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Class Information
Number: 257/E21.472
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body other than carbon, si, ge, sic, se, te, cu 2 o, cui, and group iii-v compounds with or without impurities, e.g., doping materials (epo) > Radiation treatment (epo) > With high-energy radiation (epo)
Description: This subclass is indented under subclass E21.471. This subclass is substantially the same in scope as ECLA classification H01L21/423.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.473 Producing ion implantation (epo) 48
257/E21.475 Using electromagnetic radiation, e.g., laser radiation (epo) 91


Patents under this class:

Patent Number Title Of Patent Date Issued
8535999 Stress memorization process improvement for improved technology performance Sep. 17, 2013
6479329 Method for producing semiconductor device Nov. 12, 2002
5937282 Method for producing semiconductor device Aug. 10, 1999
5712191 Method for producing semiconductor device Jan. 27, 1998
4526624 Enhanced adhesion of films to semiconductors or metals by high energy bombardment Jul. 2, 1985
4411732 Method of manufacturing a detector device Oct. 25, 1983
4406709 Method of increasing the grain size of polycrystalline materials by directed energy-beams Sep. 27, 1983
4128467 Method of ion etching Cd-Hg-Te semiconductors Dec. 5, 1978











 
 
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