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Class Information
Number: 257/E21.293
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Inorganic layer composed of nitride (epo) > Of silicon nitride (epo)
Description: This subclass is indented under subclass E21.292. This subclass is substantially the same in scope as ECLA classification H01L21/318B.

Patents under this class:
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Patent Number Title Of Patent Date Issued
7829413 Methods for forming quantum dots and forming gate using the quantum dots Nov. 9, 2010
7825014 Method for fabricating semiconductor device Nov. 2, 2010
7821071 Semiconductor device and method for manufacturing the same Oct. 26, 2010
7816281 Method for manufacturing a semiconductor device Oct. 19, 2010
7816279 Semiconductor device and method for manufacturing the same Oct. 19, 2010
7807577 Fabrication of integrated circuits with isolation trenches Oct. 5, 2010
7807576 Structure and method for forming a thick bottom dielectric (TBD) for trench-gate devices Oct. 5, 2010
7804136 Method of forming nitride films with high compressive stress for improved PFET device performance Sep. 28, 2010
7800150 Semiconductor device Sep. 21, 2010
7772108 Interconnection structures for semiconductor devices and methods of forming the same Aug. 10, 2010
7767513 Method of manufacturing semiconductor device and semiconductor device Aug. 3, 2010
7754614 Nonvolatile memory device and method for fabricating the same Jul. 13, 2010
7745305 Method of removing an oxide and method of filling a trench using the same Jun. 29, 2010
7727828 Method for fabricating a gate dielectric of a field effect transistor Jun. 1, 2010
7723228 Reduction of hillocks prior to dielectric barrier deposition in Cu damascene May. 25, 2010
7713843 Method for fabricating optical semiconductor device May. 11, 2010
7709337 Method for manufacturing SOI substrate and semiconductor device May. 4, 2010
7674718 Method for forming spacers of different sizes Mar. 9, 2010
7670954 Method of manufacturing semiconductor device Mar. 2, 2010
7666797 Methods for forming semiconductor constructions, and methods for selectively etching silicon nitride relative to conductive material Feb. 23, 2010
7645619 Magnetic random access memory device and method of forming the same Jan. 12, 2010
7645712 Method of forming contact Jan. 12, 2010
7638443 Method of forming ultra-thin SiN film by plasma CVD Dec. 29, 2009
7629262 Method of forming a lower electrode of a capacitor Dec. 8, 2009
7618893 Methods of forming a layer for barrier applications in an interconnect structure Nov. 17, 2009
7615428 Vertical memory device and method Nov. 10, 2009
7611989 Polysilicon dummy wafers and process used therewith Nov. 3, 2009
7605008 Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma Oct. 20, 2009
7602055 Semiconductor device and method for fabricating the same Oct. 13, 2009
7601604 Method for fabricating conducting plates for a high-Q MIM capacitor Oct. 13, 2009
7601639 Method for conditioning a microelectronics device deposition chamber Oct. 13, 2009
7598540 High performance CMOS devices comprising gapped dual stressors with dielectric gap fillers, and methods of fabricating the same Oct. 6, 2009
7598166 Dielectric layers for metal lines in semiconductor chips Oct. 6, 2009
7592234 Method for forming a nitrogen-containing gate insulating film Sep. 22, 2009
7592268 Method for fabricating semiconductor device Sep. 22, 2009
7566668 Method of forming contact Jul. 28, 2009
7544983 MTJ read head with sidewall spacers Jun. 9, 2009
7534732 Semiconductor devices with copper interconnects and composite silicon nitride capping layers May. 19, 2009
7521316 Methods of forming gate structures for semiconductor devices Apr. 21, 2009
7514366 Methods for forming shallow trench isolation Apr. 7, 2009
7511381 Thin film transistor and method of manufacturing the same Mar. 31, 2009
7507678 Method and apparatus for forming oxynitride film and nitride film, oxynitride film, nitride film, and substrate Mar. 24, 2009
7504343 Semiconductor device and method for manufacturing the same Mar. 17, 2009
7501355 Decreasing the etch rate of silicon nitride by carbon addition Mar. 10, 2009
7491652 In-line processing for forming a silicon nitride film Feb. 17, 2009
7488677 Interconnect structures with encasing cap and methods of making thereof Feb. 10, 2009
7488694 Methods of forming silicon nitride layers using nitrogenous compositions Feb. 10, 2009
7476937 Semiconductor device and method of fabricating the same Jan. 13, 2009
7473649 Methods for controlling feature dimensions in crystalline substrates Jan. 6, 2009
7473611 Methods of forming non-volatile memory cells including fin structures Jan. 6, 2009

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