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Class Information
Number: 257/E21.271
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Composed of oxide or glassy oxide or oxide based glass (epo)
Description: This subclass is indented under subclass E21.266. This subclass is substantially the same in scope as ECLA classification H01L21/316.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.274 Deposition from gas or vapor (epo) 636
257/E21.273 Deposition of porous oxide or porous glassy oxide or oxide based porous glass (epo) 360
257/E21.282 Formed by oxidation (epo) 50
257/E21.272 With perovskite structure (epo) 614

Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
8557716 Semiconductor device manufacturing method and substrate processing apparatus Oct. 15, 2013
8405202 MEMS packaging scheme using dielectric fence Mar. 26, 2013
8389421 Film formation method and film formation apparatus Mar. 5, 2013
8318584 Oxide-rich liner layer for flowable CVD gapfill Nov. 27, 2012
8318613 Composition for manufacturing SiO.sub.2 resist layers and method of its use Nov. 27, 2012
8310053 Method of manufacturing a device with a cavity Nov. 13, 2012
8278165 Methods for protecting film layers while removing hardmasks during fabrication of semiconductor devices Oct. 2, 2012
8242031 High quality silicon oxide films by remote plasma CVD from disilane precursors Aug. 14, 2012
8227028 Method for forming amorphous silica-based coating film with low dielectric constant and thus obtained amorphous silica-based coating film Jul. 24, 2012
8187973 Method for manufacturing semiconductor device and the semiconductor device May. 29, 2012
7989363 Method for rapid thermal treatment using high energy electromagnetic radiation of a semiconductor substrate for formation of dielectric films Aug. 2, 2011
7910475 Method for forming low dielectric constant fluorine-doped layers Mar. 22, 2011
7863202 High dielectric constant materials Jan. 4, 2011
7858523 Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same Dec. 28, 2010
7795056 Semiconductor device and method of fabricating the same Sep. 14, 2010
7772133 Method and equipment for forming oxide film Aug. 10, 2010
7736942 Substrate processing apparatus, substrate processing method and storage medium Jun. 15, 2010
7737048 Method for controlling thickness distribution of a film Jun. 15, 2010
7704897 HDP-CVD SiON films for gap-fill Apr. 27, 2010
7691736 Minimizing low-k dielectric damage during plasma processing Apr. 6, 2010
7682989 Formation of a silicon oxide interface layer during silicon carbide etch stop deposition to promote better dielectric stack adhesion Mar. 23, 2010
7659475 Method for backside surface passivation of solar cells and solar cells with such passivation Feb. 9, 2010
7572731 Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same Aug. 11, 2009
7541626 High K-gate oxide TFTs built on transparent glass or transparent flexible polymer substrate Jun. 2, 2009
7541296 Method for forming insulating film, method for forming multilayer structure and method for manufacturing semiconductor device Jun. 2, 2009
7488655 Method for fabricating semiconductor device Feb. 10, 2009
7445953 Low temperature curable materials for optical applications Nov. 4, 2008
7439154 Method of fabricating interconnect structure Oct. 21, 2008
7416955 Method of manufacturing a semiconductor device Aug. 26, 2008
7410916 Method of improving initiation layer for low-k dielectric film by digital liquid flow meter Aug. 12, 2008
7407895 Process for producing dielectric insulating thin film, and dielectric insulating material Aug. 5, 2008
7294909 Electronic package repair process Nov. 13, 2007
7265009 HDP-CVD methodology for forming PMD layer Sep. 4, 2007
7160819 Method to perform selective atomic layer deposition of zinc oxide Jan. 9, 2007
7141503 Methods for manufacturing a soft error and defect resistant pre-metal dielectric layer Nov. 28, 2006
7074489 Low dielectric constant material and method of processing by CVD Jul. 11, 2006
7071107 Method for manufacturing a semiconductor device Jul. 4, 2006
7060361 Silica-based organic film and method of manufacturing the same, and base material comprising organic film Jun. 13, 2006
7053005 Method of forming a silicon oxide layer in a semiconductor manufacturing process May. 30, 2006
7041607 Method for fabricating crystalline-dielectric thin films and devices formed using same May. 9, 2006
7030010 Methods for creating electrophoretically insulated vias in semiconductive substrates and resulting structures Apr. 18, 2006
7026170 Methods of controlling optical properties of a capping insulating layer on memory devices, and system for performing same Apr. 11, 2006
7015144 Compositions including perhydro-polysilazane used in a semiconductor manufacturing process and methods of manufacturing semiconductor devices using the same Mar. 21, 2006
7015061 Low temperature curable materials for optical applications Mar. 21, 2006
6998356 Method of fabricating a semiconductor device including a dielectric layer formed using a reactive agent Feb. 14, 2006
6995096 Method for forming multi-layer wiring structure Feb. 7, 2006
6995065 Selective post-doping of gate structures by means of selective oxide growth Feb. 7, 2006
6992013 Method of forming a fine pattern using a silicon-oxide-based film, semiconductor device with a silicon-oxide-based film and method of manufacture thereof Jan. 31, 2006
6992115 Preparation of crosslinked particles from polymers having activatible crosslinking groups Jan. 31, 2006
6972262 Method for fabricating semiconductor device with improved tolerance to wet cleaning process Dec. 6, 2005

1 2 3 4 5 6 7 8 9

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