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Class Information
Number: 257/E21.302
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Deposition/post-treatment of noninsulating, e.g., conductive - or resistive - layers on insulating layers (epo) > Post treatment (epo) > Nitriding of silicon-containing layer (epo)
Description: This subclass is indented under subclass E21.3. This subclass is substantially the same in scope as ECLA classification H01L21/321D.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8614152 Gate structure and a method for forming the same Dec. 24, 2013
8609551 Method for manufacturing semiconductor device and substrate processing apparatus Dec. 17, 2013
8471994 Liquid crystal display device and method for fabricating the same Jun. 25, 2013
8440526 Method of fabricating memory May. 14, 2013
8362596 Engineered interconnect dielectric caps having compressive stress and interconnect structures containing same Jan. 29, 2013
8334220 Method of selectively forming a silicon nitride layer Dec. 18, 2012
8304352 Method of manufacturing a semiconductor device Nov. 6, 2012
8247331 Method for forming insulating film and method for manufacturing semiconductor device Aug. 21, 2012
8110490 Gate oxide leakage reduction Feb. 7, 2012
8105959 Method for manufacturing a semiconductor device having a nitrogen-containing gate insulating film Jan. 31, 2012
8030224 Manufacturing method of semiconductor device, semiconductor device, communication apparatus, and semiconductor laser Oct. 4, 2011
8012777 Packaging process of light emitting diode Sep. 6, 2011
7952675 Liquid crystal display device and method for fabricating the same May. 31, 2011
7923336 High-k dielectric film, method of forming the same and related semiconductor device Apr. 12, 2011
7884003 Method for depinning the fermi level of a semiconductor at an electrical junction and devices incorporating such junctions Feb. 8, 2011
7883981 Method for manufacturing flash memory device Feb. 8, 2011
7811945 Selective plasma processing method Oct. 12, 2010
7799649 Method for forming multi gate devices using a silicon oxide masking layer Sep. 21, 2010
7790627 Semiconductor device, method of manufacturing the same, and method of manufacturing metal compound thin film Sep. 7, 2010
7749919 Semiconductor device and method for manufacturing the same Jul. 6, 2010
7723173 Low temperature polysilicon oxide process for high-K dielectric/metal gate stack May. 25, 2010
7662730 Method for fabricating ultra-high tensile-stressed film and strained-silicon transistors thereof Feb. 16, 2010
7638396 Methods for fabricating a semiconductor device Dec. 29, 2009
7622402 Method for forming underlying insulation film Nov. 24, 2009
7615500 Method for depositing film and method for manufacturing semiconductor device Nov. 10, 2009
7605008 Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma Oct. 20, 2009
7560396 Material for electronic device and process for producing the same Jul. 14, 2009
7534732 Semiconductor devices with copper interconnects and composite silicon nitride capping layers May. 19, 2009
7507652 Methods of forming a composite dielectric structure and methods of manufacturing a semiconductor device including a composite dielectric structure Mar. 24, 2009
7494935 Method for forming fine pattern of semiconductor device Feb. 24, 2009
7491652 In-line processing for forming a silicon nitride film Feb. 17, 2009
7486366 Liquid crystal display device and method for fabricating the same Feb. 3, 2009
7439121 Dielectric film and method of forming it, semiconductor device, non-volatile semiconductor memory device, and production method for semiconductor device Oct. 21, 2008
7427572 Method and apparatus for forming silicon nitride film Sep. 23, 2008
7408225 Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms Aug. 5, 2008
7358612 Plasma treatment at film layer to reduce sheet resistance and to improve via contact resistance Apr. 15, 2008
7348282 Forming method of gate insulating layer and nitrogen density measuring method thereof Mar. 25, 2008
7303952 Method for fabricating doped polysilicon lines Dec. 4, 2007
7291568 Method for fabricating a nitrided silicon-oxide gate dielectric Nov. 6, 2007
7259071 Semiconductor device with dual gate oxides Aug. 21, 2007
7253108 Process for forming a thin film of TiSiN, in particular for phase change memory devices Aug. 7, 2007
7214613 Cross diffusion barrier layer in polysilicon May. 8, 2007
7183143 Method for forming nitrided tunnel oxide layer Feb. 27, 2007
6991985 Method of manufacturing a semiconductor device Jan. 31, 2006
6984575 Fabrication process of a semiconductor integrated circuit device Jan. 10, 2006
6962876 Method for forming a low-k dielectric layer for a semiconductor device Nov. 8, 2005
6933249 Method of fabricating semiconductor device Aug. 23, 2005
6831008 Nickel silicide--silicon nitride adhesion through surface passivation Dec. 14, 2004
6825134 Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow Nov. 30, 2004
6815350 Method for forming a thin film using an atomic layer deposition (ALD) process Nov. 9, 2004

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