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Class Information
Number: 257/E21.255
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Post-treatment (epo) > Etching insulating layer by chemical or physical means (epo) > Etching organic layer (epo) > By chemical means (epo)
Description: This subclass is indented under subclass E21.254. This subclass is substantially the same in scope as ECLA classification H01L21/311C2.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.256 By dry-etching (epo) 671

Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8541257 Aligned polymers for an organic TFT Sep. 24, 2013
8513038 Method of manufacturing organic electroluminescent device Aug. 20, 2013
8445381 Oxide-nitride stack gate dielectric May. 21, 2013
8129287 Method for manufacturing semiconductor device and semiconductor device Mar. 6, 2012
7998876 Method of producing semiconductor element Aug. 16, 2011
7993960 Electronic device and method of manufacturing the same Aug. 9, 2011
7977141 Solid-state image pickup device and method of manufacturing the same Jul. 12, 2011
7960288 Photoresist trimming process Jun. 14, 2011
7947605 Post ion implant photoresist strip using a pattern fill and method May. 24, 2011
7829884 Non-volatile ferroelectric thin film device using an organic ambipolar semiconductor and method for processing such a device Nov. 9, 2010
7785944 Method of making double-gated self-aligned finFET having gates of different lengths Aug. 31, 2010
7709363 Method for manufacturing semiconductor device May. 4, 2010
7632756 Semiconductor processing using energized hydrogen gas and in combination with wet cleaning Dec. 15, 2009
7598168 Method of fabricating dual damascene interconnection and etchant for stripping sacrificial layer Oct. 6, 2009
7572651 Inkjet-fabricated integrated circuits Aug. 11, 2009
7435663 Methods for dicing a released CMOS-MEMS multi-project wafer Oct. 14, 2008
7435686 Semiconductor processing using energized hydrogen gas and in combination with wet cleaning Oct. 14, 2008
7387971 Fabricating method for flat panel display device Jun. 17, 2008
7384875 Method of manufacturing semiconductor device using flexible tube Jun. 10, 2008
7232768 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials Jun. 19, 2007
7183192 Composition for removing photoresist and method of forming a bump electrode in a semiconductor device using the composition Feb. 27, 2007
7179751 Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materials Feb. 20, 2007
7125742 Multi-passivation layer structure for organic thin-film transistors and method for fabricating the same Oct. 24, 2006
7105375 Reverse printing Sep. 12, 2006
7067441 Damage-free resist removal process for ultra-low-k processing Jun. 27, 2006
7051742 Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials May. 30, 2006
7037822 Method of forming metal line in semiconductor device May. 2, 2006
7037852 Composition for stripping photoresist and method of preparing the same May. 2, 2006
7030026 Semiconductor device fabrication method Apr. 18, 2006
7018938 Controlled use of photochemically susceptible chemistries for etching, cleaning and surface conditioning Mar. 28, 2006
7018937 Compositions for removal of processing byproducts and method for using same Mar. 28, 2006
7018481 Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle Mar. 28, 2006
6984585 Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer Jan. 10, 2006
6979655 Substrate processing method and substrate processing apparatus Dec. 27, 2005
6967173 Hydrogen plasma photoresist strip and polymeric residue cleanup processs for low dielectric constant materials Nov. 22, 2005
6953722 Method for patterning ceramic layers Oct. 11, 2005
6939794 Boron-doped amorphous carbon film for use as a hard etch mask during the formation of a semiconductor device Sep. 6, 2005
6929713 In-situ photoresist removal by an attachable chamber with light source Aug. 16, 2005
6924222 Formation of interconnect structures by removing sacrificial material with supercritical carbon dioxide Aug. 2, 2005
6921727 Method for modifying dielectric characteristics of dielectric layers Jul. 26, 2005
6905906 Solution processed devices Jun. 14, 2005
6905556 Method and apparatus for using surfactants in supercritical fluid processing of wafers Jun. 14, 2005
6893914 Method for manufacturing semiconductor device May. 17, 2005
6875706 Cleaning solution and method of cleaning a semiconductor device using the same Apr. 5, 2005
6871656 Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process Mar. 29, 2005
6867842 Edge rinse apparatus and edge rinse method Mar. 15, 2005
6867148 Removal of organic material in integrated circuit fabrication using ozonated organic acid solutions Mar. 15, 2005
6846789 Composition and method for removing photoresist materials from electronic components Jan. 25, 2005
6837943 Method and apparatus for cleaning a semiconductor substrate Jan. 4, 2005
6835644 Method for making interconnect structures Dec. 28, 2004

1 2 3 4 5 6

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