| |
 |
|
Class Information
Number: 257/E21.431
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Multi-step process for the manufacture of unipolar device (epo) > Field-effect transistor (epo) > With an insulated gate (epo) > Lateral single gate silicon transistor (epo) > With source and drain recessed by etching or recessed and refi lled (epo)
Description: This subclass is indented under subclass E21.424. This subclass is substantially the same in scope as ECLA classification H01L21/336H8.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7608515 |
Diffusion layer for stressed semiconductor devices |
Oct. 27, 2009 |
| 7605042 |
SOI bottom pre-doping merged e-SiGe for poly height reduction |
Oct. 20, 2009 |
| 7605407 |
Composite stressors with variable element atomic concentrations in MOS devices |
Oct. 20, 2009 |
| 7601634 |
Process for producing a contact pad on a region of an integrated circuit, in particular on the electrodes of a transistor |
Oct. 13, 2009 |
| 7601983 |
Transistor and method of manufacturing the same |
Oct. 13, 2009 |
| 7572705 |
Semiconductor device and method of manufacturing a semiconductor device |
Aug. 11, 2009 |
| 7569437 |
Formation of transistor having a strained channel region including a performance enhancing material composition utilizing a mask pattern |
Aug. 4, 2009 |
| 7566609 |
Method of manufacturing a semiconductor structure |
Jul. 28, 2009 |
| 7557396 |
Semiconductor device and method of manufacturing semiconductor device |
Jul. 7, 2009 |
| 7553718 |
Methods, systems and structures for forming semiconductor structures incorporating high-temperature processing steps |
Jun. 30, 2009 |
| 7544528 |
Method for manufacturing substrate of liquid crystal device |
Jun. 9, 2009 |
| 7537988 |
Differential offset spacer |
May. 26, 2009 |
| 7538002 |
Semiconductor process integrating source/drain stressors and interlevel dielectric layer stressors |
May. 26, 2009 |
| 7534689 |
Stress enhanced MOS transistor and methods for its fabrication |
May. 19, 2009 |
| 7504309 |
Pre-silicide spacer removal |
Mar. 17, 2009 |
| 7494884 |
SiGe selective growth without a hard mask |
Feb. 24, 2009 |
| 7485524 |
MOSFETs comprising source/drain regions with slanted upper surfaces, and method for fabricating the same |
Feb. 3, 2009 |
| 7482211 |
Junction leakage reduction in SiGe process by implantation |
Jan. 27, 2009 |
| 7479422 |
Semiconductor device with stressors and method therefor |
Jan. 20, 2009 |
| 7473591 |
Transistor with strain-inducing structure in channel |
Jan. 6, 2009 |
| 7446379 |
Transistor with dopant-bearing metal in source and drain |
Nov. 4, 2008 |
| 7413961 |
Method of fabricating a transistor structure |
Aug. 19, 2008 |
| 7413957 |
Methods for forming a transistor |
Aug. 19, 2008 |
| 7397091 |
SiGe nickel barrier structure employed in a CMOS device to prevent excess diffusion of nickel used in the silicide material |
Jul. 8, 2008 |
| 7385261 |
Extended drain metal oxide semiconductor transistor and manufacturing method thereof |
Jun. 10, 2008 |
| 7381623 |
Pre-epitaxial disposable spacer integration scheme with very low temperature selective epitaxy for enhanced device performance |
Jun. 3, 2008 |
| 7368792 |
MOS transistor with elevated source/drain structure |
May. 6, 2008 |
| 7364976 |
Selective etch for patterning a semiconductor film deposited non-selectively |
Apr. 29, 2008 |
| 7364957 |
Method and apparatus for semiconductor device with improved source/drain junctions |
Apr. 29, 2008 |
| 7361973 |
Embedded stressed nitride liners for CMOS performance improvement |
Apr. 22, 2008 |
| 7354835 |
Method of fabricating CMOS transistor and CMOS transistor fabricated thereby |
Apr. 8, 2008 |
| 7344951 |
Surface preparation method for selective and non-selective epitaxial growth |
Mar. 18, 2008 |
| 7265419 |
Semiconductor memory device with cell transistors having electrically floating channel bodies to store data |
Sep. 4, 2007 |
| 7238561 |
Method for forming uniaxially strained devices |
Jul. 3, 2007 |
| 7223662 |
Method of forming an epitaxial layer for raised drain and source regions by removing surface defects of the initial crystal surface |
May. 29, 2007 |
| 7195982 |
Method for manufacturing anti-punch through semiconductor device |
Mar. 27, 2007 |
| 7193276 |
Semiconductor devices with a source/drain regions formed on a recessed portion of an isolation layer |
Mar. 20, 2007 |
| 7118952 |
Method of making transistor with strained source/drain |
Oct. 10, 2006 |
| 7118977 |
System and method for improved dopant profiles in CMOS transistors |
Oct. 10, 2006 |
| 7064039 |
Method to produce localized halo for MOS transistor |
Jun. 20, 2006 |
| 7061060 |
Offset-gate-type semiconductor device |
Jun. 13, 2006 |
| 7060576 |
Epitaxially deposited source/drain |
Jun. 13, 2006 |
| 7057216 |
High mobility heterojunction complementary field effect transistors and methods thereof |
Jun. 6, 2006 |
| 7045407 |
Amorphous etch stop for the anisotropic etching of substrates |
May. 16, 2006 |
| 7030465 |
Semiconductor device that can increase the carrier mobility and method for fabricating the same |
Apr. 18, 2006 |
| 7026214 |
Offset-gate-type semiconductor device |
Apr. 11, 2006 |
| 7026688 |
Field effect transistors having multiple stacked channels |
Apr. 11, 2006 |
| 7019326 |
Transistor with strain-inducing structure in channel |
Mar. 28, 2006 |
| 7009258 |
Method of building a CMOS structure on thin SOI with source/drain electrodes formed by in situ doped selective amorphous silicon |
Mar. 7, 2006 |
| 7002207 |
Field effect transistors having multiple stacked channels |
Feb. 21, 2006 |
|
|
|
