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Class Information
Number: 257/E21.311
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Deposition/post-treatment of noninsulating, e.g., conductive - or resistive - layers on insulating layers (epo) > Post treatment (epo) > Physical or chemical etching of layer, e.g., to produce a patterned layer from pre-deposited extensive layer (epo) > By chemical means only (epo) > By vapor etching only (epo) > Using plasma (epo)
Description: This subclass is indented under subclass E21.31. This subclass is substantially the same in scope as ECLA classification H01L21/3213C4B.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.312 Of silicon-containing layer (epo) 643


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18

Patent Number Title Of Patent Date Issued
8679922 Method of producing semiconductor device and method of producing solid-state image pickup device Mar. 25, 2014
8664040 Exposing connectors in packages through selective treatment Mar. 4, 2014
8658522 Methods and apparatus for incorporating nitrogen in oxide films Feb. 25, 2014
8658521 Method and device for layer deposition Feb. 25, 2014
8652893 Semiconductor device and manufacturing method thereof Feb. 18, 2014
8637925 Nickel-silicide formation with differential Pt composition Jan. 28, 2014
8633116 Dry etching method Jan. 21, 2014
8603899 Method of manufacturing a semiconductor device Dec. 10, 2013
8574985 Methods for depositing high-K dielectrics Nov. 5, 2013
8551886 CMP process for processing STI on two distinct silicon planes Oct. 8, 2013
8546855 Charging protection device Oct. 1, 2013
8541828 Methods for depositing high-K dielectrics Sep. 24, 2013
8541812 Semiconductor device and method of manufacture thereof Sep. 24, 2013
8536051 Manufacture method for semiconductor device Sep. 17, 2013
8525304 Semiconductor device Sep. 3, 2013
8501620 Method for depositing tungsten film having low resistivity, low roughness and high reflectivity Aug. 6, 2013
8501631 Plasma processing system control based on RF voltage Aug. 6, 2013
8497208 Semiconductor device and method for manufacturing the same Jul. 30, 2013
8497214 Semiconductor device manufacturing method Jul. 30, 2013
8492264 Method for forming interconnection levels of an integrated circuit Jul. 23, 2013
8476719 Semiconductor device and method of manufacturing the same Jul. 2, 2013
8476675 Semiconductor device and method of manufacture thereof Jul. 2, 2013
8441085 Method of manufacturing electronic apparatus and electronic apparatus May. 14, 2013
8415685 Light-emitting element, light-emitting apparatus, display, and electronic device Apr. 9, 2013
8409988 Method of manufacturing semiconductor device and substrate processing apparatus Apr. 2, 2013
8410002 Semiconductor device and manufacturing method thereof Apr. 2, 2013
8389328 Method of manufacturing electronic device and electronic device Mar. 5, 2013
8389417 Semiconductor device and manufacturing method thereof Mar. 5, 2013
8390135 Semiconductor device Mar. 5, 2013
8383522 Micro pattern forming method Feb. 26, 2013
8375892 Methods and apparatus for incorporating nitrogen in oxide films Feb. 19, 2013
8367530 Substrate processing apparatus and manufacturing method of semiconductor device Feb. 5, 2013
8354702 Inexpensive electrode materials to facilitate rutile phase titanium oxide Jan. 15, 2013
8338291 Producing transistor including multiple reentrant profiles Dec. 25, 2012
8304327 Method of manufacturing a semiconductor device Nov. 6, 2012
8264046 Synergy effect of alloying materials in interconnect structures Sep. 11, 2012
8237264 Method of manufacturing semiconductor device and thermal annealing apparatus Aug. 7, 2012
8217513 Remote plasma processing of interface surfaces Jul. 10, 2012
8198104 Method of manufacturing a semiconductor device Jun. 12, 2012
8158531 Method of manufacturing solar cell and plasma treatment apparatus Apr. 17, 2012
8138071 Isotopically-enriched boron-containing compounds, and methods of making and using same Mar. 20, 2012
8138070 Methods of using a set of silicon nanoparticle fluids to control in situ a set of dopant diffusion profiles Mar. 20, 2012
8129270 Method for depositing tungsten film having low resistivity, low roughness and high reflectivity Mar. 6, 2012
8084339 Remote plasma processing of interface surfaces Dec. 27, 2011
8058178 Photoresist strip method for low-k dielectrics Nov. 15, 2011
8048753 Charging protection device Nov. 1, 2011
8035131 Method for forming a nitride semiconductor laminated structure and method for manufacturing a nitride semiconductor element Oct. 11, 2011
8021982 Method of silicide formation by adding graded amount of impurity during metal deposition Sep. 20, 2011
8012850 Method of manufacturing semiconductor device and semiconductor device Sep. 6, 2011
8008198 Large scale method and furnace system for selenization of thin film photovoltaic materials Aug. 30, 2011

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