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Class Information
Number: 257/E21.461
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body other than carbon, si, ge, sic, se, te, cu 2 o, cui, and group iii-v compounds with or without impurities, e.g., doping materials (epo) > Deposition of semiconductor material on substrate, e.g., epitaxial growth (epo)
Description: This subclass is indented under subclass E21.459. This subclass is substantially the same in scope as ECLA classification H01L21/36.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.464 Using liquid deposition (epo) 78
257/E21.462 Using physical deposition, e.g., vacuum deposition, sputtering (epo) 117
257/E21.463 Using reduction or decomposition of gaseous compound yielding solid condensate, i.e., chemical deposition (epo) 104

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8652870 Method of fabricating CIGS by selenization at high temperature Feb. 18, 2014
8647929 Semiconductor devices and methods of manufacturing thereof Feb. 11, 2014
8647941 Method of forming semiconductor device Feb. 11, 2014
8642452 Semiconductor-on-insulator device with asymmetric structure Feb. 4, 2014
8629432 Semiconductor device and manufacturing method thereof Jan. 14, 2014
8617966 Methods of forming a span comprising silicon dioxide Dec. 31, 2013
RE44657 Semiconductor device Dec. 24, 2013
8610119 Stability enhancements in metal oxide semiconductor thin film transistors Dec. 17, 2013
8610120 Liquid crystal display device and manufacturing method thereof Dec. 17, 2013
8597977 Semiconductor device and method for manufacturing the same Dec. 3, 2013
8598018 Forming an electrode having reduced corrosion and water decomposition on surface using a custom oxide layer Dec. 3, 2013
8586457 Method of fabricating high efficiency CIGS solar cells Nov. 19, 2013
8541803 Cadmium-free re-emitting semiconductor construction Sep. 24, 2013
8536570 Composition for oxide thin film, preparation method of the composition, methods for forming the oxide thin film using the composition, and electronic device using the composition Sep. 17, 2013
8536618 Light emitting diode structure utilizing zinc oxide nanorod arrays on one or more surfaces, and a low cost method of producing such zinc oxide nanorod arrays Sep. 17, 2013
8529802 Solution composition and method of forming thin film and method of manufacturing thin film transistor using the solution composition Sep. 10, 2013
8530893 Display substrate and method of manufacturing the same Sep. 10, 2013
8524527 High-performance single-crystalline N-type dopant-doped metal oxide nanowires for transparent thin film transistors and active matrix organic light-emitting diode displays Sep. 3, 2013
8518740 Manufacturing method of semiconductor device Aug. 27, 2013
8492761 Field-effect transistor and method for fabricating field-effect transistor Jul. 23, 2013
8481355 Modular system and process for continuous deposition of a thin film layer on a substrate Jul. 9, 2013
8481378 Effecting selectivity of silicon or silicon-germanium deposition on a silicon or silicon-germanium substrate by doping Jul. 9, 2013
8466049 Semiconductor device producing method with selective epitaxial growth Jun. 18, 2013
8460985 Method of manufacturing semiconductor for transistor and method of manufacturing the transistor Jun. 11, 2013
8460966 Thin film transistor and method for fabricating thin film transistor Jun. 11, 2013
8455322 Silicon germanium heterojunction bipolar transistor structure and method Jun. 4, 2013
8435832 Double self-aligned metal oxide TFT May. 7, 2013
8426916 Semiconductor integrated circuit devices having different thickness silicon-germanium layers Apr. 23, 2013
8404514 Fabricating current-confining structures in phase change memory switch cells Mar. 26, 2013
8394704 Method for fabricating a dual-orientation group-IV semiconductor substrate Mar. 12, 2013
8384078 Organic light emitting display device and method of manufacturing the same Feb. 26, 2013
8377730 Method of manufacturing vertically aligned nanotubes, method of manufacturing sensor structure, and sensor element manufactured thereby Feb. 19, 2013
8367461 Functional material for printed electronic components Feb. 5, 2013
8367462 Large-scale fabrication of vertically aligned ZnO nanowire arrays Feb. 5, 2013
8357597 Process for producing Si.sub.(1-v-w-x)C.sub.wAl.sub.xN.sub.v base material, process for producing epitaxial wafer, Si.sub.(1-v-w-x)C.sub.wAl.sub.xN.sub.v base material, and epitaxial wafer Jan. 22, 2013
8334192 Method of fabricating gallium nitride substrate Dec. 18, 2012
8318553 Vertical diode using silicon formed by selective epitaxial growth Nov. 27, 2012
8273600 Self-aligned metal oxide TFT with reduced number of masks Sep. 25, 2012
8268666 Field-effect transistor and method for fabricating field-effect transistor Sep. 18, 2012
8258030 Manufacturing method of semiconductor device Sep. 4, 2012
8247741 Dynamic system for variable heating or cooling of linearly conveyed substrates Aug. 21, 2012
8247813 Display device and electronic device including the same Aug. 21, 2012
8241949 Method of manufacturing semiconductor device Aug. 14, 2012
8236593 Methods for improving the quality of epitaxially-grown semiconductor materials Aug. 7, 2012
8203151 Semiconductor device and method for fabricating the same Jun. 19, 2012
8173524 Process for epitaxially growing epitaxial material regions May. 8, 2012
8168501 Source/drain strained layers May. 1, 2012
8158974 Semiconductor device, polycrystalline semiconductor thin film, process for producing polycrystalline semiconductor thin film, field effect transistor, and process for producing field effect tr Apr. 17, 2012
8154018 Semiconductor device, its manufacture method and template substrate Apr. 10, 2012
8154024 Field effect transistor using amorphous oxide film as channel layer, manufacturing method of field effect transistor using amorphous oxide film as channel layer, and manufacturing method of am Apr. 10, 2012

1 2 3 4

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