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Class Information
Number: 257/E21.259
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Organic layers, e.g., photoresist (epo)
Description: This subclass is indented under subclass E21.24. This subclass is substantially the same in scope as ECLA classification H01L21/312.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7569478 |
Method and apparatus for manufacturing semiconductor device, control program and computer storage medium |
Aug. 4, 2009 |
| 7560735 |
Semiconductor element, organic transistor, light-emitting device, and electronic device |
Jul. 14, 2009 |
| 7537979 |
Method of manufacturing semiconductor device |
May. 26, 2009 |
| 7538019 |
Forming compliant contact pads for semiconductor packages |
May. 26, 2009 |
| 7514710 |
Bottom gate thin film transistors |
Apr. 7, 2009 |
| 7488687 |
Methods of forming electrical interconnect structures using polymer residues to increase etching selectivity through dielectric layers |
Feb. 10, 2009 |
| 7482281 |
Substrate processing method |
Jan. 27, 2009 |
| 7476970 |
Composition for forming insulating film and method for fabricating semiconductor device |
Jan. 13, 2009 |
| 7473923 |
Organic semiconductor element |
Jan. 6, 2009 |
| 7449372 |
Manufacturing method of substrate having conductive layer and manufacturing method of semiconductor device |
Nov. 11, 2008 |
| 7407824 |
Guard ring for improved matching |
Aug. 5, 2008 |
| 7396725 |
Method of manufacturing semiconductor device |
Jul. 8, 2008 |
| 7396778 |
Method for synthesizing polymeric material, method for forming polymer thin film and method for forming interlayer insulating film |
Jul. 8, 2008 |
| 7382041 |
Organic-inorganic composite insulating material for electronic element, method of producing same and field-effect transistor comprising same |
Jun. 3, 2008 |
| 7361612 |
Barrier coating compositions containing silicon and methods of forming photoresist patterns using the same |
Apr. 22, 2008 |
| 7358597 |
UV-activated dielectric layer |
Apr. 15, 2008 |
| 7352000 |
Organic thin film transistor with polymeric interface |
Apr. 1, 2008 |
| 7348283 |
Mechanically robust dielectric film and stack |
Mar. 25, 2008 |
| 7329619 |
Method for patterning thin film, method and apparatus for fabricating flat panel display |
Feb. 12, 2008 |
| 7319070 |
Semiconductor device fabrication method |
Jan. 15, 2008 |
| 7316983 |
Film formation apparatus and film formation method and cleaning method |
Jan. 8, 2008 |
| 7304000 |
Photoresist trimming process |
Dec. 4, 2007 |
| 7303985 |
Zeolite-carbon doped oxide composite low k dielectric |
Dec. 4, 2007 |
| 7288488 |
Method for resist strip in presence of regular low k and/or porous low k dielectric materials |
Oct. 30, 2007 |
| 7253012 |
Guard ring for improved matching |
Aug. 7, 2007 |
| 7253110 |
Method and apparatus for forming a barrier metal layer in semiconductor devices |
Aug. 7, 2007 |
| 7247555 |
Method to control dual damascene trench etch profile and trench depth uniformity |
Jul. 24, 2007 |
| 7226873 |
Method of improving via filling uniformity in isolated and dense via-pattern regions |
Jun. 5, 2007 |
| 7199062 |
Method for forming a resist film on a substrate having non-uniform topography |
Apr. 3, 2007 |
| 7166546 |
Planarization for integrated circuits |
Jan. 23, 2007 |
| 7135398 |
Reliable low-k interconnect structure with hybrid dielectric |
Nov. 14, 2006 |
| 7119009 |
Semiconductor device with dual damascene wiring |
Oct. 10, 2006 |
| 7071088 |
Method for fabricating bulbous-shaped vias |
Jul. 4, 2006 |
| 7067193 |
Structure and method for improved adhesion between two polymer films |
Jun. 27, 2006 |
| 7060637 |
Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials |
Jun. 13, 2006 |
| 7060909 |
Composition for forming low dielectric constant insulating film, method of forming insulating film using the composition and electronic parts having the insulating film produced thereby |
Jun. 13, 2006 |
| 7061081 |
Resin composition, heat-resistant resin paste and semiconductor device using them and method for manufacture thereof |
Jun. 13, 2006 |
| 7057263 |
Semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
Jun. 6, 2006 |
| 7056837 |
Process of insulating a semiconductor device using a polymeric material |
Jun. 6, 2006 |
| 7053008 |
Resist application method and device |
May. 30, 2006 |
| 7049220 |
Method of forming cavity between multilayered wirings |
May. 23, 2006 |
| 7049169 |
Method of fabricating a semiconductor device |
May. 23, 2006 |
| 7049005 |
Organic compositions |
May. 23, 2006 |
| 7049371 |
Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same |
May. 23, 2006 |
| 7050710 |
Thermal treatment equipment and thermal treatment method |
May. 23, 2006 |
| 7041910 |
Emissive, high charge transport polymers |
May. 9, 2006 |
| 7038307 |
Semiconductor chip with FIB protection |
May. 2, 2006 |
| 7037839 |
Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry |
May. 2, 2006 |
| 7034409 |
Method of eliminating photoresist poisoning in damascene applications |
Apr. 25, 2006 |
| 7029723 |
Forming chemical vapor depositable low dielectric constant layers |
Apr. 18, 2006 |
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