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Class Information
Number: 257/E21.265
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Organic layers, e.g., photoresist (epo) > By langmuir-blodgett technique (epo)
Description: This subclass is indented under subclass E21.259. This subclass is substantially the same in scope as ECLA classification H01L21/312L.










Patents under this class:

Patent Number Title Of Patent Date Issued
8513086 Methods for etching doped oxides in the manufacture of microfeature devices Aug. 20, 2013
8338884 Selective epitaxial growth of semiconductor materials with reduced defects Dec. 25, 2012
7879710 Substrate processing including a masking layer Feb. 1, 2011
7297557 Method for chemically bonding Langmuir-Blodgett films to substrates Nov. 20, 2007
6225239 Organic films and a process for producing fine pattern using the same May. 1, 2001
5545432 Synthesis of metal oxide thin films Aug. 13, 1996
5429708 Molecular layers covalently bonded to silicon surfaces Jul. 4, 1995
5352485 Synthesis of metal oxide thin films Oct. 4, 1994
5264731 Method for fabricating semiconductor device Nov. 23, 1993
5246784 Ultrathin thermostable bismaleimide films and production thereof Sep. 21, 1993
5079179 Process of making GaAs electrical circuit devices with Langmuir-Blodgett insulator layer Jan. 7, 1992
5071733 Patterned thin film and process for preparing the same Dec. 10, 1991
5072262 Electric-electronic device including polyimide thin film Dec. 10, 1991
5035782 Method for the formation of monomolecular adsorption films or built-up films of monomolecular layers using silane compounds having an acetylene or diacetylene bond Jul. 30, 1991
4966743 Process for making ultrathin polymeric imine films Oct. 30, 1990
4943471 Patterned thin film and process for preparing the same Jul. 24, 1990
4939214 Film comprised of at least one monomolecular layer and process for its preparation using a higher alkyl amine Jul. 3, 1990
4908299 Pattern forming method Mar. 13, 1990
4907038 Langmuir Blodgett ultrathin membrane of polyfumarate Mar. 6, 1990
4839219 Thin film and device having the same Jun. 13, 1989
4824766 Pattern forming method Apr. 25, 1989
4751171 Pattern forming method Jun. 14, 1988
4715929 Pattern forming method Dec. 29, 1987
4696838 Method of forming built-up film of fluorinated aliphatic compound on substrate surface Sep. 29, 1987
4681799 Ultrathin polymeric imine films and process for making the same Jul. 21, 1987
4539061 Process for the production of built-up films by the stepwise adsorption of individual monolayers Sep. 3, 1985











 
 
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