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Class Information
Number: 257/E21.257
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Post-treatment (epo) > Etching insulating layer by chemical or physical means (epo) > Using mask (epo)
Description: This subclass is indented under subclass E21.249. This subclass is substantially the same in scope as ECLA classification H01L21/311D.

Patents under this class:
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Patent Number Title Of Patent Date Issued
8685844 Sub-10 nm graphene nanoribbon lattices Apr. 1, 2014
8673165 Sidewall image transfer process with multiple critical dimensions Mar. 18, 2014
8673786 Method for manufacturing microstructure using self-assembly of amphiphilic polymer Mar. 18, 2014
8673770 Methods of forming conductive structures in dielectric layers on an integrated circuit device Mar. 18, 2014
8664120 Semiconductor device manufacturing method Mar. 4, 2014
8658937 Method and apparatus for processing substrate edges Feb. 25, 2014
8647991 Method for forming dual damascene opening Feb. 11, 2014
8536064 Double patterning strategy for contact hole and trench in photolithography Sep. 17, 2013
8513133 Composition for forming resist underlayer film and method for forming pattern Aug. 20, 2013
8486844 Method and system for isolated and discretized process sequence integration Jul. 16, 2013
8481429 Method of manufacturing semiconductor device Jul. 9, 2013
8476168 Non-conformal hardmask deposition for through silicon etch Jul. 2, 2013
8466070 Methods of forming semiconductor structures Jun. 18, 2013
8461047 Method for processing amorphous carbon film, and semiconductor device manufacturing method using the method Jun. 11, 2013
8431971 Pitch multiplied mask patterns for isolated features Apr. 30, 2013
8338309 Method for forming deep trench in semiconductor device Dec. 25, 2012
8309460 Methods of manufacturing semiconductor devices Nov. 13, 2012
8304262 Wiggling control for pseudo-hardmask Nov. 6, 2012
8298879 Methods of fabricating metal oxide or metal oxynitride TFTS using wet process for source-drain metal etch Oct. 30, 2012
8232184 Method for manufacturing silicon carbide semiconductor device and the silicon carbide semiconductor device Jul. 31, 2012
8227331 Method for depositing a solder material on a substrate Jul. 24, 2012
8211807 Double patterning technology using single-patterning-spacer-technique Jul. 3, 2012
8203176 Dielectric, capacitor using dielectric, semiconductor device using dielectric, and manufacturing method of dielectric Jun. 19, 2012
8187978 Method of forming openings in a semiconductor device and semiconductor device May. 29, 2012
8148232 Overlay mark enhancement feature Apr. 3, 2012
8138560 Microstructure, micromachine, and manufacturing method of microstructure and micromachine Mar. 20, 2012
8070972 Etching method and etching apparatus Dec. 6, 2011
8048811 Method for patterning a metallization layer by reducing resist strip induced damage of the dielectric material Nov. 1, 2011
8043973 Mask overhang reduction or elimination after substrate etch Oct. 25, 2011
8034683 Method of forming a phase change material layer, method of forming a phase change memory device using the same, and a phase change memory device so formed Oct. 11, 2011
8034723 Film deposition apparatus and film deposition method Oct. 11, 2011
8008161 Capacitor assemblies Aug. 30, 2011
8003522 Method for forming trenches with wide upper portion and narrow lower portion Aug. 23, 2011
7988470 Methods of fabricating metal oxide or metal oxynitride TFTs using wet process for source-drain metal etch Aug. 2, 2011
7972965 Process for interfacial adhesion in laminate structures through patterned roughing of a surface Jul. 5, 2011
7964503 Methods of patterning photoresist, and methods of forming semiconductor constructions Jun. 21, 2011
7947569 Method for producing a semiconductor including a foreign material layer May. 24, 2011
7947189 Vacuum processing apparatus and vacuum processing method of sample May. 24, 2011
7938973 Arc layer having a reduced flaking tendency and a method of manufacturing the same May. 10, 2011
7939436 Method of fabricating a semiconductor device May. 10, 2011
7927897 Photoresist composition and method of manufacturing array substrate using the same Apr. 19, 2011
7915160 Methods for forming small contacts Mar. 29, 2011
7910477 Etch residue reduction by ash methodology Mar. 22, 2011
7910487 Reverse masking profile improvements in high aspect ratio etch Mar. 22, 2011
7883632 Plasma processing method Feb. 8, 2011
7879726 Methods of forming semiconductor devices using selective etching of an active region through a hardmask Feb. 1, 2011
7867913 Method for fabricating fine pattern in semiconductor device Jan. 11, 2011
7858458 CMOS fabrication Dec. 28, 2010
7851384 Method to mitigate impact of UV and E-beam exposure on semiconductor device film properties by use of a bilayer film Dec. 14, 2010
7829369 Methods of forming openings Nov. 9, 2010

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