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Class Information
Number: 257/E21.282
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Composed of oxide or glassy oxide or oxide based glass (epo) > Formed by oxidation (epo)
Description: This subclass is indented under subclass E21.271. This subclass is substantially the same in scope as ECLA classification H01L21/316C.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.29 Of metallic layer, e.g., al deposited on body, e.g., formation of multi-layer insulating structures (epo) 225
257/E21.283 Of semiconductor material, e.g., by oxidation of semiconductor body itself (epo) 94

Patents under this class:

Patent Number Title Of Patent Date Issued
8685832 Trench filling method and method of manufacturing semiconductor integrated circuit device Apr. 1, 2014
8642486 Thin film forming method, thin film forming apparatus, and program Feb. 4, 2014
8546271 Method of improving oxide growth rate of selective oxidation processes Oct. 1, 2013
8546272 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Oct. 1, 2013
8501636 Method for fabricating silicon dioxide layer Aug. 6, 2013
8435906 Methods for forming conformal oxide layers on semiconductor devices May. 7, 2013
8404602 Plasma oxidation method and plasma oxidation apparatus Mar. 26, 2013
8404601 Method of manufacturing a semiconductor device Mar. 26, 2013
8357619 Film formation method for forming silicon-containing insulating film Jan. 22, 2013
8329597 Semiconductor process having dielectric layer including metal oxide and MOS transistor process Dec. 11, 2012
8263501 Silicon dioxide film fabricating process Sep. 11, 2012
8252701 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus Aug. 28, 2012
8236707 Method of manufacturing a semiconductor device Aug. 7, 2012
8236595 Nanowire sensor, nanowire sensor array and method of fabricating the same Aug. 7, 2012
8222163 Method of flattening a recess in a substrate and fabricating a semiconductor structure Jul. 17, 2012
8105956 Methods of forming silicon oxides and methods of forming interlevel dielectrics Jan. 31, 2012
8084369 Producing method of semiconductor device and substrate processing apparatus Dec. 27, 2011
8043981 Dual frequency low temperature oxidation of a semiconductor device Oct. 25, 2011
8011319 Method for oxidizing a layer, and associated holding devices for a substrate Sep. 6, 2011
7989363 Method for rapid thermal treatment using high energy electromagnetic radiation of a semiconductor substrate for formation of dielectric films Aug. 2, 2011
7989364 Plasma oxidation processing method Aug. 2, 2011
7977254 Method of forming a gate insulator in group III-V nitride semiconductor devices Jul. 12, 2011
7951728 Method of improving oxide growth rate of selective oxidation processes May. 31, 2011
7910495 Plasma oxidizing method, plasma processing apparatus, and storage medium Mar. 22, 2011
7838438 Dielectric layer, method of manufacturing the dielectric layer and method of manufacturing capacitor using the same Nov. 23, 2010
7737048 Method for controlling thickness distribution of a film Jun. 15, 2010
7642152 Method of fabricating spacers and cleaning method of post-etching and semiconductor device Jan. 5, 2010
7615499 Method for oxidizing a layer, and associated holding devices for a substrate Nov. 10, 2009
7563628 Fabrication of optical waveguide devices Jul. 21, 2009
7452826 Oxidation method and oxidation system Nov. 18, 2008
7446000 Method of fabricating semiconductor device having gate dielectrics with different thicknesses Nov. 4, 2008
7381631 Use of expanding material oxides for nano-fabrication Jun. 3, 2008
7304002 Method of oxidizing member to be treated Dec. 4, 2007
7304003 Oxidizing method and oxidizing unit for object to be processed Dec. 4, 2007
6893914 Method for manufacturing semiconductor device May. 17, 2005
6759263 Method of patterning a layer of magnetic material Jul. 6, 2004
6759296 Method of manufacturing a flash memory cell Jul. 6, 2004
6566264 Method for forming an opening in a semiconductor device substrate May. 20, 2003
6551947 Method of forming a high quality gate oxide at low temperatures Apr. 22, 2003
6548342 Method of producing oxide dielectric element, and memory and semiconductor device using the element Apr. 15, 2003
6544906 Annealing of high-k dielectric materials Apr. 8, 2003
6410456 Method and apparatus for insitu vapor generation Jun. 25, 2002
6379870 Method for determining side wall oxidation of low-k materials Apr. 30, 2002
6248640 Method for forming capacitor of semiconductor device using high temperature oxidation Jun. 19, 2001
6232235 Method of forming a semiconductor device May. 15, 2001
6159866 Method for insitu vapor generation for forming an oxide on a substrate Dec. 12, 2000
6037273 Method and apparatus for insitu vapor generation Mar. 14, 2000
5846888 Method for in-situ incorporation of desirable impurities into high pressure oxides Dec. 8, 1998
5739049 Method for fabricating semiconductor device having a capacitor and a method of forming metal wiring on a semiconductor substrate Apr. 14, 1998
5698468 Silicidation process with etch stop Dec. 16, 1997

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