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Class Information
Number: 257/E21.314
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Deposition/post-treatment of noninsulating, e.g., conductive - or resistive - layers on insulating layers (epo) > Post treatment (epo) > Physical or chemical etching of layer, e.g., to produce a patterned layer from pre-deposited extensive layer (epo) > Using mask (epo)
Description: This subclass is indented under subclass E21.305. This subclass is substantially the same in scope as ECLA classification H01L21/3213D.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622336 |
Manufacturing method of semiconductor device |
Nov. 24, 2009 |
| 7622358 |
Semiconductor device with semi-insulating substrate portions and method for forming the same |
Nov. 24, 2009 |
| 7575998 |
Semiconductor device and metal line fabrication method of the same |
Aug. 18, 2009 |
| 7541286 |
Method for manufacturing semiconductor device using KrF light source |
Jun. 2, 2009 |
| 7524733 |
Asymmetric source/drain transistor employing selective epitaxial growth (SEG) layer and method of fabricating same |
Apr. 28, 2009 |
| 7504676 |
Planar split-gate high-performance MOSFET structure and manufacturing method |
Mar. 17, 2009 |
| 7498232 |
Semiconductor devices and methods of manufacture thereof |
Mar. 3, 2009 |
| 7491600 |
Nanocrystal bitcell process integration for high density application |
Feb. 17, 2009 |
| 7482268 |
Top layers of metal for integrated circuits |
Jan. 27, 2009 |
| 7473611 |
Methods of forming non-volatile memory cells including fin structures |
Jan. 6, 2009 |
| 7413963 |
Method of edge bevel rinse |
Aug. 19, 2008 |
| 7413960 |
Method of forming floating gate electrode in flash memory device |
Aug. 19, 2008 |
| 7399703 |
Process for patterning nanocarbon material, semiconductor device, and method for manufacturing semiconductor device |
Jul. 15, 2008 |
| 7351666 |
Layout and process to contact sub-lithographic structures |
Apr. 1, 2008 |
| 7341960 |
Method for making a metal oxide semiconductor device |
Mar. 11, 2008 |
| 7271022 |
Process for forming microstructures |
Sep. 18, 2007 |
| 7060628 |
Method for fabricating a hard mask polysilicon gate |
Jun. 13, 2006 |
| 7060626 |
Multi-run selective pattern and etch wafer process |
Jun. 13, 2006 |
| 7056824 |
Electronic device manufacture |
Jun. 6, 2006 |
| 7056446 |
Method of manufacturing nano-gap electrode |
Jun. 6, 2006 |
| 7051454 |
Method for etching a metal layer in a semiconductor device |
May. 30, 2006 |
| 7049703 |
Semiconductor device having a tapered interconnection with insulating material on conductive sidewall thereof within through hole |
May. 23, 2006 |
| 7049245 |
Two-step GC etch for GC profile and process window improvement |
May. 23, 2006 |
| 7049169 |
Method of fabricating a semiconductor device |
May. 23, 2006 |
| 7045837 |
Hardmask with high selectivity for Ir barriers for ferroelectric capacitor manufacturing |
May. 16, 2006 |
| 7045070 |
Method of producing an electrode configuration and method of electrically contacting the electrode configuration |
May. 16, 2006 |
| 7029925 |
FeRAM capacitor stack etch |
Apr. 18, 2006 |
| 7026247 |
Nanocircuit and self-correcting etching method for fabricating same |
Apr. 11, 2006 |
| 7026253 |
Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask |
Apr. 11, 2006 |
| 7018552 |
Method of manufacturing electronic device |
Mar. 28, 2006 |
| 7018930 |
Method for fabricating semiconductor device |
Mar. 28, 2006 |
| 7018748 |
Process for producing hard masks |
Mar. 28, 2006 |
| 7015529 |
Localized masking for semiconductor structure development |
Mar. 21, 2006 |
| 7008866 |
Large-scale trimming for ultra-narrow gates |
Mar. 7, 2006 |
| 7008869 |
Method for forming metal wiring without metal byproducts that create bridge between metal wires in a semiconductor device |
Mar. 7, 2006 |
| 7001843 |
Methods of forming metal lines in semiconductor devices |
Feb. 21, 2006 |
| 7001821 |
Method of forming and using a hardmask for forming ferroelectric capacitors in a semiconductor device |
Feb. 21, 2006 |
| 7001781 |
Method for producing a ferroelectric capacitor that includes etching with hardmasks |
Feb. 21, 2006 |
| 6998332 |
Method of independent P and N gate length control of FET device made by sidewall image transfer technique |
Feb. 14, 2006 |
| 6998348 |
Method for manufacturing electronic circuits integrated on a semiconductor substrate |
Feb. 14, 2006 |
| 6995080 |
Methods of forming transistor gates |
Feb. 7, 2006 |
| 6989231 |
Method of forming fine patterns using silicon oxide layer |
Jan. 24, 2006 |
| 6989333 |
Process for forming a pattern |
Jan. 24, 2006 |
| 6987068 |
Methods to planarize semiconductor device and passivation layer |
Jan. 17, 2006 |
| 6984585 |
Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer |
Jan. 10, 2006 |
| 6974968 |
Method and apparatus for fabricating self-aligned contacts in an integrated circuit |
Dec. 13, 2005 |
| 6974778 |
Semiconductor device manufactured with auxillary mask and method for producing the same |
Dec. 13, 2005 |
| 6972255 |
Semiconductor device having an organic anti-reflective coating (ARC) and method therefor |
Dec. 6, 2005 |
| 6972261 |
Method for fabricating fine features by jet-printing and surface treatment |
Dec. 6, 2005 |
| 6969580 |
Method of manufacturing semiconductor device |
Nov. 29, 2005 |
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