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Browse by Category: Main > Physics
Class Information
Number: 257/E21.319
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To modify their internal properties, e.g., to produce internal imperfections (epo) > Of silicon body, e.g., for gettering (epo) > Using cavities formed by inert gas ion implantation, e.g., hydrogen, noble gas (epo)
Description: This subclass is indented under subclass E21.318. This subclass is substantially the same in scope as ECLA classification H01L21/322B2.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8658508 Method for manufacturing SOI substrate Feb. 25, 2014
8629030 Method for manufacturing SOI substrate Jan. 14, 2014
8525304 Semiconductor device Sep. 3, 2013
8492248 Manufacturing method of semiconductor substrate Jul. 23, 2013
8481381 Superior integrity of high-k metal gate stacks by preserving a resist material above end caps of gate electrode structures Jul. 9, 2013
8476719 Semiconductor device and method of manufacturing the same Jul. 2, 2013
8410002 Semiconductor device and manufacturing method thereof Apr. 2, 2013
8377799 Method of manufacturing SOI substrate Feb. 19, 2013
8324084 Manufacturing method of semiconductor substrate and manufacturing method of semiconductor device Dec. 4, 2012
8278187 Method for reprocessing semiconductor substrate by stepwise etching with at least two etching treatments Oct. 2, 2012
8168543 Methods of forming a layer for barrier applications in an interconnect structure May. 1, 2012
8143134 Method for manufacturing SOI substrate Mar. 27, 2012
8119443 Method of manufacturing image sensor having ions implanted into photodiode layer to control contact hole shape Feb. 21, 2012
8062964 Solar cell defect passivation method Nov. 22, 2011
8035131 Method for forming a nitride semiconductor laminated structure and method for manufacturing a nitride semiconductor element Oct. 11, 2011
8012818 Method for improving inversion layer mobility in a silicon carbide MOSFET Sep. 6, 2011
7972941 Method of manufacturing a semiconductor device Jul. 5, 2011
7897489 Selective activation of hydrogen passivated silicon and germanium surfaces Mar. 1, 2011
7892934 SOI substrate and method for manufacturing SOI substrate Feb. 22, 2011
7875515 Method for manufacturing capacitor of semiconductor device Jan. 25, 2011
7867836 Method for manufacturing junction semiconductor device Jan. 11, 2011
7867920 Method for modifying high-k dielectric thin film and semiconductor device Jan. 11, 2011
7825014 Method for fabricating semiconductor device Nov. 2, 2010
7820524 Manufacturing method of SOI substrate and manufacturing method of semiconductor device Oct. 26, 2010
7820551 Semiconductor device having fins FET and manufacturing method thereof Oct. 26, 2010
7811912 Method for manufacturing semiconductor device Oct. 12, 2010
7790563 Semiconductor device, electronic device and method for manufacturing semiconductor device Sep. 7, 2010
7754557 Method for manufacturing vertical CMOS image sensor Jul. 13, 2010
7741191 Method for preventing the formation of electrical shorts via contact ILD voids Jun. 22, 2010
7732304 Method of manufacturing semiconductor device Jun. 8, 2010
7662680 Method of producing a semiconductor element in a substrate and a semiconductor element Feb. 16, 2010
7635625 Method for manufacturing image sensor Dec. 22, 2009
7633108 Metal/semiconductor/metal current limiter Dec. 15, 2009
7618893 Methods of forming a layer for barrier applications in an interconnect structure Nov. 17, 2009
7585765 Formation of oxidation-resistant seed layer for interconnect applications Sep. 8, 2009
7572740 Methods for optimizing thin film formation with reactive gases Aug. 11, 2009
7563693 Method for manufacturing semiconductor substrate and semiconductor substrate Jul. 21, 2009
7563697 Method for producing SOI wafer Jul. 21, 2009
7507641 Method of producing bonded wafer Mar. 24, 2009
7504332 Water-barrier performance of an encapsulating film Mar. 17, 2009
7494943 Method for using film formation apparatus Feb. 24, 2009
7476602 N.sub.2 based plasma treatment for enhanced sidewall smoothing and pore sealing porous low-k dielectric films Jan. 13, 2009
7473620 Process for adjusting the strain on the surface or inside a substrate made of a semiconductor material Jan. 6, 2009
7465593 Electronics device, semiconductor device, and method for manufacturing the same Dec. 16, 2008
7439092 Thin film splitting method Oct. 21, 2008
7410877 Method for manufacturing SIMOX wafer and SIMOX wafer Aug. 12, 2008
7408225 Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms Aug. 5, 2008
7405482 High-k dielectric film, method of forming the same and related semiconductor device Jul. 29, 2008
7378744 Plasma treatment at film layer to reduce sheet resistance and to improve via contact resistance May. 27, 2008
7344933 Method of forming device having a raised extension region Mar. 18, 2008

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