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Class Information
Number: 257/E21.288
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Composed of oxide or glassy oxide or oxide based glass (epo) > Formed by oxidation (epo) > Of semiconductor material, e.g., by oxidation of semiconductor body itself (epo) > By anodic oxidation (epo) > Of silicon (epo)
Description: This subclass is indented under subclass E21.287. This subclass is substantially the same in scope as ECLA classification H01L21/316C2C2.

Patents under this class:

Patent Number Title Of Patent Date Issued
8685860 Semiconductor structure and manufacturing method thereof Apr. 1, 2014
8669187 Porous lift-off layer for selective removal of deposited films Mar. 11, 2014
8551889 Manufacture method for photovoltaic module Oct. 8, 2013
8525289 Adjusting threshold voltage for sophisticated transistors by diffusing a gate dielectric cap layer material prior to gate dielectric stabilization Sep. 3, 2013
8293640 Semiconductor structure and manufacturing method thereof Oct. 23, 2012
8198192 Adjusting threshold voltage for sophisticated transistors by diffusing a gate dielectric cap layer material prior to gate dielectric stabilization Jun. 12, 2012
8187982 Manufacture method for photovoltaic module May. 29, 2012
8158531 Method of manufacturing solar cell and plasma treatment apparatus Apr. 17, 2012
8133768 Method of manufacturing a light emitting, photovoltaic or other electronic apparatus and system Mar. 13, 2012
7951725 Manufacturing method of translucent solar cell May. 31, 2011
7897471 Method and apparatus to improve the reliability of the breakdown voltage in high voltage devices Mar. 1, 2011
7749868 Process of forming a curved profile on a semiconductor substrate Jul. 6, 2010
6815315 Method for electrochemical oxidation Nov. 9, 2004
6764967 Method for forming low thermal budget sacrificial oxides Jul. 20, 2004
6723581 Semiconductor device having a high-K gate dielectric and method of manufacture thereof Apr. 20, 2004
6677218 Method for filling trenches in integrated semiconductor circuits Jan. 13, 2004
6593077 Method of making thin films dielectrics using a process for room temperature wet chemical growth of SiO based oxides on a substrate Jul. 15, 2003
6589877 Method of providing an oxide Jul. 8, 2003
6559069 Process for the electrochemical oxidation of a semiconductor substrate May. 6, 2003
6517697 Anodizing method Feb. 11, 2003
6475927 Method of forming a semiconductor device Nov. 5, 2002
6451660 Method of forming bipolar transistors comprising a native oxide layer formed on a substrate by rinsing the substrate in ozonated water Sep. 17, 2002
6376859 Variable porosity porous silicon isolation Apr. 23, 2002
6372662 Method of oxidizing a silicon surface Apr. 16, 2002
6362079 Semiconductor device and method of anodization for the semiconductor device Mar. 26, 2002
6352893 Low temperature self-aligned collar formation Mar. 5, 2002
6309983 Low temperature sacrificial oxide formation Oct. 30, 2001
6197654 Lightly positively doped silicon wafer anodization process Mar. 6, 2001
6165914 Method for fabricating semiconductor devices with thick high quality oxides Dec. 26, 2000
6121095 Method for fabricating gate oxide Sep. 19, 2000
6080683 Room temperature wet chemical growth process of SiO based oxides on silicon Jun. 27, 2000
5989718 Dielectric diffusion barrier Nov. 23, 1999
5951833 Anodizing apparatus Sep. 14, 1999
5785838 Method for producing an oxide film Jul. 28, 1998
5736454 Method for making a silicon dioxide layer on a silicon substrate by pure water anodization followed by rapid thermal densification Apr. 7, 1998
5712198 Pre-thermal treatment cleaning process Jan. 27, 1998
5704986 Semiconductor substrate dry cleaning method Jan. 6, 1998
5616233 Method for making a fluorinated silicon dioxide layer on silicon substrate by anodic oxidation at room temperature Apr. 1, 1997
5516730 Pre-thermal treatment cleaning process of wafers May. 14, 1996
5326712 Method for manufacturing a thin film transistor Jul. 5, 1994
5100519 Method of trapping ion in silicon oxide film or silicon oxy-nitride film Mar. 31, 1992
4247373 Method of making semiconductor device Jan. 27, 1981
4130542 Polyurethanes stabilized against ultraviolet light and nitrogen oxide deterioration Dec. 19, 1978
4096619 Semiconductor scribing method Jun. 27, 1978
4075756 Process for fabricating above and below ground plane wiring on one side of a supporting substrate and the resulting circuit configuration Feb. 28, 1978
4056681 Self-aligning package for integrated circuits Nov. 1, 1977
4056415 Method for providing electrical isolating material in selected regions of a semiconductive material Nov. 1, 1977
4032418 Method of introducing impurities into a semiconductor Jun. 28, 1977
4016017 Integrated circuit isolation structure and method for producing the isolation structure Apr. 5, 1977

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