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Class Information
Number: 257/E21.258
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Using masks (epo)
Description: This subclass is indented under subclass E21.24. This subclass is substantially the same in scope as ECLA classification H01L21/32.

Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8710682 Materials and methods for stress reduction in semiconductor wafer passivation layers Apr. 29, 2014
8642474 Spacer lithography Feb. 4, 2014
8637945 Component having a micromechanical microphone structure, and method for its production Jan. 28, 2014
8614148 Methods for forming fine patterns of a semiconductor device Dec. 24, 2013
8492259 Method of forming metal gate structure Jul. 23, 2013
8476168 Non-conformal hardmask deposition for through silicon etch Jul. 2, 2013
8431458 Methods of forming a nonvolatile memory cell and methods of forming an array of nonvolatile memory cells Apr. 30, 2013
8415812 Materials and methods for stress reduction in semiconductor wafer passivation layers Apr. 9, 2013
8372708 Device structure and manufacturing method using HDP deposited using deposited source-body implant block Feb. 12, 2013
8349741 Amorphous carbon deposition method for improved stack defectivity Jan. 8, 2013
8227352 Amorphous carbon deposition method for improved stack defectivity Jul. 24, 2012
8183081 Hybrid heterojunction solar cell fabrication using a metal layer mask May. 22, 2012
8119531 Mask and etch process for pattern assembly Feb. 21, 2012
8080455 Method for fabricating semiconductor device with increased breakdown voltage Dec. 20, 2011
7977141 Solid-state image pickup device and method of manufacturing the same Jul. 12, 2011
7939436 Method of fabricating a semiconductor device May. 10, 2011
7863151 Method for manufacturing semiconductor device Jan. 4, 2011
7727899 Manufacturing method of semiconductor device and semiconductor storage device including fine contact holes Jun. 1, 2010
7560360 Methods for enhancing trench capacitance and trench capacitor Jul. 14, 2009
7541295 Method of manufacturing semiconductor device Jun. 2, 2009
7528041 Method of manufacturing semiconductor device that utilizes oxidation prevention film to form thick and thin gate insulator portions May. 5, 2009
7354866 Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor Apr. 8, 2008
7348198 Liquid crystal display device and fabricating method thereof Mar. 25, 2008
7282440 Integrated circuit contact Oct. 16, 2007
7189619 Process for manufacturing vertically insulated structural components on SOI material of various thickness Mar. 13, 2007
7067411 Method to prevent metal oxide formation during polycide reoxidation Jun. 27, 2006
7033874 Method of forming insulating film and method of fabricating semiconductor device including plasma bias for forming a second insulating film Apr. 25, 2006
7009264 Selective spacer to prevent metal oxide formation during polycide reoxidation Mar. 7, 2006
6995451 Buried collar trench capacitor formed by LOCOS using self starved ALD nitride as an oxidation mask Feb. 7, 2006
6946339 Method for creating a stepped structure on a substrate Sep. 20, 2005
6933235 Method for removing contaminants on a substrate Aug. 23, 2005
6861372 Semiconductor device manufacturing method Mar. 1, 2005
6861319 Gate electrode and method of fabricating the same Mar. 1, 2005
6835672 Selective oxidation for semiconductor device fabrication Dec. 28, 2004
6818495 Method for forming high purity silicon oxide field oxide isolation region Nov. 16, 2004
6800512 Method of forming insulating film and method of fabricating semiconductor device Oct. 5, 2004
6794259 Method for fabricating self-aligning mask layers Sep. 21, 2004
6740248 Method for etching dielectric films May. 25, 2004
6703690 Apparatus for reducing isolation stress in integrated circuits Mar. 9, 2004
6670690 Method of making an improved field oxide isolation structure for semiconductor integrated circuits having higher field oxide threshold voltages Dec. 30, 2003
6656845 Method for forming semiconductor substrate with convex shaped active region Dec. 2, 2003
6649996 In situ and ex situ hardmask process for STI with oxide collar application Nov. 18, 2003
6627511 Reduced stress isolation for SOI devices and a method for fabricating Sep. 30, 2003
6605502 Isolation using an antireflective coating Aug. 12, 2003
6602798 Method and apparatus for reducing isolation stress in integrated circuits Aug. 5, 2003
6593175 Method of controlling a shape of an oxide layer formed on a substrate Jul. 15, 2003
6579807 Method for forming isolation regions on semiconductor device Jun. 17, 2003
6566712 SOI structure semiconductor device and a fabrication method thereof May. 20, 2003
6562723 Hybrid stack method for patterning source/drain areas May. 13, 2003
6497827 Method for etching dielectric films Dec. 24, 2002

1 2 3 4 5 6 7 8 9 10

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