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Class Information
Number: 257/E21.251
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Post-treatment (epo) > Etching insulating layer by chemical or physical means (epo) > Etching inorganic layer (epo) > By chemical means (epo)
Description: This subclass is indented under subclass E21.25. This subclass is substantially the same in scope as ECLA classification H01L21/311B2.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.252 By dry-etching (epo) 1,857

Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12

Patent Number Title Of Patent Date Issued
8704224 Semiconductor test structures Apr. 22, 2014
8613287 Apparatus for preventing stiction of MEMS microstructure Dec. 24, 2013
8609459 Method of manufacturing a nanostructure quick-switch memristor Dec. 17, 2013
8501501 Measurement of a sample using multiple models Aug. 6, 2013
8466068 Methods and apparatus for forming memory lines and vias in three dimensional memory arrays using dual damascene process and imprint lithography Jun. 18, 2013
8349078 Method of forming nitride semiconductor epitaxial layer and method of manufacturing nitride semiconductor device Jan. 8, 2013
8148175 Manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device Apr. 3, 2012
7960200 Orientation-dependent etching of deposited AlN for structural use and sacrificial layers in MEMS Jun. 14, 2011
7960258 Method for fabricating nanoscale thermoelectric device Jun. 14, 2011
7939421 Method for fabricating integrated circuit structures May. 10, 2011
7879724 Method of manufacturing a semiconductor device and a semiconductor manufacturing equipment Feb. 1, 2011
7838321 Multiple stage MEMS release for isolation of similar materials Nov. 23, 2010
7727871 Manufacturing method of semiconductor device using etching solution Jun. 1, 2010
7691739 Via electromigration improvement by changing the via bottom geometric profile Apr. 6, 2010
7659206 Removal of silicon oxycarbide from substrates Feb. 9, 2010
7655544 Self-assembled nanostructures Feb. 2, 2010
7622390 Method for treating a dielectric film to reduce damage Nov. 24, 2009
7598168 Method of fabricating dual damascene interconnection and etchant for stripping sacrificial layer Oct. 6, 2009
7456086 Semiconductor having structure with openings Nov. 25, 2008
7427545 Trench memory cells with buried isolation collars, and methods of fabricating same Sep. 23, 2008
7378355 System and methods for polishing a wafer May. 27, 2008
7361610 Method of etching a glass substrate Apr. 22, 2008
7358196 Wet chemical treatment to form a thin oxide for high k gate dielectrics Apr. 15, 2008
7338910 Method of fabricating semiconductor devices and method of removing a spacer Mar. 4, 2008
7309658 Molecular self-assembly in substrate processing Dec. 18, 2007
7151058 Etchant for etching nitride and method for removing a nitride layer using the same Dec. 19, 2006
7132683 Dual purpose test structure for gate-body current measurement in PD/SOI and for direct extraction of physical gate length in scaled CMOS technologies Nov. 7, 2006
7071107 Method for manufacturing a semiconductor device Jul. 4, 2006
7067434 Hydrogen free integration of high-k gate dielectrics Jun. 27, 2006
7060638 Method of forming low dielectric constant porous films Jun. 13, 2006
7056836 Manufacturing method for a semiconductor device Jun. 6, 2006
7052627 Etching solution, etched article and method for etched article May. 30, 2006
7049242 Post high voltage gate dielectric pattern plasma surface treatment May. 23, 2006
7037845 Selective etch process for making a semiconductor device having a high-k gate dielectric May. 2, 2006
7037822 Method of forming metal line in semiconductor device May. 2, 2006
7030024 Dual-gate structure and method of fabricating integrated circuits having dual-gate structures Apr. 18, 2006
7030034 Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum Apr. 18, 2006
7026253 Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask Apr. 11, 2006
7021320 Method of removing a via fence Apr. 4, 2006
7018925 Post high voltage gate oxide pattern high-vacuum outgas surface treatment Mar. 28, 2006
7018927 Method for forming isolation film for semiconductor devices Mar. 28, 2006
7008803 Method of reworking structures incorporating low-k dielectric materials Mar. 7, 2006
7001838 Method of wet etching an inorganic antireflection layer Feb. 21, 2006
6996479 Method and apparatus for measuring and controlling the water content of a water-containing liquid mixture Feb. 7, 2006
6992014 Method and apparatus for etch rate uniformity control Jan. 31, 2006
6987062 Manufacturing method of semiconductor device Jan. 17, 2006
6987064 Method and composition to improve a nitride/oxide wet etching selectivity Jan. 17, 2006
6987321 Copper diffusion deterrent interface Jan. 17, 2006
6977418 Low resistance semiconductor process and structures Dec. 20, 2005
6974756 Methods of forming shallow trench isolation Dec. 13, 2005

1 2 3 4 5 6 7 8 9 10 11 12

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