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Browse by Category: Main > Physics
Class Information
Number: 257/E21.332
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Radiation treatment (epo) > With high-energy radiation (epo) > For etching, e.g., sputter etching (epo)
Description: This subclass is indented under subclass E21331. This subclass is substantially the same in scope as ECLA classification H01L21/263B.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8362553 Multifunctional tape Jan. 29, 2013
8198177 Al.sub.xIn.sub.yGa.sub.l-x-yN mixture crystal substrate, method of growing same and method of producing same Jun. 12, 2012
8048754 Method for manufacturing SOI substrate and method for manufacturing single crystal semiconductor layer Nov. 1, 2011
8026176 Film forming method, plasma film forming apparatus and storage medium Sep. 27, 2011
7985667 Method for patterning semiconductor device having magnetic tunneling junction structure Jul. 26, 2011
7977252 Method of formation of coherent wavy nanostructures (variants) Jul. 12, 2011
7947548 Multifunctional tape May. 24, 2011
7932159 Flash memory device and method of fabricating the same Apr. 26, 2011
7910419 SOI transistor with self-aligned ground plane and gate and buried oxide of variable thickness Mar. 22, 2011
7884422 Semiconductor memory and method for manufacturing a semiconductor memory Feb. 8, 2011
7727902 Composition for forming nitride coating film for hard mask Jun. 1, 2010
7700413 Production method of compound semiconductor light-emitting device wafer Apr. 20, 2010
7601571 Methods of manufacturing interferometric modulators with thin film transistors Oct. 13, 2009
7416974 Method of manufacturing semiconductor device, and semiconductor device Aug. 26, 2008
7091125 Method and apparatus for structuring electrodes for organic light-emitting display and organic light-emitting display manufactured using the method and apparatus Aug. 15, 2006
6855622 Method and apparatus for forming a cavity in a semiconductor substrate using a charged particle beam Feb. 15, 2005
6497194 Focused particle beam systems and methods using a tilt column Dec. 24, 2002
6410392 Method of producing MOS transistor Jun. 25, 2002
6274007 Methods of formation of a silicon nanostructure, a silicon quantum wire array and devices based thereon Aug. 14, 2001
6106683 Grazing angle plasma polisher (GAPP) Aug. 22, 2000
5969368 Backside thinning using ion-beam figuring Oct. 19, 1999
5786236 Backside thinning using ion-beam figuring Jul. 28, 1998
5248376 Process for thermal-etching treatment of compound semiconductor substrate used in molecular beam epitaxy and apparatus for performing same Sep. 28, 1993
5229323 Method for manufacturing a semiconductor device with Schottky electrodes Jul. 20, 1993
5196354 Method of manufacturing semiconductor device with controlled carrier lifetime Mar. 23, 1993
5156703 Mthod for the surface treatment of semiconductors by particle bombardment Oct. 20, 1992
5113072 Device having superlattice structure, and method of and apparatus for manufacturing the same May. 12, 1992
5043787 Extremely small area npn lateral transistor Aug. 27, 1991
5001080 Method for producing a monolithically integrated optoelectronic device Mar. 19, 1991
4983540 Method of manufacturing devices having superlattice structures Jan. 8, 1991
4977098 Method of forming a self-aligned bipolar transistor using amorphous silicon Dec. 11, 1990
4920069 Submicron dimension compound semiconductor fabrication using thermal etching Apr. 24, 1990
4906594 Surface smoothing method and method of forming SOI substrate using the surface smoothing method Mar. 6, 1990
4897361 Patterning method in the manufacture of miniaturized devices Jan. 30, 1990
4869780 Ion milling method Sep. 26, 1989
4837178 Method for producing a semiconductor integrated circuit having an improved isolation structure Jun. 6, 1989
4824518 Method for the production of semiconductor devices Apr. 25, 1989
4719498 Optoelectronic integrated circuit Jan. 12, 1988
4698129 Focused ion beam micromachining of optical surfaces in materials Oct. 6, 1987
4647339 Production of semiconductor devices Mar. 3, 1987
4585517 Reactive sputter cleaning of semiconductor wafer Apr. 29, 1986
4579609 Growth of epitaxial films by chemical vapor deposition utilizing a surface cleaning step immediately before deposition Apr. 1, 1986
4466180 Method of manufacturing punch through voltage regulator diodes utilizing shaping and selective doping Aug. 21, 1984
4460434 Method for planarizing patterned surfaces Jul. 17, 1984
4457803 Processing method using a focused ion beam Jul. 3, 1984
4452644 Process for doping semiconductors Jun. 5, 1984
4419150 Method of forming lateral bipolar transistors Dec. 6, 1983
4415371 Method of making sub-micron dimensioned NPN lateral transistor Nov. 15, 1983
4356056 Process for insulating the interconnections of integrated circuits Oct. 26, 1982
4307131 Method of manufacturing metal-semiconductor contacts exhibiting high injected current density Dec. 22, 1981

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