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Class Information
Number: 257/E21.243
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Post-treatment (epo) > Planarization of insulating layer (epo)
Description: This subclass is indented under subclass E21.241. This subclass is substantially the same in scope as ECLA classification H01L21/3105B.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.244 Involving dielectric removal step (epo) 942

Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8685859 Self-aligned semiconductor trench structures Apr. 1, 2014
8647986 Semiconductor process Feb. 11, 2014
8618615 Semiconductor device and fabrication method thereof Dec. 31, 2013
8551886 CMP process for processing STI on two distinct silicon planes Oct. 8, 2013
8507974 Fin-like field effect transistor (FinFET) non-volatile random access memory (NVRAM) device with bottom erase gate Aug. 13, 2013
8486831 Semiconductor device manufacturing method Jul. 16, 2013
8482053 Nonvolatile semiconductor memory device with high-K insulating film Jul. 9, 2013
8343875 Methods of forming an integrated circuit with self-aligned trench formation Jan. 1, 2013
8252653 Method of forming a non-volatile memory having a silicon nitride charge trap layer Aug. 28, 2012
8173077 Reusable PCR amplification system and method May. 8, 2012
8119485 Semiconductor device and fabrication method thereof Feb. 21, 2012
7972875 Optical systems fabricated by printing-based assembly Jul. 5, 2011
7875556 Precursors for CVD silicon carbo-nitride and silicon nitride films Jan. 25, 2011
7795056 Semiconductor device and method of fabricating the same Sep. 14, 2010
RE41670 Sram cell fabrication with interlevel Dielectric planarization Sep. 14, 2010
7759261 Method for producing layers located on a hybrid circuit Jul. 20, 2010
7732347 Semiconductor device and fabrication process of semiconductor device Jun. 8, 2010
7678712 Vapor phase treatment of dielectric materials Mar. 16, 2010
7670938 Methods of forming contact openings Mar. 2, 2010
7544614 Method of forming a coated film, method of forming an electronic device, and method of manufacturing an electron emission element Jun. 9, 2009
7528059 Method for reducing polish-induced damage in a contact structure by forming a capping layer May. 5, 2009
7510972 Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device Mar. 31, 2009
RE40507 Method of forming pre-metal dielectric film on a semiconductor substrate including first layer of undoped oxide of high ozone:TEOS volume ratio and second layer of low ozone doped BPSG Sep. 16, 2008
7399649 Semiconductor light-emitting device and fabrication method thereof Jul. 15, 2008
7396737 Method of forming shallow trench isolation Jul. 8, 2008
7384827 Method of manufacturing semiconductor device using liquid phase deposition of an interlayer dielectric Jun. 10, 2008
7332405 Method of forming alignment marks for semiconductor device fabrication Feb. 19, 2008
7262488 Substrate with enhanced properties for planarization Aug. 28, 2007
7247571 Method for planarizing semiconductor structures Jul. 24, 2007
7226854 Methods of forming metal lines in semiconductor devices Jun. 5, 2007
7148103 Multilevel poly-Si tiling for semiconductor circuit manufacture Dec. 12, 2006
7141514 Selective plasma re-oxidation process using pulsed RF source power Nov. 28, 2006
7070659 System for filling openings in semiconductor products Jul. 4, 2006
7060323 Method of forming interlayer insulating film Jun. 13, 2006
7053005 Method of forming a silicon oxide layer in a semiconductor manufacturing process May. 30, 2006
6949389 Encapsulation for organic light emitting diodes devices Sep. 27, 2005
6911667 Encapsulation for organic electronic devices Jun. 28, 2005
6905980 Semiconductor device and method of manufacturing same Jun. 14, 2005
6905907 Light emitting device and manufacturing method thereof Jun. 14, 2005
6872418 Film forming method Mar. 29, 2005
6861352 Semiconductor structure having an improved pre-metal dielectric stack and method for forming the same Mar. 1, 2005
6849553 Method of manufacturing semiconductor device Feb. 1, 2005
6835590 Method of manufacturing image sensor for reducing dark current Dec. 28, 2004
6821577 Staggered in-situ deposition and etching of a dielectric layer for HDP CVD Nov. 23, 2004
6809031 Method for manufacturing a reclaimable test pattern wafer for CMP applications Oct. 26, 2004
6805807 Adaptive GCIB for smoothing surfaces Oct. 19, 2004
6803315 Method for blocking implants from the gate of an electronic device via planarizing films Oct. 12, 2004
6797607 Contact planarization using nanoporous silica materials Sep. 28, 2004
6777346 Planarization using plasma oxidized amorphous silicon Aug. 17, 2004
6767475 Chemical-organic planarization process for atomically smooth interfaces Jul. 27, 2004

1 2 3 4 5 6

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