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Class Information
Number: 257/E21.297
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Deposition/post-treatment of noninsulating, e.g., conductive - or resistive - layers on insulating layers (epo) > Deposition of semiconductive layer, e.g., poly - or amorphous silicon layer (epo)
Description: This subclass is indented under subclass E21.294. This subclass is substantially the same in scope as ECLA classification H01L21/3205N.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8669166 Methods of thinning and/or dicing semiconducting substrates having integrated circuit products formed thereon Mar. 11, 2014
8587004 Semiconductor light emitting device, its manufacturing method, semiconductor device and its manufacturing method Nov. 19, 2013
8546167 Gallium nitride-based compound semiconductor light-emitting element Oct. 1, 2013
8546248 Method of forming polycrystalline silicon layer and atomic layer deposition apparatus used for the same Oct. 1, 2013
8530901 Film transistor and method for fabricating the same Sep. 10, 2013
8460958 Semiconductor light emitting device, its manufacturing method, semiconductor device and its manufacturing method Jun. 11, 2013
8450172 Non-insulating stressed material layers in a contact level of semiconductor devices May. 28, 2013
8318575 Compressive polycrystalline silicon film and method of manufacture thereof Nov. 27, 2012
8273641 Plasma deposition of amorphous semiconductors at microwave frequencies Sep. 25, 2012
8252668 Photoelectric conversion device fabrication method Aug. 28, 2012
8178428 Manufacturing method of semiconductor device and substrate processing apparatus May. 15, 2012
8088676 Metal-induced crystallization of amorphous silicon, polycrystalline silicon thin films produced thereby and thin film transistors produced therefrom Jan. 3, 2012
8048782 Plasma deposition of amorphous semiconductors at microwave frequencies Nov. 1, 2011
8048783 Method of forming polycrystalline silicon layer and atomic layer deposition apparatus used for the same Nov. 1, 2011
8043885 Method of manufacturing semiconductor film and method of manufacturing photovoltaic element Oct. 25, 2011
8039333 Semiconductor device and method of fabricating the same Oct. 18, 2011
8030120 Hybrid window layer for photovoltaic cells Oct. 4, 2011
8021940 Methods for fabricating PMOS metal gate structures Sep. 20, 2011
7998844 Method for manufacturing a semiconductor device Aug. 16, 2011
7981776 Method for depositing silicon Jul. 19, 2011
7960295 Film transistor and method for fabricating the same Jun. 14, 2011
7927907 Method of making silicon solar cells containing .mu.C silicon layers Apr. 19, 2011
7888167 Photoelectric conversion device and method for manufacturing the same Feb. 15, 2011
7816191 Wiring material, semiconductor device provided with a wiring using the wiring material and method of manufacturing thereof Oct. 19, 2010
7799680 Surface preparation prior to deposition on germanium Sep. 21, 2010
7745314 Method of degassing thin layer and method of manufacturing silicon thin film Jun. 29, 2010
7732289 Method of forming a MOS device with an additional layer Jun. 8, 2010
7709360 Method for manufacturing a crystalline silicon layer May. 4, 2010
7662702 Method for manufacturing a crystalline silicon layer Feb. 16, 2010
7575979 Method to form a film Aug. 18, 2009
7528056 Low-cost strained SOI substrate for high-performance CMOS technology May. 5, 2009
7361577 Method of manufacturing semiconductor device Apr. 22, 2008
7351654 Semiconductor device and method for producing the same Apr. 1, 2008
7271111 Shadow mask deposition of materials using reconfigurable shadow masks Sep. 18, 2007
7268065 Methods of manufacturing metal-silicide features Sep. 11, 2007
7262070 Method to make a weight compensating/tuning layer on a substrate Aug. 28, 2007
7109072 Semiconductor material, field effect transistor and manufacturing method thereof Sep. 19, 2006
7101760 Charge trapping nanocrystal dielectric for non-volatile memory transistor Sep. 5, 2006
7084000 Solid-state imaging device and method for manufacturing the same Aug. 1, 2006
7056835 Surface preparation prior to deposition Jun. 6, 2006
6967384 Structure and method for ultra-small grain size polysilicon Nov. 22, 2005
6958277 Surface preparation prior to deposition Oct. 25, 2005
6911369 Discontinuity prevention for SiGe deposition Jun. 28, 2005
6884700 Method of manufacturing device, device, and electronic apparatus Apr. 26, 2005
6858512 Semiconductor device and method of producing the same Feb. 22, 2005
6737307 Method for forming amorphous silicon film on single crystal silicon and structure formed May. 18, 2004
6730588 Method of forming SiGe gate electrode May. 4, 2004
6635556 Method of preventing autodoping Oct. 21, 2003
6620700 Silicided undoped polysilicon for capacitor bottom plate Sep. 16, 2003
6613695 Surface preparation prior to deposition Sep. 2, 2003

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