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Class Information
Number: 257/E21.301
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Deposition/post-treatment of noninsulating, e.g., conductive - or resistive - layers on insulating layers (epo) > Post treatment (epo) > Oxidation of silicon-containing layer (epo)
Description: This subclass is indented under subclass E21.3. This subclass is substantially the same in scope as ECLA classification H01L21/321C.

Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8609551 Method for manufacturing semiconductor device and substrate processing apparatus Dec. 17, 2013
8525162 Method of isolating nanowires from a substrate Sep. 3, 2013
8501636 Method for fabricating silicon dioxide layer Aug. 6, 2013
8389412 Finishing method for a silicon on insulator substrate Mar. 5, 2013
8372761 Plasma oxidation processing method, plasma processing apparatus and storage medium Feb. 12, 2013
8334220 Method of selectively forming a silicon nitride layer Dec. 18, 2012
8168508 Method of isolating nanowires from a substrate May. 1, 2012
8163626 Enhancing NAND flash floating gate performance Apr. 24, 2012
8158487 Annealing process for annealing a structure Apr. 17, 2012
8124494 Method for reshaping silicon surfaces with shallow trench isolation Feb. 28, 2012
8105958 Semiconductor device manufacturing method and plasma oxidation treatment method Jan. 31, 2012
8053322 Epitaxial deposition-based processes for reducing gate dielectric thinning at trench edges and integrated circuits therefrom Nov. 8, 2011
8043981 Dual frequency low temperature oxidation of a semiconductor device Oct. 25, 2011
8043979 Plasma oxidizing method, storage medium, and plasma processing apparatus Oct. 25, 2011
8011319 Method for oxidizing a layer, and associated holding devices for a substrate Sep. 6, 2011
7989363 Method for rapid thermal treatment using high energy electromagnetic radiation of a semiconductor substrate for formation of dielectric films Aug. 2, 2011
7989364 Plasma oxidation processing method Aug. 2, 2011
7972933 Method of selective nitridation Jul. 5, 2011
7910495 Plasma oxidizing method, plasma processing apparatus, and storage medium Mar. 22, 2011
7892935 Semiconductor process Feb. 22, 2011
7811945 Selective plasma processing method Oct. 12, 2010
7795158 Oxidation method and apparatus for semiconductor process Sep. 14, 2010
7723789 Nonvolatile memory device with nanowire channel and method for fabricating the same May. 25, 2010
7723173 Low temperature polysilicon oxide process for high-K dielectric/metal gate stack May. 25, 2010
7700425 Raised source drain mosfet with amorphous notched gate cap layer with notch sidewalls passivated and filled with dielectric plug Apr. 20, 2010
7678659 Method of reducing current leakage in a metal insulator metal semiconductor capacitor and semiconductor capacitor thereof Mar. 16, 2010
7645656 Structure and method for making strained channel field effect transistor using sacrificial spacer Jan. 12, 2010
7615499 Method for oxidizing a layer, and associated holding devices for a substrate Nov. 10, 2009
7598168 Method of fabricating dual damascene interconnection and etchant for stripping sacrificial layer Oct. 6, 2009
7592227 Methods of manufacturing a semiconductor device Sep. 22, 2009
7585720 Dual stress liner device and method Sep. 8, 2009
7485520 Method of manufacturing a body-contacted finfet Feb. 3, 2009
7425480 Semiconductor device and method of manufacture thereof Sep. 16, 2008
7381601 Methods of fabricating field effect transistors having multiple stacked channels Jun. 3, 2008
7303946 Method of manufacturing a semiconductor device using an oxidation process Dec. 4, 2007
7169682 Method for manufacturing semiconductor device Jan. 30, 2007
7109076 Method of manufacturing semiconductor integrated circuit device, and semiconductor integrated circuit device made by its method Sep. 19, 2006
7067404 Thin film semiconductor device having a gate electrode insulator formed through high-heat oxidization Jun. 27, 2006
7067400 Method for preventing sidewall consumption during oxidation of SGOI islands Jun. 27, 2006
7033874 Method of forming insulating film and method of fabricating semiconductor device including plasma bias for forming a second insulating film Apr. 25, 2006
6987069 Fabrication process of a semiconductor integrated circuit device Jan. 17, 2006
6953966 Method of producing semiconductor element and nonvolatile semiconductor memory produced by this method Oct. 11, 2005
6905939 Process for forming silicon oxide material Jun. 14, 2005
6876045 Semiconductor device and process for manufacturing the same Apr. 5, 2005
6875675 Method for manufacturing a semiconductor film having a planarized surface Apr. 5, 2005
6849544 Forming a conductive structure in a semiconductor device Feb. 1, 2005
6844225 Self-aligned mask formed utilizing differential oxidation rates of materials Jan. 18, 2005
6838365 Methods of forming electronic components, and a conductive line Jan. 4, 2005
6835621 Method of fabricating non-volatile memory device having a structure of silicon-oxide-nitride-oxide-silicon Dec. 28, 2004
6825134 Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow Nov. 30, 2004

1 2 3 4 5

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