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Class Information
Number: 257/E21.24
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > To form insulating layer thereon, e.g., for masking or by using photolithographic technique (epo)
Description: This subclass is indented under subclass E21.214. This subclass is substantially the same in scope as ECLA classification H01L21/31.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.266 Inorganic layer (epo) 318
257/E21.259 Organic layers, e.g., photoresist (epo) 646
257/E21.241 Post-treatment (epo) 504
257/E21.258 Using masks (epo) 455


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8691703 Method of manufacturing semiconductor device Apr. 8, 2014
8685832 Trench filling method and method of manufacturing semiconductor integrated circuit device Apr. 1, 2014
8674052 Carbazole novolak resin Mar. 18, 2014
8669191 Method for forming Ni film Mar. 11, 2014
8669619 Semiconductor structure with multi-layer contact etch stop layer structure Mar. 11, 2014
8647901 Method for forming a nitride semiconductor layer and method for separating the nitride semiconductor layer from the substrate Feb. 11, 2014
8637396 Dielectric barrier deposition using oxygen containing precursor Jan. 28, 2014
8637410 Method for metal deposition using hydrogen plasma Jan. 28, 2014
8633050 Solar cell, and method of manufacturing the same Jan. 21, 2014
8633536 Gate dielectric of semiconductor device Jan. 21, 2014
8614501 Method of producing a layer of cavities Dec. 24, 2013
8609553 Methods of forming rutile titanium dioxide and associated methods of forming semiconductor structures Dec. 17, 2013
8610208 Semiconductor device Dec. 17, 2013
8603923 Dipping solution for use in production of siliceous film and process for producing siliceous film using the dipping solution Dec. 10, 2013
8598047 Substrate processing apparatus and producing method of semiconductor device Dec. 3, 2013
8598049 Deposition method Dec. 3, 2013
8575042 Method of manufacturing semiconductor device and method of processing substrate and substrate processing apparatus Nov. 5, 2013
8563332 Wafer reclamation method and wafer reclamation apparatus Oct. 22, 2013
8563443 Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen Oct. 22, 2013
8563445 Conformal layers by radical-component CVD Oct. 22, 2013
8564104 Passivation layer structure of semiconductor device and method for forming the same Oct. 22, 2013
8557713 Semiconductor devices and method of forming the same Oct. 15, 2013
8546886 Controlling the device performance by forming a stressed backside dielectric layer Oct. 1, 2013
8536070 Vapor deposition of silicon dioxide nanolaminates Sep. 17, 2013
8536073 Hardmask materials Sep. 17, 2013
8524569 Methods of forming an isolation layer and methods of manufacturing semiconductor devices having an isolation layer Sep. 3, 2013
8507389 Methods for forming dielectric layers Aug. 13, 2013
8501633 Forming substrate structure by filling recesses with deposition material Aug. 6, 2013
8502355 Overlay vernier mask pattern, formation method thereof, semiconductor device including overlay vernier pattern, and formation method thereof Aug. 6, 2013
8486791 Mufti-layer single crystal 3D stackable memory Jul. 16, 2013
8486831 Semiconductor device manufacturing method Jul. 16, 2013
8486840 Inverse spacer processing Jul. 16, 2013
8481429 Method of manufacturing semiconductor device Jul. 9, 2013
8476170 Method of forming pattern, method of manufacturing semiconductor device, and method of manufacturing template Jul. 2, 2013
8476739 Graphene grown substrate and electronic/photonic integrated circuits using same Jul. 2, 2013
8471267 Semiconductor device and method for producing same Jun. 25, 2013
8455371 Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor Jun. 4, 2013
8435856 Floating gate flash cell device and method for partially etching silicon gate to form the same May. 7, 2013
8435882 Film forming method for a semiconductor May. 7, 2013
8420541 Method for increasing adhesion between polysilazane and silicon nitride Apr. 16, 2013
8415259 Method of depositing dielectric film by modified PEALD method Apr. 9, 2013
8410001 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus Apr. 2, 2013
8394728 Film deposition method and manufacturing method of semiconductor device Mar. 12, 2013
8389420 Method and apparatus for forming silicon oxide film Mar. 5, 2013
8383524 Semiconductor device manufacturing method Feb. 26, 2013
8361910 Pretreatment processes within a batch ALD reactor Jan. 29, 2013
8357618 Frequency doubling using a photo-resist template mask Jan. 22, 2013
8343881 Silicon dioxide layer deposited with BDEAS Jan. 1, 2013
8344474 Microstructure device including a metallization structure with self-aligned air gaps and refilled air gap exclusion zones Jan. 1, 2013
8338211 Systems and methods for charging solar cell layers Dec. 25, 2012

1 2 3 4










 
 
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