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Class Information
Number: 257/E21.254
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Post-treatment (epo) > Etching insulating layer by chemical or physical means (epo) > Etching organic layer (epo)
Description: This subclass is indented under subclass E21.249. This subclass is substantially the same in scope as ECLA classification H01L21/311C.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 8592246 |
Methods of manufacturing a solar cell module |
Nov. 26, 2013 |
| 8558234 |
Low voltage low light imager and photodetector |
Oct. 15, 2013 |
| 8541257 |
Aligned polymers for an organic TFT |
Sep. 24, 2013 |
| 8513142 |
Method of manufacturing non-photosensitive polyimide passivation layer |
Aug. 20, 2013 |
| 8486830 |
Via forming method and method of manufacturing multi-chip package using the same |
Jul. 16, 2013 |
| 8354296 |
Semiconductor structure and circuit including ordered arrangement of graphene nanoribbons, and methods of forming same |
Jan. 15, 2013 |
| 8211804 |
Methods of forming a hole having a vertical profile and semiconductor devices having a vertical hole |
Jul. 3, 2012 |
| 8143168 |
Etching method and manufacturing method of semiconductor device |
Mar. 27, 2012 |
| 8129287 |
Method for manufacturing semiconductor device and semiconductor device |
Mar. 6, 2012 |
| 7985699 |
Substrate processing method and storage medium |
Jul. 26, 2011 |
| 7883919 |
Negative thermal expansion system (NTEs) device for TCE compensation in elastomer compsites and conductive elastomer interconnects in microelectronic packaging |
Feb. 8, 2011 |
| 7749915 |
Protection of polymer surfaces during micro-fabrication |
Jul. 6, 2010 |
| 7556979 |
Negative thermal expansion system (NTEs) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packaging |
Jul. 7, 2009 |
| 7008803 |
Method of reworking structures incorporating low-k dielectric materials |
Mar. 7, 2006 |
| 6861332 |
Air gap interconnect method |
Mar. 1, 2005 |
| 6846756 |
Method for preventing low-k dielectric layer cracking in multi-layered dual damascene metallization layers |
Jan. 25, 2005 |
| 6251542 |
Semiconductor wafer etching method |
Jun. 26, 2001 |
| 6242361 |
Plasma treatment to improve DUV photoresist process |
Jun. 5, 2001 |
| 6133131 |
Method of forming a gate spacer on a semiconductor wafer |
Oct. 17, 2000 |
| 6092537 |
Post-treatment method for dry etching |
Jul. 25, 2000 |
| 6040110 |
Process and apparatus for the removal of resist |
Mar. 21, 2000 |
| 6009888 |
Photoresist and polymer removal by UV laser aqueous oxidant |
Jan. 4, 2000 |
| 5895272 |
Ion-implanted resist removal method |
Apr. 20, 1999 |
| 5874365 |
Semiconductor wafer etching method |
Feb. 23, 1999 |
| 5817182 |
Hydrofluoric etch quenching via a colder rinse process |
Oct. 6, 1998 |
| 5651860 |
Ion-implanted resist removal method |
Jul. 29, 1997 |
| 5270231 |
Method of manufacturing device having ferroelectric film |
Dec. 14, 1993 |
| 5169678 |
Laser ablatable polymer dielectrics and methods |
Dec. 8, 1992 |
| 5114834 |
Photoresist removal |
May. 19, 1992 |
| 4894115 |
Laser beam scanning method for forming via holes in polymer materials |
Jan. 16, 1990 |
| 4857382 |
Apparatus and method for photoetching of polyimides, polycarbonates and polyetherimides |
Aug. 15, 1989 |
| 4764485 |
Method for producing via holes in polymer dielectrics |
Aug. 16, 1988 |
| 4684437 |
Selective metal etching in metal/polymer structures |
Aug. 4, 1987 |
| 4617085 |
Process for removing organic material in a patterned manner from an organic film |
Oct. 14, 1986 |
| 4414059 |
Far UV patterning of resist materials |
Nov. 8, 1983 |
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