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Class Information
Number: 257/E21.262
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Organic layers, e.g., photoresist (epo) > Layer comprising organo-silicon compound (epo) > Layer comprising polysiloxane compound (epo) > Layer comprising hydrogen silsesquioxane (epo)
Description: This subclass is indented under subclass E21.261. This subclass is substantially the same in scope as ECLA classification H01L21/312B2B.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8395144 Anthracene derivatives and organic electroluminescent device using same Mar. 12, 2013
8357972 Semiconductor power device Jan. 22, 2013
8294208 Semiconductor device having a gate contact on one surface electrically connected to a gate bus on an opposing surface Oct. 23, 2012
7923383 Method and apparatus for treating a semi-conductor substrate Apr. 12, 2011
7867331 Coating composition optimization for via fill and photolithography applications and methods of preparation thereof Jan. 11, 2011
7756384 Method for forming anti-reflective coating Jul. 13, 2010
7560378 Method for manufacturing semiconductor device Jul. 14, 2009
7507631 Epitaxial filled deep trench structures Mar. 24, 2009
7335585 Method for preventing the formation of a void in a bottom anti-reflective coating filling a via hole Feb. 26, 2008
7256146 Method of forming a ceramic diffusion barrier layer Aug. 14, 2007
7189663 Organic semiconductor device having an active dielectric layer comprising silsesquioxanes Mar. 13, 2007
7148108 Method of manufacturing semiconductor device having step gate Dec. 12, 2006
7060637 Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials Jun. 13, 2006
7041748 Patternable low dielectric constant materials and their use in ULSI interconnection May. 9, 2006
7019099 Siloxane-based resin and method for forming insulating film between interconnect layers in semiconductor devices by using the same Mar. 28, 2006
7018918 Method of forming a selectively converted inter-layer dielectric using a porogen material Mar. 28, 2006
7011868 Fluorine-free plasma curing process for porous low-k materials Mar. 14, 2006
6977438 Dual damascene circuit with upper wiring and interconnect line positioned in regions formed as two layers including organic polymer layer and low-permittivity layer Dec. 20, 2005
6943121 Selectively converted inter-layer dielectric Sep. 13, 2005
6930393 Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device Aug. 16, 2005
6924222 Formation of interconnect structures by removing sacrificial material with supercritical carbon dioxide Aug. 2, 2005
6916724 Semiconductor device and method for manufacturing the same Jul. 12, 2005
6909195 Trench etch process for low-k dielectrics Jun. 21, 2005
6891237 Organic semiconductor device having an active dielectric layer comprising silsesquioxanes May. 10, 2005
6890848 Fabrication process of a semiconductor device May. 10, 2005
6888183 Manufacture method for semiconductor device with small variation in MOS threshold voltage May. 3, 2005
6875709 Application of a supercritical CO2 system for curing low k dielectric materials Apr. 5, 2005
6875699 Method for patterning multilevel interconnects Apr. 5, 2005
6838124 Deposition of fluorosilsesquioxane films Jan. 4, 2005
6831368 Semiconductor device and method of manufacturing the same Dec. 14, 2004
6812128 Method of manufacturing multilayer structured semiconductor device Nov. 2, 2004
6794293 Trench etch process for low-k dielectrics Sep. 21, 2004
6787241 Film obtained from silsesquioxane polymer and method of preparing same Sep. 7, 2004
6780777 Method for forming metal layer of semiconductor device Aug. 24, 2004
6764718 Method for forming thin film from electrically insulating resin composition Jul. 20, 2004
6737118 Low dielectric constant materials and their production and use May. 18, 2004
6677680 Hybrid low-k interconnect structure comprised of 2 spin-on dielectric materials Jan. 13, 2004
6649503 Methods of fabricating integrated circuit devices having spin on glass (SOG) insulating layers and integrated circuit devices fabricated thereby Nov. 18, 2003
6638358 Method and system for processing a semiconductor device Oct. 28, 2003
6632748 Composition for preparing substances having nano-pores Oct. 14, 2003
6633082 Semiconductor device and method for manufacturing the semiconductor device Oct. 14, 2003
6627533 Method of manufacturing an insulation film in a semiconductor device Sep. 30, 2003
6623711 Siloxane-based resin and method for forming insulating film between interconnect layers in semiconductor devices by using the same Sep. 23, 2003
6605545 Method for forming hybrid low-K film stack to avoid thermal stress effect Aug. 12, 2003
6603192 Scratch resistance improvement by filling metal gaps Aug. 5, 2003
6583067 Method of avoiding dielectric layer deterioration with a low dielectric constant Jun. 24, 2003
6572974 Modification of infrared reflectivity using silicon dioxide thin films derived from silsesquioxane resins Jun. 3, 2003
6541373 Manufacture method for semiconductor with small variation in MOS threshold voltage Apr. 1, 2003
6515342 Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion Feb. 4, 2003
6514801 Method for manufacturing thin-film transistor Feb. 4, 2003

1 2 3

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