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Class Information
Number: 257/E21.256
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Post-treatment (epo) > Etching insulating layer by chemical or physical means (epo) > Etching organic layer (epo) > By chemical means (epo) > By dry-etching (epo)
Description: This subclass is indented under subclass E21.255. This subclass is substantially the same in scope as ECLA classification H01L21/311C2B.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8647991 Method for forming dual damascene opening Feb. 11, 2014
8501501 Measurement of a sample using multiple models Aug. 6, 2013
8394724 Processing with reduced line end shortening ratio Mar. 12, 2013
8361275 Etching apparatus Jan. 29, 2013
8283254 Etching method and etching apparatus Oct. 9, 2012
8133779 Method of fabricating a semiconductor device Mar. 13, 2012
8017517 Dual damascene process Sep. 13, 2011
7998876 Method of producing semiconductor element Aug. 16, 2011
7981734 Manufacturing method of thin film transistor including low resistance conductive thin films Jul. 19, 2011
7981800 Shallow trench isolation structures and methods for forming the same Jul. 19, 2011
7977245 Methods for etching a dielectric barrier layer with high selectivity Jul. 12, 2011
7968401 Reducing photoresist layer degradation in plasma immersion ion implantation Jun. 28, 2011
7851384 Method to mitigate impact of UV and E-beam exposure on semiconductor device film properties by use of a bilayer film Dec. 14, 2010
7816253 Surface treatment of inter-layer dielectric Oct. 19, 2010
7808026 Dry etching method and production method of magnetic memory device Oct. 5, 2010
7799693 Method for manufacturing a semiconductor device Sep. 21, 2010
7745337 Method of optimizing sidewall spacer size for silicide proximity with in-situ clean Jun. 29, 2010
7737044 Solid state imaging device, manufacturing method of the same, and substrate for solid state imaging device Jun. 15, 2010
7737023 Method of manufacture of semiconductor integrated circuit device and semiconductor integrated circuit device Jun. 15, 2010
7737010 Method of photoresist strip for plasma doping process of semiconductor manufacturing Jun. 15, 2010
7723133 Method for forming pattern, and method for manufacturing liquid crystal display May. 25, 2010
7704888 Methods for removing photoresist from semiconductor structures having high-k dielectric material layers Apr. 27, 2010
7691740 Semiconductor device and method of fabricating same Apr. 6, 2010
7678588 Method for constructing module for optical critical dimension (OCD) and measuring method of module for optical critical dimension using the module Mar. 16, 2010
7674393 Etching method and apparatus Mar. 9, 2010
7615480 Methods of post-contact back end of the line through-hole via integration Nov. 10, 2009
7601641 Two step optical planarizing layer etch Oct. 13, 2009
7569478 Method and apparatus for manufacturing semiconductor device, control program and computer storage medium Aug. 4, 2009
7566644 Method for forming gate electrode of semiconductor device Jul. 28, 2009
7541286 Method for manufacturing semiconductor device using KrF light source Jun. 2, 2009
7517468 Etching method Apr. 14, 2009
7514357 Method of manufacturing a semiconductor device Apr. 7, 2009
7504643 Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement Mar. 17, 2009
7498232 Semiconductor devices and methods of manufacture thereof Mar. 3, 2009
7495239 Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement Feb. 24, 2009
7459363 Line edge roughness reduction Dec. 2, 2008
7459391 Semiconductor device and method of fabricating the same Dec. 2, 2008
7435663 Methods for dicing a released CMOS-MEMS multi-project wafer Oct. 14, 2008
7419902 Method of manufacture of semiconductor integrated circuit Sep. 2, 2008
7416973 Method of increasing the etch selectivity in a contact structure of semiconductor devices Aug. 26, 2008
7413963 Method of edge bevel rinse Aug. 19, 2008
7381622 Method for forming embedded strained drain/source regions based on a combined spacer and cavity etch process Jun. 3, 2008
7344993 Low-pressure removal of photoresist and etch residue Mar. 18, 2008
7344927 Method and apparatus for manufacturing active matrix device including top gate type TFT Mar. 18, 2008
7341935 Alternative interconnect structure for semiconductor devices Mar. 11, 2008
7326653 Method of preparation of organic optoelectronic and electronic devices and devices thereby obtained Feb. 5, 2008
7276448 Method for an integrated circuit contact Oct. 2, 2007
7273817 Conditioning of a reaction chamber Sep. 25, 2007
7235479 Organic solvents having ozone dissolved therein for semiconductor processing utilizing sacrificial materials Jun. 26, 2007
7232768 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials Jun. 19, 2007

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