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Class Information
Number: 257/E21.337
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Radiation treatment (epo) > With high-energy radiation (epo) > Producing ions for implantation (epo) > In group iv semiconductor (epo) > Of electrically active species (epo) > Through-implantation (epo)
Description: This subclass is indented under subclass E21.336. This subclass is substantially the same in scope as ECLA classification H01L21/265A2B.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8709927 Methods of implanting dopant ions Apr. 29, 2014
8629026 Source tip optimization for high voltage transistor devices Jan. 14, 2014
8580662 Manufacture method of a split gate nonvolatile memory cell Nov. 12, 2013
8563381 Method for manufacturing a power semiconductor device Oct. 22, 2013
8492221 Method for fabricating power semiconductor device with super junction structure Jul. 23, 2013
8383498 Method for formation of tips Feb. 26, 2013
8329566 Method of manufacturing a high-performance semiconductor device Dec. 11, 2012
8324088 Sputtering-less ultra-low energy ion implantation Dec. 4, 2012
8133781 Method of forming a buried plate by ion implantation Mar. 13, 2012
8110487 Method of creating a strained channel region in a transistor by deep implantation of strain-inducing species below the channel region Feb. 7, 2012
8105924 Deep trench based far subcollector reachthrough Jan. 31, 2012
7968401 Reducing photoresist layer degradation in plasma immersion ion implantation Jun. 28, 2011
7939418 Partial implantation method for semiconductor manufacturing May. 10, 2011
7935618 Sputtering-less ultra-low energy ion implantation May. 3, 2011
7915128 High voltage semiconductor devices Mar. 29, 2011
7838927 Process for manufacturing a multi-drain electronic power device integrated in semiconductor substrate and corresponding device Nov. 23, 2010
7825043 Method for fabricating capacitor in semiconductor device Nov. 2, 2010
7772098 Method for manufacturing semiconductor device Aug. 10, 2010
7759208 Low temperature ion implantation for improved silicide contacts Jul. 20, 2010
7682888 Methods of forming NMOS/PMOS transistors with source/drains including strained materials Mar. 23, 2010
7662705 Partial implantation method for semiconductor manufacturing Feb. 16, 2010
7538003 Method for fabricating MOS transistor May. 26, 2009
7534667 Structure and method for fabrication of deep junction silicon-on-insulator transistors May. 19, 2009
7531435 Semiconductor device and manufacturing method of the same May. 12, 2009
7479435 Method of forming a circuit having subsurface conductors Jan. 20, 2009
7402495 Method for manufacturing a semiconductor device Jul. 22, 2008
7384834 Semiconductor device and a method of manufacturing the same Jun. 10, 2008
7319061 Method for fabricating electronic device Jan. 15, 2008
7282416 Method for fabricating electronic device Oct. 16, 2007
7247547 Method of fabricating a field effect transistor having improved junctions Jul. 24, 2007
7223663 MOS transistors and methods of manufacturing the same May. 29, 2007
7217136 Printed circuit board with right-angled trace and method for making the same May. 15, 2007
7199030 Method of manufacturing semiconductor device Apr. 3, 2007
7192789 Method for monitoring an ion implanter Mar. 20, 2007
7157357 Methods of forming halo regions in NMOS transistors Jan. 2, 2007
7135392 Thermal flux laser annealing for ion implantation of semiconductor P-N junctions Nov. 14, 2006
7074684 Elevated source drain disposable spacer CMOS Jul. 11, 2006
7071014 Methods for preserving strained semiconductor substrate layers during CMOS processing Jul. 4, 2006
7066390 Method for manufacturing semiconductor device Jun. 27, 2006
7060524 Methods of testing/stressing a charge trapping device Jun. 13, 2006
7060599 Method of forming shallow doped junctions having a variable profile gradation of dopants Jun. 13, 2006
7015538 Non-volatile memory and method for manufacturing non-volatile memory Mar. 21, 2006
7015536 Charge trapping device and method of forming the same Mar. 21, 2006
7012833 Integrated circuit having negative differential resistance (NDR) devices with varied peak-to-valley ratios (PVRs) Mar. 14, 2006
7008876 Method of forming gate electrode structure of a semiconductor device Mar. 7, 2006
7005340 Method for manufacturing semiconductor device Feb. 28, 2006
6987049 Semiconductor transistors and methods of fabricating the same Jan. 17, 2006
6984590 Method of manufacturing an EEPROM device Jan. 10, 2006
6982212 Method of manufacturing a semiconductor device Jan. 3, 2006
6982215 N type impurity doping using implantation of P.sub.2+ ions or As.sub.2+ Ions Jan. 3, 2006

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