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Class Information
Number: 257/E21.312
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Deposition/post-treatment of noninsulating, e.g., conductive - or resistive - layers on insulating layers (epo) > Post treatment (epo) > Physical or chemical etching of layer, e.g., to produce a patterned layer from pre-deposited extensive layer (epo) > By chemical means only (epo) > By vapor etching only (epo) > Using plasma (epo) > Of silicon-containing layer (epo)
Description: This subclass is indented under subclass E21.311. This subclass is substantially the same in scope as ECLA classification H01L21/3213C4B2.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8598040 ETCH process for 3D flash structures Dec. 3, 2013
8435904 Methods of uniformly removing silicon oxide and an intermediate semiconductor device May. 7, 2013
8394714 Anti-reflective coatings for micro-fluid applications Mar. 12, 2013
8338240 Method for manufacturing transistor Dec. 25, 2012
8187973 Method for manufacturing semiconductor device and the semiconductor device May. 29, 2012
8133814 Etch methods for semiconductor device fabrication Mar. 13, 2012
7994541 Semiconductor device and metal line fabrication method of the same Aug. 9, 2011
7939437 Metallization method for solar cells May. 10, 2011
7906434 Manufacturing method of semiconductor devices Mar. 15, 2011
7786016 Methods of uniformly removing silicon oxide and a method of removing a sacrificial oxide Aug. 31, 2010
7763547 Technique for enhancing process flexibility during the formation of vias and trenches in low-k interlayer dielectrics Jul. 27, 2010
7754610 Process for etching tungsten silicide overlying polysilicon particularly in a flash memory Jul. 13, 2010
7682991 Method of manufacturing silicon carbide semiconductor device Mar. 23, 2010
7678588 Method for constructing module for optical critical dimension (OCD) and measuring method of module for optical critical dimension using the module Mar. 16, 2010
7648914 Method for etching having a controlled distribution of process results Jan. 19, 2010
7645666 Method of making a semiconductor device Jan. 12, 2010
7504040 Plasma processing apparatus and plasma processing method Mar. 17, 2009
7413963 Method of edge bevel rinse Aug. 19, 2008
7341922 Dry etching method, fabrication method for semiconductor device, and dry etching apparatus Mar. 11, 2008
7122488 High density plasma process for the formation of silicon dioxide on silicon carbide substrates Oct. 17, 2006
7071114 Method and apparatus for dry etching Jul. 4, 2006
7060628 Method for fabricating a hard mask polysilicon gate Jun. 13, 2006
7049245 Two-step GC etch for GC profile and process window improvement May. 23, 2006
7030027 Etching methods and apparatus for producing semiconductor devices Apr. 18, 2006
7018930 Method for fabricating semiconductor device Mar. 28, 2006
6995093 Polysilicon etching method Feb. 7, 2006
6995434 Semiconductor device and method of fabricating the same Feb. 7, 2006
6984589 Method for determining etching process conditions and controlling etching process Jan. 10, 2006
6972225 integrating n-type and P-type metal gate transistors Dec. 6, 2005
6955964 Formation of a double gate structure Oct. 18, 2005
6955990 Methods for forming a gate in a semiconductor device Oct. 18, 2005
6953719 Integrating n-type and p-type metal gate transistors Oct. 11, 2005
6943119 Flash process for stacking poly etching Sep. 13, 2005
6933241 Method for forming pattern of stacked film Aug. 23, 2005
6930030 Method of forming an electronic device on a recess in the surface of a thin film of silicon etched to a precise thickness Aug. 16, 2005
6924191 Method for fabricating a gate structure of a field effect transistor Aug. 2, 2005
6919278 Method for etching silicon carbide Jul. 19, 2005
6919277 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions Jul. 19, 2005
6916396 Etching system and etching method Jul. 12, 2005
6914009 Method of making small transistor lengths Jul. 5, 2005
6905800 Etching a substrate in a process zone Jun. 14, 2005
6890860 Method for etching and/or patterning a silicon-containing layer May. 10, 2005
6887748 Mixed-mode process May. 3, 2005
6884365 Gas for plasma reaction and method for production thereof Apr. 26, 2005
6875668 Notched gate structure fabrication Apr. 5, 2005
6869885 Method for a tungsten silicide etch Mar. 22, 2005
6869899 Lateral-only photoresist trimming for sub-80 nm gate stack Mar. 22, 2005
6867137 Fabrication method for a semiconductor structure having a partly filled trench Mar. 15, 2005
6858483 Integrating n-type and p-type metal gate transistors Feb. 22, 2005
6855643 Method for fabricating a gate structure Feb. 15, 2005

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