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Class Information
Number: 257/E21.293
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Inorganic layer composed of nitride (epo) > Of silicon nitride (epo)
Description: This subclass is indented under subclass E21.292. This subclass is substantially the same in scope as ECLA classification H01L21/318B.










Patents under this class:
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Patent Number Title Of Patent Date Issued
5560777 Apparatus for making a semiconductor Oct. 1, 1996
5550091 Method of sputtering a silicon nitride film Aug. 27, 1996
5529951 Method of forming polycrystalline silicon layer on substrate by large area excimer laser irradiation Jun. 25, 1996
5525550 Process for forming thin films by plasma CVD for use in the production of semiconductor devices Jun. 11, 1996
5508067 Deposition of silicon nitride by plasma-enchanced chemical vapor deposition Apr. 16, 1996
5498890 Semiconductor device having a multi-layered dielectric structure and manufacturing method thereof Mar. 12, 1996
5492854 Method of manufacturing semiconductor device Feb. 20, 1996
5478765 Method of making an ultra thin dielectric for electronic devices Dec. 26, 1995
5468689 Method for preparation of silicon nitride gallium diffusion barrier for use in molecular beam epitaxial growth of gallium arsenide Nov. 21, 1995
5458919 Method for forming a film on a substrate by activating a reactive gas Oct. 17, 1995
5445999 Advanced technique to improve the bonding arrangement on silicon surfaces to promote uniform nitridation Aug. 29, 1995
5426330 Refractory metal capped low resistivity metal conductor lines and vias Jun. 20, 1995
5424103 Method for making a semiconductor using corona discharge Jun. 13, 1995
5424253 Method for manufacturing an inter-layer insulating film Jun. 13, 1995
5403779 Refractory metal capped low resistivity metal conductor lines and vias formed using PVD and CVD Apr. 4, 1995
5385763 Method for forming a film on a substrate by activating a reactive gas Jan. 31, 1995
5376223 Plasma etch process Dec. 27, 1994
5376593 Method for fabricating stacked layer Si.sub.3 N.sub.4 for low leakage high capacitance films using rapid thermal nitridation Dec. 27, 1994
5367179 Thin-film transistor having electrodes made of aluminum, and an active matrix panel using same Nov. 22, 1994
5349494 Semiconductor device with capacitor insulating film and method for fabricating the same Sep. 20, 1994
5336640 Method of manufacturing a semiconductor device having an insulating layer composed of a BPSG film and a plasma-CVD silicon nitride film Aug. 9, 1994
5336361 Method of manufacturing an MIS-type semiconductor device Aug. 9, 1994
5334555 Method of determining conditions for plasma silicon nitride film growth and method of manufacturing semiconductor device Aug. 2, 1994
5332697 Formation of silicon nitride by nitridation of porous silicon Jul. 26, 1994
5330936 Method of producing a silicon nitride film and method of fabricating a semiconductor device Jul. 19, 1994
5324686 Method of manufacturing semiconductor device using hydrogen as a diffusion controlling substance Jun. 28, 1994
5306946 Semiconductor device having a passivation layer with silicon nitride layers Apr. 26, 1994
5302555 Anisotropic deposition of dielectrics Apr. 12, 1994
5300455 Process for producing an electrically conductive diffusion barrier at the metal/silicon interface of a MOS transistor Apr. 5, 1994
5300813 Refractory metal capped low resistivity metal conductor lines and vias Apr. 5, 1994
5284789 Method of forming silicon-based thin film and method of manufacturing thin film transistor using silicon-based thin film Feb. 8, 1994
5272360 Thin film transistor having enhance stability in electrical characteristics Dec. 21, 1993
5264396 Method for enhancing nitridation and oxidation growth by introducing pulsed NF.sub.3 Nov. 23, 1993
5264379 Method of making a hetero-junction bipolar transistor Nov. 23, 1993
5248635 Method of fabricating and passivating semiconductor devices Sep. 28, 1993
5243202 Thin-film transistor and a liquid crystal matrix display device using thin-film transistors of this type Sep. 7, 1993
5234869 Method of manufacturing silicon nitride film Aug. 10, 1993
5229318 Process for buried localized oxidation of a silicon substrate and corresponding integrated circuit Jul. 20, 1993
5185274 Self-aligned, self-passivated advanced dual lift-off heterojunction bipolar transistor method Feb. 9, 1993
5178682 Method for forming a thin layer on a semiconductor substrate and apparatus therefor Jan. 12, 1993
5177031 Method of passivating etched mirror facets of semiconductor laser diodes Jan. 5, 1993
5162892 Semiconductor device with polycrystalline silicon active region and hydrogenated passivation layer Nov. 10, 1992
5160998 Semiconductor device and method of manufacturing the same Nov. 3, 1992
5156881 Method for forming a film on a substrate by activating a reactive gas Oct. 20, 1992
5122483 Method of forming a highly insulative thin films Jun. 16, 1992
5114556 Deposition apparatus and method for enhancing step coverage and planarization on semiconductor wafers May. 19, 1992
5108543 Method of surface treatment Apr. 28, 1992
5083033 Method of depositing an insulating film and a focusing ion beam apparatus Jan. 21, 1992
5059552 Process for forming the ridge structure of a self-aligned semiconductor laser Oct. 22, 1991
5040044 Compound semiconductor device and method for surface treatment Aug. 13, 1991

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