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Class Information
Number: 257/E21.268
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Inorganic layer (epo) > Of silicon (epo)
Description: This subclass is indented under subclass E21.266. This subclass is substantially the same in scope as ECLA classification H01L21/314B1.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.269 Formed by deposition from a gas or vapor (epo) 350


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
8692293 Method to increase breakdown voltage of semiconductor devices Apr. 8, 2014
8546271 Method of improving oxide growth rate of selective oxidation processes Oct. 1, 2013
8546272 Method of manufacturing semiconductor device, method of processing substrate and substrate processing apparatus Oct. 1, 2013
8546920 Semiconductor-on-insulator (SOI) structures including gradient nitrided buried oxide (BOX) Oct. 1, 2013
8492281 Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate Jul. 23, 2013
8288826 Semiconductor-on-insulator (SOI) structures including gradient nitrided buried oxide (BOX) Oct. 16, 2012
8242031 High quality silicon oxide films by remote plasma CVD from disilane precursors Aug. 14, 2012
8216939 Methods of forming openings Jul. 10, 2012
8183165 Plasma processing method May. 22, 2012
8163571 Multi-step deposition control Apr. 24, 2012
8110490 Gate oxide leakage reduction Feb. 7, 2012
8101529 Carbon nanotube resistor, semiconductor device, and manufacturing method thereof Jan. 24, 2012
8072075 CuSiN/SiN diffusion barrier for copper in integrated-circuit devices Dec. 6, 2011
8053373 Semiconductor-on-insulator(SOI) structures including gradient nitrided buried oxide (BOX) Nov. 8, 2011
7964464 Semiconductor device and method of manufacturing the same Jun. 21, 2011
7964513 Method to form ultra high quality silicon-containing compound layers Jun. 21, 2011
7964514 Multiple nitrogen plasma treatments for thin SiON dielectrics Jun. 21, 2011
7960293 Method for forming insulating film and method for manufacturing semiconductor device Jun. 14, 2011
7956393 Composition for photoresist stripper and method of fabricating thin film transistor array substrate Jun. 7, 2011
7951728 Method of improving oxide growth rate of selective oxidation processes May. 31, 2011
7897518 Plasma processing method and computer storage medium Mar. 1, 2011
7772637 Semiconductor devices including gate structures and leakage barrier oxides Aug. 10, 2010
7754595 Method for manufacturing semiconductor device Jul. 13, 2010
7737049 Method for forming a structure on a substrate and device Jun. 15, 2010
7728320 Semiconductor memory device and phase change memory device Jun. 1, 2010
7723241 Plasma processing method and computer storage medium May. 25, 2010
7687377 Method of fabricating phase change memory device Mar. 30, 2010
7678677 Semiconductor device and manufacturing method thereof Mar. 16, 2010
7670902 Method and structure for landing polysilicon contact Mar. 2, 2010
7659214 Method for growing an oxynitride film on a substrate Feb. 9, 2010
7659475 Method for backside surface passivation of solar cells and solar cells with such passivation Feb. 9, 2010
7651953 Method to form ultra high quality silicon-containing compound layers Jan. 26, 2010
7645709 Methods for low temperature oxidation of a semiconductor device Jan. 12, 2010
7615500 Method for depositing film and method for manufacturing semiconductor device Nov. 10, 2009
7569487 Method for atomic layer deposition of materials using a pre-treatment for semiconductor devices Aug. 4, 2009
7563726 Semiconductor device with multiple gate dielectric layers and method for fabricating the same Jul. 21, 2009
7521316 Methods of forming gate structures for semiconductor devices Apr. 21, 2009
7517814 Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently Apr. 14, 2009
7511381 Thin film transistor and method of manufacturing the same Mar. 31, 2009
7507676 Film formation method and apparatus for semiconductor process Mar. 24, 2009
7456067 Method with high gapfill capability for semiconductor devices Nov. 25, 2008
7416907 Semiconductor device and method for forming the same Aug. 26, 2008
7396748 Semiconductor device includes gate insulating film having a high dielectric constant Jul. 8, 2008
7361613 Semiconductor device, manufacture and evaluation methods for semiconductor device, and process condition evaluation method Apr. 22, 2008
7351668 Film formation method and apparatus for semiconductor process Apr. 1, 2008
7351670 Method for producing silicon nitride films and process for fabricating semiconductor devices using said method Apr. 1, 2008
7297641 Method to form ultra high quality silicon-containing compound layers Nov. 20, 2007
7294582 Low temperature silicon compound deposition Nov. 13, 2007
7279435 Apparatus for stabilizing high pressure oxidation of a semiconductor device Oct. 9, 2007
7217612 Manufacturing method for a semiconductor device with reduced local current May. 15, 2007

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