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Class Information
Number: 257/E21.295
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Deposition/post-treatment of noninsulating, e.g., conductive - or resistive - layers on insulating layers (epo) > Deposition of layer comprising metal, e.g., metal, alloys, metal compounds (epo)
Description: This subclass is indented under subclass E21.294. This subclass is substantially the same in scope as ECLA classification H01L21/3205M.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7582574 |
Diethylsilane as a silicon source in the deposition of metal silicate films |
Sep. 1, 2009 |
| 7534724 |
Method for manufacturing wiring, thin film transistor, light emitting device and liquid crystal display device, and droplet discharge apparatus for forming the same |
May. 19, 2009 |
| 7524766 |
Method for manufacturing semiconductor device and substrate processing apparatus |
Apr. 28, 2009 |
| 7521366 |
Manufacturing method of electro line for liquid crystal display device |
Apr. 21, 2009 |
| 7435678 |
Method of depositing noble metal electrode using oxidation-reduction reaction |
Oct. 14, 2008 |
| 7432184 |
Integrated PVD system using designated PVD chambers |
Oct. 7, 2008 |
| 7416980 |
Forming a barrier layer in interconnect joints and structures formed thereby |
Aug. 26, 2008 |
| 7410900 |
Metallisation |
Aug. 12, 2008 |
| 7384800 |
Method of fabricating metal-insulator-metal (MIM) device with stable data retention |
Jun. 10, 2008 |
| 7332432 |
Method for manufacturing wiring, thin film transistor, light emitting device and liquid crystal display device, and droplet discharge apparatus for forming the same |
Feb. 19, 2008 |
| 7314768 |
Formation method of electroconductive pattern, and production method of electron-emitting device, electron source, and image display apparatus using this |
Jan. 1, 2008 |
| 7306962 |
Electroformed metallization |
Dec. 11, 2007 |
| 7279417 |
Use of metallocenes to inhibit copper oxidation during semiconductor processing |
Oct. 9, 2007 |
| 7271111 |
Shadow mask deposition of materials using reconfigurable shadow masks |
Sep. 18, 2007 |
| 7265048 |
Reduction of copper dewetting by transition metal deposition |
Sep. 4, 2007 |
| 7262125 |
Method of forming low-resistivity tungsten interconnects |
Aug. 28, 2007 |
| 7186645 |
Selective plating of package terminals |
Mar. 6, 2007 |
| 7087520 |
Method for fabricating metal wiring |
Aug. 8, 2006 |
| 7078349 |
Method to form self-aligned floating gate to diffusion structures in flash |
Jul. 18, 2006 |
| 7067920 |
Semiconductor device and method of fabricating the same |
Jun. 27, 2006 |
| 7062850 |
Method of forming electrical interconnects having electromigration-inhibiting segments to a critical length |
Jun. 20, 2006 |
| 7064437 |
Semiconductor device having aluminum conductors |
Jun. 20, 2006 |
| 7057874 |
Ferroelectric capacitor |
Jun. 6, 2006 |
| 7034397 |
Oxygen bridge structures and methods to form oxygen bridge structures |
Apr. 25, 2006 |
| 7029946 |
Method for manufacturing semiconductor device and semiconductor device |
Apr. 18, 2006 |
| 7018878 |
Metal structures for integrated circuits and methods for making the same |
Mar. 28, 2006 |
| 7011762 |
Metal bridging monitor for etch and CMP endpoint detection |
Mar. 14, 2006 |
| 6992346 |
Integrated circuit devices with metal-insulator-metal capacitors |
Jan. 31, 2006 |
| 6989604 |
Conformal barrier liner in an integrated circuit interconnect |
Jan. 24, 2006 |
| 6960306 |
Low Cu percentages for reducing shorts in AlCu lines |
Nov. 1, 2005 |
| 6957624 |
Apparatus and a method for forming an alloy layer over a substrate |
Oct. 25, 2005 |
| 6953041 |
Compositions of transition metal species in dense phase carbon dioxide and methods of use thereof |
Oct. 11, 2005 |
| 6951814 |
Methods for forming a metal wiring layer on an integrated circuit device at reduced temperatures |
Oct. 4, 2005 |
| 6949444 |
High-frequency line |
Sep. 27, 2005 |
| 6908857 |
Method of manufacturing semiconductor device |
Jun. 21, 2005 |
| 6908848 |
Method for forming an electrical interconnection providing improved surface morphology of tungsten |
Jun. 21, 2005 |
| 6904675 |
Method of forming electrical interconnects having electromigration-inhibiting plugs |
Jun. 14, 2005 |
| 6903017 |
Integrated circuit metallization using a titanium/aluminum alloy |
Jun. 7, 2005 |
| 6900129 |
CVD of tantalum and tantalum nitride films from tantalum halide precursors |
May. 31, 2005 |
| 6893980 |
Semiconductor device and manufacturing method therefor |
May. 17, 2005 |
| 6893905 |
Method of forming substantially hillock-free aluminum-containing components |
May. 17, 2005 |
| 6873517 |
Ferroelectric capacitor |
Mar. 29, 2005 |
| 6872580 |
Method for patching up thin-film transistor circuits on a display panel by local thin-film deposition |
Mar. 29, 2005 |
| 6861355 |
Metal plating using seed film |
Mar. 1, 2005 |
| 6856021 |
Semiconductor device having aluminum alloy conductors |
Feb. 15, 2005 |
| 6855996 |
Electronic device substrate structure and electronic device |
Feb. 15, 2005 |
| 6856018 |
Semiconductor device and method of manufacture thereof |
Feb. 15, 2005 |
| 6852628 |
Method of insulating interconnects, and memory cell array with insulated interconnects |
Feb. 8, 2005 |
| 6852579 |
Method of manufacturing a semiconductor integrated circuit device |
Feb. 8, 2005 |
| 6841878 |
Integrated circuit with improved RC delay |
Jan. 11, 2005 |
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