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Browse by Category: Main > Physics
Class Information
Number: 257/E21.333
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Radiation treatment (epo) > With high-energy radiation (epo) > For heating, e.g., electron beam heating (epo)
Description: This subclass is indented under subclass E21.331. This subclass is substantially the same in scope as ECLA classification H01L21/263C.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8669496 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy Mar. 11, 2014
8664116 Heat treatment method for growing silicide Mar. 4, 2014
8652890 Methods for fabricating integrated circuits with narrow, metal filled openings Feb. 18, 2014
8546805 Two-beam laser annealing with improved temperature performance Oct. 1, 2013
8481393 Semiconductor substrate and method for manufacturing the same, and method for manufacturing semiconductor device Jul. 9, 2013
8455299 Methods utilizing microwave radiation during formation of semiconductor constructions Jun. 4, 2013
8405175 Suitably short wavelength light for laser annealing of silicon in DSA type systems Mar. 26, 2013
8383513 Asymmetric rapid thermal annealing to reduce pattern effect Feb. 26, 2013
8318531 Thermal management and method for large scale processing of CIS and/or CIGS based thin films overlying glass substrates Nov. 27, 2012
8283203 Methods utilizing microwave radiation during formation of semiconductor constructions Oct. 9, 2012
8268733 Localized anneal Sep. 18, 2012
8268642 Method for removing electricity and method for manufacturing semiconductor device Sep. 18, 2012
8129284 Heat treatment method and heat treatment apparatus for heating substrate by light irradiation Mar. 6, 2012
8008171 Method of fabricating polycrystalline semiconductor Aug. 30, 2011
7985617 Methods utilizing microwave radiation during formation of semiconductor constructions Jul. 26, 2011
7947584 Suitably short wavelength light for laser annealing of silicon in DSA type systems May. 24, 2011
7902070 Method and system for producing optically transparent noble metal films Mar. 8, 2011
7884029 Solar cell, solar module and system and fabrication method thereof Feb. 8, 2011
7851318 Semiconductor substrate and method for manufacturing the same, and method for manufacturing semiconductor device Dec. 14, 2010
7829445 Method of manufacturing a flash memory device Nov. 9, 2010
7811914 Apparatus and method for increasing thermal conductivity of a substrate Oct. 12, 2010
7807509 Anodically bonded ultra-high-vacuum cell Oct. 5, 2010
7727863 Sonic irradiation during wafer immersion Jun. 1, 2010
7723243 Multi-layered structure forming method, method of manufacturing wiring substrate, and method of manufacturing electronic apparatus May. 25, 2010
7595208 Method of laser annealing using two wavelengths of radiation Sep. 29, 2009
7358127 Power semiconductor rectifier having broad buffer structure and method of manufacturing thereof Apr. 15, 2008
7312148 Copper barrier reflow process employing high speed optical annealing Dec. 25, 2007
7279721 Dual wavelength thermal flux laser anneal Oct. 9, 2007
7250377 Multi-layered structure forming method, method of manufacturing wiring substrate, and method of manufacturing electronic apparatus Jul. 31, 2007
7071042 Method of fabricating silicon integrated circuit on glass Jul. 4, 2006
6890825 Method for controlling dopant profiles and dopant activation by electron beam processing May. 10, 2005
6825101 Methods for annealing a substrate and article produced by such methods Nov. 30, 2004
6746969 Method of manufacturing semiconductor device Jun. 8, 2004
6573471 Welding method for semiconductor materials Jun. 3, 2003
6489225 Method for controlling dopant profiles and dopant activation by electron beam processing Dec. 3, 2002
4895735 Radiation induced pattern deposition Jan. 23, 1990
4865923 Selective intermixing of layered structures composed of thin solid films Sep. 12, 1989
4855014 Method for manufacturing semiconductor devices Aug. 8, 1989
4842679 Method for the production of semiconductor devices Jun. 27, 1989
4835118 Non-destructive energy beam activated conductive links May. 30, 1989
4816126 Method for forming a planarized thin film Mar. 28, 1989
4771010 Energy beam induced layer disordering (EBILD) Sep. 13, 1988
4746803 Method of forming a single crystal semiconductor layer from a non-single-crystalline material and apparatus for forming the same May. 24, 1988
4731338 Method for selective intermixing of layered structures composed of thin solid films Mar. 15, 1988
4670292 Method for injecting exotic atoms into a solid with electron beams Jun. 2, 1987
4670291 Method of controlling supersaturated injection and concentration of exotic atoms into deep portions of a solid with a high energy electron beam Jun. 2, 1987
4668527 Method for amorphizing a material by means of injection of exotic atoms into a solid with electron beams May. 26, 1987
4662949 Method of forming a single crystal semiconductor layer from a non-single crystalline material by a shaped energy beam May. 5, 1987
4655850 Method of forming monocrystalline thin films by parallel beam scanning of belt shaped refractory metal film on amorphous or polycrystalline layer Apr. 7, 1987
4626315 Process of forming ultrafine pattern Dec. 2, 1986

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