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Class Information
Number: 257/E21.293
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Inorganic layer composed of nitride (epo) > Of silicon nitride (epo)
Description: This subclass is indented under subclass E21.292. This subclass is substantially the same in scope as ECLA classification H01L21/318B.

Patents under this class:
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Patent Number Title Of Patent Date Issued
6471771 In-situ post epitaxial treatment process Oct. 29, 2002
6470824 Semiconductor manufacturing apparatus Oct. 29, 2002
6468924 Methods of forming thin films by atomic layer deposition Oct. 22, 2002
6465373 Ultra thin TCS (SiCl4) cell nitride for DRAM capacitor with DCS (SiH2Cl2) interface seeding layer Oct. 15, 2002
6465953 Plastic substrates with improved barrier properties for devices sensitive to water and/or oxygen, such as organic electroluminescent devices Oct. 15, 2002
6465345 Prevention of inter-channel current leakage in semiconductors Oct. 15, 2002
6461985 Semiconductor wafer assemblies comprising silicon nitride, methods of forming silicon nitride, and methods of reducing stress on semiconductive wafers Oct. 8, 2002
6461979 LPCVD furnace uniformity improvement by temperature ramp down deposition system Oct. 8, 2002
6458650 CU second electrode process with in situ ashing and oxidation process Oct. 1, 2002
6455417 Method for forming damascene structure employing bi-layer carbon doped silicon nitride/carbon doped silicon oxide etch stop layer Sep. 24, 2002
6455365 Structural integrity enhancement of dielectric films Sep. 24, 2002
6451713 UV pretreatment process for ultra-thin oxynitride formation Sep. 17, 2002
6451504 Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride Sep. 17, 2002
6448166 Method for forming a gate for semiconductor devices Sep. 10, 2002
6448133 Method to form a DRAM capacitor using low temperature reoxidation Sep. 10, 2002
6444568 Method of forming a copper diffusion barrier Sep. 3, 2002
6440878 Method to enhance the adhesion of silicon nitride to low-k fluorinated amorphous carbon using a silicon carbide adhesion promoter layer Aug. 27, 2002
6436847 Methods to form electronic devices Aug. 20, 2002
6432770 Semiconductor arrangement having capacitive structure and manufacture thereof Aug. 13, 2002
6429093 Sidewall process for forming a low resistance source line Aug. 6, 2002
6429151 Semiconductor wafer assemblies comprising silicon nitride, methods of forming silicon nitride, and methods of reducing stress on semiconductive wafers Aug. 6, 2002
6429128 Method of forming nitride capped Cu lines with reduced electromigration along the Cu/nitride interface Aug. 6, 2002
6423645 Method for forming a self-aligned contact Jul. 23, 2002
6420777 Dual layer etch stop barrier Jul. 16, 2002
6420729 Process to produce ultrathin crystalline silicon nitride on Si (111) for advanced gate dielectrics Jul. 16, 2002
6417559 Semiconductor wafer assemblies comprising photoresist over silicon nitride materials Jul. 9, 2002
6417041 Method for fabricating high permitivity dielectric stacks having low buffer oxide Jul. 9, 2002
6413887 Method for producing silicon nitride series film Jul. 2, 2002
6410437 Method for etching dual damascene structures in organosilicate glass Jun. 25, 2002
6410428 Nitride deposition on tungsten-polycide gate to prevent abnormal tungsten silicide oxidation Jun. 25, 2002
6407007 Method to solve the delamination of a silicon nitride layer from an underlying spin on glass layer Jun. 18, 2002
6399520 Semiconductor manufacturing method and semiconductor manufacturing apparatus Jun. 4, 2002
6395644 Process for fabricating a semiconductor device using a silicon-rich silicon nitride ARC May. 28, 2002
6391803 Method of forming silicon containing thin films by atomic layer deposition utilizing trisdimethylaminosilane May. 21, 2002
6392310 Semiconductor device having a reduced leakage current and a fabrication process thereof May. 21, 2002
6387761 Anneal for enhancing the electrical characteristic of semiconductor devices May. 14, 2002
6383875 Method of forming a transistor gate May. 7, 2002
6380056 Lightly nitridation surface for preparing thin-gate oxides Apr. 30, 2002
6380074 Deposition of various base layers for selective layer growth in semiconductor production Apr. 30, 2002
6380014 Manufacture method of semiconductor device with suppressed impurity diffusion from gate electrode Apr. 30, 2002
6380606 Locos isolation process using a layered pad nitride and dry field oxidation stack and semiconductor device employing the same Apr. 30, 2002
6380612 Thin film formed by inductively coupled plasma Apr. 30, 2002
6372673 Silicon-starved nitride spacer deposition Apr. 16, 2002
6372672 Method of forming a silicon nitride layer in a semiconductor device Apr. 16, 2002
6372628 Insulating film comprising amorphous carbon fluoride, a semiconductor device comprising such an insulating film, and a method for manufacturing the semiconductor device Apr. 16, 2002
6368988 Combined gate cap or digit line and spacer deposition using HDP Apr. 9, 2002
6362508 Triple layer pre-metal dielectric structure for CMOS memory devices Mar. 26, 2002
6358808 Semiconductor element with thermally nitrided film on high resistance film and method of manufacturing the same Mar. 19, 2002
6355582 Silicon nitride film formation method Mar. 12, 2002
6349669 Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction Feb. 26, 2002

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