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Class Information
Number: 257/E21.466
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body other than carbon, si, ge, sic, se, te, cu 2 o, cui, and group iii-v compounds with or without impurities, e.g., doping materials (epo) > Diffusion of impurity material, e.g., dopant, electrode material, into or out of semiconductor body, or between semiconductor regions (epo)
Description: This subclass is indented under subclass E21.459. This subclass is substantially the same in scope as ECLA classification H01L21/38.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.467 Using diffusion into or out of solid from or into gaseous phase (epo) 23
257/E21.469 Using diffusion into or out of solid from or into liquid phase, e.g., alloy diffusion process (epo) 13
257/E21.468 Using diffusion into or out of solid from or into solid phase, e.g., doped oxide layer (epo) 26


Patents under this class:

Patent Number Title Of Patent Date Issued
8642412 Method for manufacturing an oxide-based semiconductor thin film transistor (TFT) including out diffusing hydrogen or moisture from the oxide semiconductor layer into an adjacent insulating lay Feb. 4, 2014
8501521 Copper species surface treatment of thin film photovoltaic cell and manufacturing method Aug. 6, 2013
8497570 Wafer, fabricating method of the same, and semiconductor substrate Jul. 30, 2013
8476104 Sodium species surface treatment of thin film photovoltaic cell and manufacturing method Jul. 2, 2013
8435826 Bulk sulfide species treatment of thin film photovoltaic cell and manufacturing method May. 7, 2013
8394662 Chloride species surface treatment of thin film photovoltaic cell and manufacturing method Mar. 12, 2013
8324685 Semiconductor device having a fin-type semiconductor region Dec. 4, 2012
8273619 Methods of implanting dopant into channel regions Sep. 25, 2012
8258000 Bulk sodium species treatment of thin film photovoltaic cell and manufacturing method Sep. 4, 2012
8211736 Bulk copper species treatment of thin film photovoltaic cell and manufacturing method Jul. 3, 2012
8198122 Bulk chloride species treatment of thin film photovoltaic cell and manufacturing method Jun. 12, 2012
8193028 Sulfide species treatment of thin film photovoltaic cell and manufacturing method Jun. 5, 2012
8175131 Laser media with controlled concentration profile of active laser ions and method of making the same May. 8, 2012
8053867 Phosphorous-comprising dopants and methods for forming phosphorous-doped regions in semiconductor substrates using phosphorous-comprising dopants Nov. 8, 2011
8008111 Bulk copper species treatment of thin film photovoltaic cell and manufacturing method Aug. 30, 2011
8008112 Bulk chloride species treatment of thin film photovoltaic cell and manufacturing method Aug. 30, 2011
8008110 Bulk sodium species treatment of thin film photovoltaic cell and manufacturing method Aug. 30, 2011
8003430 Sulfide species treatment of thin film photovoltaic cell and manufacturing method Aug. 23, 2011
7943468 Penetrating implant for forming a semiconductor device May. 17, 2011
7923368 Junction formation on wafer substrates using group IV nanoparticles Apr. 12, 2011
7807555 Method of forming the NDMOS device body with the reduced number of masks Oct. 5, 2010
7767514 Methods of implanting dopant into channel regions Aug. 3, 2010
7737014 Reduction of boron diffusivity in pFETs Jun. 15, 2010
7727845 Ultra shallow junction formation by solid phase diffusion Jun. 1, 2010
7674670 Methods of forming threshold voltage implant regions Mar. 9, 2010
7670937 Method for producing doped regions in a substrate, and photovoltaic cell Mar. 2, 2010
7625812 Silicon nano wires, semiconductor device including the same, and method of manufacturing the silicon nano wires Dec. 1, 2009
7605064 Selective laser annealing of semiconductor material Oct. 20, 2009
7550358 MEMS device including a laterally movable portion with piezo-resistive sensing elements and electrostatic actuating elements on trench side walls, and methods for producing the same Jun. 23, 2009
7514318 Method for fabricating non-volatile memory cells Apr. 7, 2009
7442600 Methods of forming threshold voltage implant regions Oct. 28, 2008
7396745 Formation of ultra-shallow junctions by gas-cluster ion irradiation Jul. 8, 2008
7262119 Method for incorporating germanium into a semiconductor wafer Aug. 28, 2007
7192853 Method of improving the breakdown voltage of a diffused semiconductor junction Mar. 20, 2007
5252499 Wide band-gap semiconductors having low bipolar resistivity and method of formation Oct. 12, 1993
5227328 Method of producing epitaxial layers of II-VI semiconductors with high acceptor concentrations Jul. 13, 1993
5024967 Doping procedures for semiconductor devices Jun. 18, 1991
4904618 Process for doping crystals of wide band gap semiconductors Feb. 27, 1990
4105472 Preparation of silicon doped mercury cadmium telluride Aug. 8, 1978
4087293 Silicon as donor dopant in Hg.sub.1-x Cd.sub.x Te May. 2, 1978
4053350 Methods of defining regions of crystalline material of the group III-V compounds Oct. 11, 1977
4038110 Planarization of integrated circuit surfaces through selective photoresist masking Jul. 26, 1977











 
 
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