser ablation method and apparatus for microcircuit fabrication May. 21, 1991
4600469 Method for polishing detector material Jul. 15, 1986
4108716 Polishing of CdS crystals Aug. 22, 1978

1 2

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