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Class Information
Number: 257/E21.345
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Radiation treatment (epo) > With high-energy radiation (epo) > Producing ions for implantation (epo) > Characterized by the angle between the ion beam and the crystal planes or the main crystal surface (epo)
Description: This subclass is indented under subclass E21.334. This subclass is substantially the same in scope as ECLA classification H01L21/265F.










Patents under this class:
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Patent Number Title Of Patent Date Issued
7449386 Manufacturing method for semiconductor device to mitigate short channel effects Nov. 11, 2008
7410876 Methodology to reduce SOI floating-body effect Aug. 12, 2008
7387942 Substrate isolation in integrated circuits Jun. 17, 2008
7378323 Silicide process utilizing pre-amorphization implant and second spacer May. 27, 2008
7371648 Method for manufacturing a transistor device having an improved breakdown voltage and a method for manufacturing an integrated circuit using the same May. 13, 2008
7351627 Method of manufacturing semiconductor device using gate-through ion implantation Apr. 1, 2008
7351637 Semiconductor transistors having reduced channel widths and methods of fabricating same Apr. 1, 2008
7326622 Method of manufacturing semiconductor MOS transistor device Feb. 5, 2008
7297581 SRAM formation using shadow implantation Nov. 20, 2007
7291535 Method and apparatus for fabricating semiconductor device Nov. 6, 2007
7282415 Method for making a semiconductor device with strain enhancement Oct. 16, 2007
7265418 Semiconductor devices having field effect transistors Sep. 4, 2007
7253054 One time programmable EPROM for advanced CMOS technology Aug. 7, 2007
7208383 Method of manufacturing a semiconductor component Apr. 24, 2007
7074684 Elevated source drain disposable spacer CMOS Jul. 11, 2006
7074656 Doping of semiconductor fin devices Jul. 11, 2006
7071069 Shallow amorphizing implant for gettering of deep secondary end of range defects Jul. 4, 2006
7067870 Power semiconductor switching element Jun. 27, 2006
7064399 Advanced CMOS using super steep retrograde wells Jun. 20, 2006
7064039 Method to produce localized halo for MOS transistor Jun. 20, 2006
7060598 Method for implanting ions into semiconductor substrate Jun. 13, 2006
7060578 Semiconductor device and method of fabricating the same Jun. 13, 2006
7056798 Semiconductor device, method for manufacturing the same, and liquid jet apparatus Jun. 6, 2006
7056797 Semiconductor device and method of manufacturing the same Jun. 6, 2006
7056792 Stacked gate flash memory device and method of fabricating the same Jun. 6, 2006
7052965 Methods of fabricating MOS field effect transistors with pocket regions using implant blocking patterns May. 30, 2006
7049657 Semiconductor device having a trench-gate structure May. 23, 2006
7049188 Lateral doped channel May. 23, 2006
7041581 Method and structure for improving latch-up immunity using non-dopant implants May. 9, 2006
7038258 Semiconductor device having a localized halo implant therein and method of manufacture therefor May. 2, 2006
7030448 Mask ROM and the method of forming the same and the scheme of reading the device Apr. 18, 2006
7029978 Controlling the location of conduction breakdown in phase change memories Apr. 18, 2006
7022560 Method to manufacture high voltage MOS transistor by ion implantation Apr. 4, 2006
7018914 Method of enlarging contact area of a gate electrode, semiconductor device having a surface-enlarged gate electrode, and method of manufacturing the same Mar. 28, 2006
7015105 Method of simultaneously making a pair of transistors with insulated gates having respectively a thin oxide and a thick oxide, and corresponding integrated circuit comprising such a pair of tr Mar. 21, 2006
7012005 Self-aligned differential oxidation in trenches by ion implantation Mar. 14, 2006
7001822 Semiconductor device formed on insulating layer and method of manufacturing the same Feb. 21, 2006
6987040 Trench MOSFET with increased channel density Jan. 17, 2006
6977417 Semiconductor device and method of fabricating the same Dec. 20, 2005
6974760 Methods for transferring a useful layer of silicon carbide to a receiving substrate Dec. 13, 2005
6967143 Semiconductor fabrication process with asymmetrical conductive spacers Nov. 22, 2005
6960510 Method of making sub-lithographic features Nov. 1, 2005
6955991 Atmospheric process and system for controlled and rapid removal of polymers from high depth to width aspect ratio holes Oct. 18, 2005
6949798 Semiconductor device Sep. 27, 2005
6946338 Method for manufacturing semiconductor device Sep. 20, 2005
6946353 Low voltage high performance semiconductor devices and methods Sep. 20, 2005
6940137 Semiconductor device having an angled compensation implant and method of manufacture therefor Sep. 6, 2005
6940135 Mask-ROM process and device to prevent punch through using a halo implant process Sep. 6, 2005
6936505 Method of forming a shallow junction Aug. 30, 2005
6933215 Process for doping a semiconductor body Aug. 23, 2005

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