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Class Information
Number: 257/E21.273
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Composed of oxide or glassy oxide or oxide based glass (epo) > Deposition of porous oxide or porous glassy oxide or oxide based porous glass (epo)
Description: This subclass is indented under subclass E21.271. This subclass is substantially the same in scope as ECLA classification H01L21/316P.

Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
8703625 Methods to prepare silicon-containing films Apr. 22, 2014
8628994 Semiconductor light-emitting device and method for manufacturing the same Jan. 14, 2014
8399365 Methods of forming titanium silicon oxide Mar. 19, 2013
8293662 Method of manufacturing semiconductor device, apparatus for manufacturing same, and storage medium Oct. 23, 2012
8288771 Thin film transistor array panel and manufacturing method thereof Oct. 16, 2012
8222659 Semiconductor light-emitting device and method for manufacturing the same Jul. 17, 2012
8207059 Silicon compound, ultraviolet absorbent, method for manufacturing multilayer wiring device and multilayer wiring device Jun. 26, 2012
8129269 Method of improving mechanical properties of semiconductor interconnects with nanoparticles Mar. 6, 2012
8101958 Semiconductor light-emitting device Jan. 24, 2012
8097932 Ultra low .kappa. plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality Jan. 17, 2012
8080483 Double gyroid structure nanoporous films and nanowire networks Dec. 20, 2011
7977240 Metal inks for improved contact resistance Jul. 12, 2011
7968471 Porous insulating film, method for producing the same, and semiconductor device using the same Jun. 28, 2011
7947611 Method of improving initiation layer for low-k dielectric film by digital liquid flow meter May. 24, 2011
7935643 Stress management for tensile films May. 3, 2011
7923384 Formation method of porous insulating film, manufacturing apparatus of semiconductor device, manufacturing method of semiconductor device, and semiconductor device Apr. 12, 2011
7923820 Method of producing a porous dielectric element and corresponding dielectric element Apr. 12, 2011
7871835 Method for packaging light-emitting diode Jan. 18, 2011
7867922 Film forming method for dielectric film Jan. 11, 2011
7867331 Coating composition optimization for via fill and photolithography applications and methods of preparation thereof Jan. 11, 2011
7842518 Method for fabricating semiconductor device Nov. 30, 2010
7732349 Manufacturing method of insulating film and semiconductor device Jun. 8, 2010
7709371 Repairing damage to low-k dielectric materials using silylating agents May. 4, 2010
7687409 Atomic layer deposited titanium silicon oxide films Mar. 30, 2010
7674390 Zeolite--sol gel nano-composite low k dielectric Mar. 9, 2010
7633163 Very low dielectric constant plasma-enhanced CVD films Dec. 15, 2009
7629272 Ultraviolet assisted porogen removal and/or curing processes for forming porous low k dielectrics Dec. 8, 2009
7629224 VLSI fabrication processes for introducing pores into dielectric materials Dec. 8, 2009
7615498 Method of manufacturing a semiconductor device Nov. 10, 2009
7598166 Dielectric layers for metal lines in semiconductor chips Oct. 6, 2009
7579271 Method for forming low dielectric constant fluorine-doped layers Aug. 25, 2009
7566976 Semiconductor device and method for fabricating the same Jul. 28, 2009
7563727 Low-k dielectric layer formed from aluminosilicate precursors Jul. 21, 2009
7554200 Semiconductor devices including porous insulators Jun. 30, 2009
7544536 Metal oxide dispersion for dye-sensitized solar cells, photoactive electrode and dye-sensitized solar cell Jun. 9, 2009
7531457 Method of fabricating suspended structure May. 12, 2009
7514347 Interconnect structure and fabricating method thereof Apr. 7, 2009
7510982 Creation of porosity in low-k films by photo-disassociation of imbedded nanoparticles Mar. 31, 2009
7501353 Method of formation of a damascene structure utilizing a protective film Mar. 10, 2009
7491658 Ultra low k plasma enhanced chemical vapor deposition processes using a single bifunctional precursor containing both a SiCOH matrix functionality and organic porogen functionality Feb. 17, 2009
7482676 Compositions for preparing low dielectric materials Jan. 27, 2009
7459793 Methods for forming contact hole, for manufacturing circuit board and for manufacturing electro-optical device Dec. 2, 2008
7456116 Gap-fill depositions in the formation of silicon containing dielectric materials Nov. 25, 2008
7456112 Method of fabricating micro-needle array Nov. 25, 2008
7429789 Fluoropolymer dielectric composition for use in circuitized substrates and circuitized substrate including same Sep. 30, 2008
7422975 Composite inter-level dielectric structure for an integrated circuit Sep. 9, 2008
7413998 Biased pulse DC reactive sputtering of oxide films Aug. 19, 2008
7411275 Semiconductor device comprising an inorganic insulating film and method of manufacturing the same Aug. 12, 2008
7385276 Semiconductor device, and method for manufacturing the same Jun. 10, 2008
7345351 Coating composition for insulating film production, preparation method of insulation film by using the same, insulation film for semi-conductor device prepared therefrom, and semi-conductor de Mar. 18, 2008

1 2 3 4 5 6 7 8

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