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Class Information
Number: 257/E21.335
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Radiation treatment (epo) > With high-energy radiation (epo) > Producing ions for implantation (epo) > In group iv semiconductor (epo)
Description: This subclass is indented under subclass E21.334. This subclass is substantially the same in scope as ECLA classification H01L21/265A.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.336 Of electrically active species (epo) 490
257/E21.339 Of electrically inactive species in silicon to make buried insulating layer (epo) 126
257/E21.338 Recoil-implantation (epo) 23


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13

Patent Number Title Of Patent Date Issued
8669562 Semiconductor device and method for manufacturing the same Mar. 11, 2014
8653604 Multiple transistor types formed in a common epitaxial layer by differential out-diffusion from a doped underlayer Feb. 18, 2014
8629016 Multiple transistor types formed in a common epitaxial layer by differential out-diffusion from a doped underlayer Jan. 14, 2014
8557671 Method for forming a transient voltage suppressor having symmetrical breakdown voltages Oct. 15, 2013
8551846 Methods for fabricating semiconductor devices Oct. 8, 2013
8497180 Transistor with boot shaped source/drain regions Jul. 30, 2013
8476152 N-type carrier enhancement in semiconductors Jul. 2, 2013
8461010 Semiconductor device and method for manufacturing same Jun. 11, 2013
8450194 Method to modify the shape of a cavity using angled implantation May. 28, 2013
8409966 Method for manufacturing SOI substrate Apr. 2, 2013
8316745 Semiconductor wafer pre-process annealing and gettering method and system for solar cell formation Nov. 27, 2012
8241973 Method for increasing penetration depth of drain and source implantation species for a given gate height Aug. 14, 2012
8242003 Defect removal in Ge grown on Si Aug. 14, 2012
8178430 N-type carrier enhancement in semiconductors May. 15, 2012
8159050 Single crystal silicon structures Apr. 17, 2012
8120075 Semiconductor device with improved trenches Feb. 21, 2012
8097530 Method for manufacturing SIC semiconductor device Jan. 17, 2012
8084317 Semiconductor device and method of manufacturing the same Dec. 27, 2011
8080454 Method of fabricating CMOS transistor Dec. 20, 2011
8039361 Multilayered semiconductor wafer and process for manufacturing the same Oct. 18, 2011
8021991 Technique to radiation-harden trench refill oxides Sep. 20, 2011
8008107 Semiconductor wafer pre-process annealing and gettering method and system for solar cell formation Aug. 30, 2011
7867880 Metal precursors for low temperature deposition and methods of forming a metal thin layer and manufacturing a phase-change memory device using the metal precursors Jan. 11, 2011
7851313 Semiconductor device and process for improved etch control of strained silicon alloy trenches Dec. 14, 2010
7820523 Fabrication of active areas of different natures directly onto an insulator: application to the single or double gate MOS transistor Oct. 26, 2010
7795679 Device structures with a self-aligned damage layer and methods for forming such device structures Sep. 14, 2010
7785993 Method of growing a strained layer Aug. 31, 2010
7781305 Controlled cleaving process Aug. 24, 2010
7732291 Semiconductor device having stressed etch stop layers of different intrinsic stress in combination with PN junctions of different design in different device regions Jun. 8, 2010
7719060 Tensile strain source using silicon/germanium in globally strained silicon May. 18, 2010
7696039 Method of fabricating semiconductor device employing selectivity poly deposition Apr. 13, 2010
7692213 Integrated circuit system employing a condensation process Apr. 6, 2010
7675135 Integrated high voltage power device having an edge termination of enhanced effectiveness Mar. 9, 2010
7622356 Method of fabricating metal oxide semiconductor field effect transistor Nov. 24, 2009
7582899 Semiconductor device having overlay measurement mark and method of fabricating the same Sep. 1, 2009
7560312 Void formation for semiconductor junction capacitance reduction Jul. 14, 2009
7494906 Technique for transferring strain into a semiconductor region Feb. 24, 2009
7488652 Manufacturing method of gate oxidation films Feb. 10, 2009
7482205 Process for resurf diffusion for high voltage MOSFET Jan. 27, 2009
7432541 Metal oxide semiconductor field effect transistor Oct. 7, 2008
7432146 Semiconductor device and manufacturing method thereof Oct. 7, 2008
7402484 Methods for forming a field effect transistor Jul. 22, 2008
7384834 Semiconductor device and a method of manufacturing the same Jun. 10, 2008
7371648 Method for manufacturing a transistor device having an improved breakdown voltage and a method for manufacturing an integrated circuit using the same May. 13, 2008
7358196 Wet chemical treatment to form a thin oxide for high k gate dielectrics Apr. 15, 2008
7358167 Implantation process in semiconductor fabrication Apr. 15, 2008
7339214 Methods and apparatus for inducing stress in a semiconductor device Mar. 4, 2008
7247547 Method of fabricating a field effect transistor having improved junctions Jul. 24, 2007
7118981 Method of fabricating an integrated silicon-germanium heterobipolar transistor and an integrated silicon-germanium heterobipolar transistor Oct. 10, 2006
7091114 Semiconductor device and method of manufacturing the same Aug. 15, 2006

1 2 3 4 5 6 7 8 9 10 11 12 13










 
 
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