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Class Information
Number: 257/E21.284
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Composed of oxide or glassy oxide or oxide based glass (epo) > Formed by oxidation (epo) > Of semiconductor material, e.g., by oxidation of semiconductor body itself (epo) > By thermal oxidation (epo)
Description: This subclass is indented under subclass E21.283. This subclass is substantially the same in scope as ECLA classification H01L21/316C2B.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.285 Of silicon (epo) 488
257/E21.286 Of group iii-v compound (epo) 39


Patents under this class:
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Patent Number Title Of Patent Date Issued
8501636 Method for fabricating silicon dioxide layer Aug. 6, 2013
8389412 Finishing method for a silicon on insulator substrate Mar. 5, 2013
8263501 Silicon dioxide film fabricating process Sep. 11, 2012
8241993 Method for shallow trench isolation Aug. 14, 2012
7989363 Method for rapid thermal treatment using high energy electromagnetic radiation of a semiconductor substrate for formation of dielectric films Aug. 2, 2011
7955922 Manufacturing method of fin-type field effect transistor Jun. 7, 2011
7906402 Compensation techniques for substrate heating processes Mar. 15, 2011
7892935 Semiconductor process Feb. 22, 2011
7807548 Process of forming and controlling rough interfaces Oct. 5, 2010
7727828 Method for fabricating a gate dielectric of a field effect transistor Jun. 1, 2010
7709400 Thermal methods for cleaning post-CMP wafers May. 4, 2010
7682990 Method of manufacturing nonvolatile semiconductor memory device Mar. 23, 2010
7622402 Method for forming underlying insulation film Nov. 24, 2009
7582527 Method for fabricating semiconductor device Sep. 1, 2009
7531464 Semiconductive device fabricated using a substantially disassociated chlorohydrocarbon May. 12, 2009
7495266 Strained silicon-on-silicon by wafer bonding and layer transfer Feb. 24, 2009
7470594 System and method for controlling the formation of an interfacial oxide layer in a polysilicon emitter transistor Dec. 30, 2008
7446000 Method of fabricating semiconductor device having gate dielectrics with different thicknesses Nov. 4, 2008
7425480 Semiconductor device and method of manufacture thereof Sep. 16, 2008
7326655 Method of forming an oxide layer Feb. 5, 2008
7303946 Method of manufacturing a semiconductor device using an oxidation process Dec. 4, 2007
7273819 Method and apparatus for processing semiconductor substrates Sep. 25, 2007
7250376 Method for fabricating semiconductor integrated circuit device Jul. 31, 2007
7238625 Method for processing a semiconductor device comprising a silicon-oxy-nitride dielectric layer Jul. 3, 2007
7183143 Method for forming nitrided tunnel oxide layer Feb. 27, 2007
7064084 Oxide film forming method Jun. 20, 2006
7008880 Method for fabricating semiconductor integrated circuit device Mar. 7, 2006
6987056 Method of forming gates in semiconductor devices Jan. 17, 2006
6974779 Interfacial oxidation process for high-k gate dielectric process integration Dec. 13, 2005
6962881 Method for fabricating semiconductor integrated circuit device Nov. 8, 2005
6962880 Method for fabricating semiconductor integrated circuit device Nov. 8, 2005
6929998 Method for forming bottle-shaped trench Aug. 16, 2005
6897149 Method of producing electronic device material May. 24, 2005
6855642 Method for fabricating semiconductor integrated circuit device Feb. 15, 2005
6815299 Method for manufacturing silicon carbide device using water rich anneal Nov. 9, 2004
6812158 Modular growth of multiple gate oxides Nov. 2, 2004
6805139 Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturing Oct. 19, 2004
6797194 Surface treating for micromachining and method for surface treatment Sep. 28, 2004
6794227 Method of producing an SOI wafer Sep. 21, 2004
6740555 Semiconductor structures and manufacturing methods May. 25, 2004
6673696 Post trench fill oxidation process for strained silicon processes Jan. 6, 2004
6605860 Semiconductor structures and manufacturing methods Aug. 12, 2003
6596650 Method for fabricating semiconductor integrated circuit device Jul. 22, 2003
6593175 Method of controlling a shape of an oxide layer formed on a substrate Jul. 15, 2003
6569780 Method for fabricating semiconductor integrated circuit device May. 27, 2003
6528431 Method for fabricating semiconductor integrated circuit drive using an oxygen and hydrogen catalyst Mar. 4, 2003
6518201 Method for fabricating semiconductor integrated circuit device Feb. 11, 2003
6518202 Method for fabricating semiconductor integrated circuit device Feb. 11, 2003
6417114 Method for fabricating semiconductor integrated circuit device Jul. 9, 2002
6407008 Method of forming an oxide layer Jun. 18, 2002

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