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Class Information
Number: 257/E21.279
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Composed of oxide or glassy oxide or oxide based glass (epo) > Deposition from gas or vapor (epo) > Deposition of silicon oxide (epo) > On silicon body (epo)
Description: This subclass is indented under subclass E21.278. This subclass is substantially the same in scope as ECLA classification H01L21/316B2B.

Patents under this class:
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Patent Number Title Of Patent Date Issued
8609516 Atmospheric pressure chemical vapor deposition method for producing an-N-semiconductive metal sulfide thin layer Dec. 17, 2013
8492281 Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate Jul. 23, 2013
8440552 Method to form low series resistance transistor devices on silicon on insulator layer May. 14, 2013
8338273 Pulsed selective area lateral epitaxy for growth of III-nitride materials over non-polar and semi-polar substrates Dec. 25, 2012
8252703 Methods for forming roughened surfaces and applications thereof Aug. 28, 2012
8232176 Dielectric deposition and etch back processes for bottom up gapfill Jul. 31, 2012
8202806 Method to avoid threshold voltage shift in thicker dielectric films Jun. 19, 2012
8193065 Asymmetric source and drain stressor regions Jun. 5, 2012
8101529 Carbon nanotube resistor, semiconductor device, and manufacturing method thereof Jan. 24, 2012
8021991 Technique to radiation-harden trench refill oxides Sep. 20, 2011
7964517 Use of a biased precoat for reduced first wafer defects in high-density plasma process Jun. 21, 2011
7935643 Stress management for tensile films May. 3, 2011
7927976 Reinforced composite stamp for dry transfer printing of semiconductor elements Apr. 19, 2011
7923382 Method for forming roughened surface Apr. 12, 2011
7923378 Film formation method and apparatus for forming silicon-containing insulating film Apr. 12, 2011
7884022 Multiple deposition for integration of spacers in pitch multiplication process Feb. 8, 2011
7851385 Low temperature conformal oxide formation and applications Dec. 14, 2010
7829393 Copper gate electrode of liquid crystal display device and method of fabricating the same Nov. 9, 2010
7829924 Semiconductor device and method for fabricating the same Nov. 9, 2010
7795056 Semiconductor device and method of fabricating the same Sep. 14, 2010
7790626 Plasma sputtering film deposition method and equipment Sep. 7, 2010
7772637 Semiconductor devices including gate structures and leakage barrier oxides Aug. 10, 2010
7759205 Methods for fabricating semiconductor devices minimizing under-oxide regrowth Jul. 20, 2010
7682990 Method of manufacturing nonvolatile semiconductor memory device Mar. 23, 2010
7674727 Nitrous oxide anneal of TEOS/ozone CVD for improved gapfill Mar. 9, 2010
7651924 Method of fabricating semiconductor memory device in which an oxide film fills a trench in a semiconductor substrate Jan. 26, 2010
7652354 Semiconductor devices and methods of manufacturing semiconductor devices Jan. 26, 2010
7642152 Method of fabricating spacers and cleaning method of post-etching and semiconductor device Jan. 5, 2010
7638800 Wire for a display device, a method for manufacturing the same, a thin film transistor array panel including the wire, and a method for manufacturing the same Dec. 29, 2009
7605095 Heat processing method and apparatus for semiconductor process Oct. 20, 2009
7601604 Method for fabricating conducting plates for a high-Q MIM capacitor Oct. 13, 2009
7582555 CVD flowable gap fill Sep. 1, 2009
7563718 Method for forming tungsten layer of semiconductor device and method for forming tungsten wiring layer using the same Jul. 21, 2009
7560377 Plasma processes for depositing low dielectric constant films Jul. 14, 2009
7544625 Silicon oxide thin-films with embedded nanocrystalline silicon Jun. 9, 2009
7544614 Method of forming a coated film, method of forming an electronic device, and method of manufacturing an electron emission element Jun. 9, 2009
7541297 Method and system for improving dielectric film quality for void free gap fill Jun. 2, 2009
7537971 Method for fabricating CMOS image sensor May. 26, 2009
7538009 Method for fabricating STI gap fill oxide layer in semiconductor devices May. 26, 2009
7534711 System and method for direct etching May. 19, 2009
7531466 Metal organic deposition precursor solution synthesis and terbium-doped SiO.sub.2 thin film deposition May. 12, 2009
7531468 System and method for forming a gate dielectric May. 12, 2009
7524750 Integrated process modulation (IPM) a novel solution for gapfill with HDP-CVD Apr. 28, 2009
7521316 Methods of forming gate structures for semiconductor devices Apr. 21, 2009
7479688 STI stress modification by nitrogen plasma treatment for improving performance in small width devices Jan. 20, 2009
7470632 Method of depositing a silicon dioxide comprising layer doped with at least one of P, B and Ge Dec. 30, 2008
7468326 Method of cleaning a wafer Dec. 23, 2008
7456116 Gap-fill depositions in the formation of silicon containing dielectric materials Nov. 25, 2008
7446061 Method of forming insulating film, method of manufacturing semiconductor device and their controlling computer program Nov. 4, 2008
7442656 Method and apparatus for forming silicon oxide film Oct. 28, 2008

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