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Class Information
Number: 257/E21.242
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo) > Post-treatment (epo) > Of organic layer (epo)
Description: This subclass is indented under subclass E21.241. This subclass is substantially the same in scope as ECLA classification H01L21/3105P.










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8679987 Deposition of an amorphous carbon layer with high film density and high etch selectivity Mar. 25, 2014
8673793 Method for automatic offset calculation for deposition of an aligned metal pattern onto selective emitter pattern and subsequent monitoring of alignment Mar. 18, 2014
8637113 Methods of forming a non-volatile resistive oxide memory array Jan. 28, 2014
8603867 Composition for removing a photoresist and method of manufacturing a thin-film transistor substrate using the composition Dec. 10, 2013
8541257 Aligned polymers for an organic TFT Sep. 24, 2013
8518836 Semiconductor patterning Aug. 27, 2013
8481429 Method of manufacturing semiconductor device Jul. 9, 2013
8466013 Method for manufacturing a semiconductor structure Jun. 18, 2013
8431433 Methods of providing semiconductor layers from amic acid salts Apr. 30, 2013
8372759 Molecular self-assembly in substrate processing Feb. 12, 2013
8278135 Highly pure film formation method for light emitting device using gas from evaporated electroluminescent source Oct. 2, 2012
8188577 Production method of semiconductor device, semiconductor device, and exposure apparatus May. 29, 2012
8114468 Methods of forming a non-volatile resistive oxide memory array Feb. 14, 2012
8048814 Methods and apparatus for aligning a set of patterns on a silicon substrate Nov. 1, 2011
8039296 Organic thin film transistor array panel and manufacturing method thereof Oct. 18, 2011
8026606 Interconnect layers without electromigration Sep. 27, 2011
7999355 Aminosilanes for shallow trench isolation films Aug. 16, 2011
7972972 Molecular self-assembly in substrate processing Jul. 5, 2011
7973390 Modifier for low dielectric constant film, and method for production thereof Jul. 5, 2011
7964507 Flexible substrate with electronic devices formed thereon Jun. 21, 2011
7951726 Organic/inorganic hybrid thin film passivation layer for blocking moisture/oxygen transmission and improving gas barrier property May. 31, 2011
7928536 Roughness reducing film at interface, materials for forming roughness reducing film at interface, wiring layer and semiconductor device using the same, and method for manufacturing semiconduct Apr. 19, 2011
7892985 Method for porogen removal and mechanical strength enhancement of low-k carbon doped silicon oxide using low thermal budget microwave curing Feb. 22, 2011
7867920 Method for modifying high-k dielectric thin film and semiconductor device Jan. 11, 2011
7833899 Multi-layer thick metallization structure for a microelectronic device, intergrated circuit containing same, and method of manufacturing an integrated circuit containing same Nov. 16, 2010
7825042 Very low dielectric constant plasma-enhanced CVD films Nov. 2, 2010
7807560 Solder bump forming method Oct. 5, 2010
7799706 Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same Sep. 21, 2010
7759158 Scalable photovoltaic cell and solar panel manufacturing with improved wiring Jul. 20, 2010
7709371 Repairing damage to low-k dielectric materials using silylating agents May. 4, 2010
7687913 Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics Mar. 30, 2010
7678701 Flexible substrate with electronic devices formed thereon Mar. 16, 2010
7659157 Dual metal gate finFETs with single or dual high-K gate dielectric Feb. 9, 2010
7648904 Metal line in semiconductor device and method for forming the same Jan. 19, 2010
7498263 Method of planarizing an inter-metal insulation film Mar. 3, 2009
7405168 Plural treatment step process for treating dielectric films Jul. 29, 2008
7358597 UV-activated dielectric layer Apr. 15, 2008
7306969 Methods to minimize contact resistance Dec. 11, 2007
7285501 Method of forming a solution processed device Oct. 23, 2007
7244642 Method to obtain fully silicided gate electrodes Jul. 17, 2007
7224026 Nanoelectronic devices and circuits May. 29, 2007
7195936 Thin film processing method and system Mar. 27, 2007
7094661 Single and dual damascene techniques utilizing composite polymer dielectric film Aug. 22, 2006
7060323 Method of forming interlayer insulating film Jun. 13, 2006
7056825 Method for manufacturing a semiconductor device that includes plasma treating an insulating film with a mixture of helium and argon gases Jun. 6, 2006
7056837 Process of insulating a semiconductor device using a polymeric material Jun. 6, 2006
7056560 Ultra low dielectric materials based on hybrid system of linear silicon precursor and organic porogen by plasma-enhanced chemical vapor deposition (PECVD) Jun. 6, 2006
7037839 Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry May. 2, 2006
7022624 Semiconductor device and method of fabricating the same Apr. 4, 2006
7014786 Methods and apparatus for forming submicron patterns on films Mar. 21, 2006

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