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Class Information
Number: 257/E21.235
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Using mask (epo) > Characterized by their size, orientation, disposition, behavior, shape, in horizontal or vertical plane (epo) > Characterized by process involved to create mask, e.g., lift-off mask, sidewall, or to modify the mask, e.g., pre-treatment, post-treatment (epo)
Description: This subclass is indented under subclass E21.233. This subclass is substantially the same in scope as ECLA classification H01L21/308D4.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8629064 Multiple patterning lithography using spacer and self-aligned assist patterns Jan. 14, 2014
8574971 Method of manufacturing a thin-film transistor and method of manufacturing a display substrate using the same Nov. 5, 2013
8575004 Lift-off structure for substrate of a photoelectric device and the method thereof Nov. 5, 2013
8569185 Method of fabricating gate electrode using a treated hard mask Oct. 29, 2013
8541311 Integrated circuit fabrication methods utilizing embedded hardmask layers for high resolution patterning Sep. 24, 2013
8486287 Methods for fabrication of positional and compositionally controlled nanostructures on substrate Jul. 16, 2013
8460948 Method for manufacturing liquid ejecting head Jun. 11, 2013
8461054 Method of manufacturing liquid crystal display device Jun. 11, 2013
8450214 Methods of etching single crystal silicon May. 28, 2013
8435416 Method for manufacturing porous structure and method for forming pattern May. 7, 2013
8358010 Method for realizing a nanometric circuit architecture between standard electronic components and semiconductor device obtained with said method Jan. 22, 2013
8324110 Field effect transistor (FET) and method of forming the FET without damaging the wafer surface Dec. 4, 2012
8298954 Sidewall image transfer process employing a cap material layer for a metal nitride layer Oct. 30, 2012
8212345 Holding jig, semiconductor wafer grinding method, semiconductor wafer protecting structure and semiconductor wafer grinding method and semiconductor chip fabrication method using the structure Jul. 3, 2012
8183152 Method of fabricating semiconductor device May. 22, 2012
8133804 Method and system for modifying patterned photoresist using multi-step ion implantation Mar. 13, 2012
8106470 Triple-axis MEMS accelerometer having a bottom capacitor Jan. 31, 2012
8084360 Method of manufacturing semiconductor device Dec. 27, 2011
8030222 Structures with increased photo-alignment margins Oct. 4, 2011
7947589 FinFET formation with a thermal oxide spacer hard mask formed from crystalline silicon layer May. 24, 2011
7928005 Method for forming narrow structures in a semiconductor device Apr. 19, 2011
7927991 Method for manufacturing semiconductor device Apr. 19, 2011
7927901 Method for fabricating LED chip comprising reduced mask count and lift-off processing Apr. 19, 2011
7902006 Method of manufacturing a thin film transistor array substrate Mar. 8, 2011
7875501 Holding jig, semiconductor wafer grinding method, semiconductor wafer protecting structure and semiconductor wafer grinding method and semiconductor chip fabrication method using the structure Jan. 25, 2011
7871914 Methods of fabricating semiconductor devices with enlarged recessed gate electrodes Jan. 18, 2011
7851244 Methods for forming metal layers for a MEMS device integrated circuit Dec. 14, 2010
7825484 Micromachined microphone and multisensor and method for producing same Nov. 2, 2010
7795144 Method for forming electrode structure for use in light emitting device and method for forming stacked structure Sep. 14, 2010
7781332 Methods to mitigate plasma damage in organosilicate dielectrics using a protective sidewall spacer Aug. 24, 2010
7772048 Forming semiconductor fins using a sacrificial fin Aug. 10, 2010
7767100 Patterning method and field effect transistors Aug. 3, 2010
7718081 Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes May. 18, 2010
7713882 Patterning method for a semiconductor substrate May. 11, 2010
7709341 Methods of shaping vertical single crystal silicon walls and resulting structures May. 4, 2010
7696079 Methods for patterning films, fabricating organic electroluminescence display and fabricating thin film transistor array substrate Apr. 13, 2010
7682981 Topography transfer method with aspect ratio scaling Mar. 23, 2010
7638436 Semiconductor processing methods of transferring patterns from patterned photoresists to materials Dec. 29, 2009
7598104 Method of forming a metal contact and passivation of a semiconductor feature Oct. 6, 2009
7595554 Interconnect structure with dielectric air gaps Sep. 29, 2009
7560360 Methods for enhancing trench capacitance and trench capacitor Jul. 14, 2009
7544573 Semiconductor device including MOS field effect transistor having offset spacers or gate sidewall films on either side of gate electrode and method of manufacturing the same Jun. 9, 2009
7521314 Method for selective removal of a layer Apr. 21, 2009
7521348 Method of fabricating semiconductor device having fine contact holes Apr. 21, 2009
7488673 Trench MOS Schottky barrier rectifier with high k gate dielectric and reduced mask process for the manufacture thereof Feb. 10, 2009
7470606 Masking methods Dec. 30, 2008
7432161 Fabrication of optical-quality facets vertical to a (001) orientation substrate by selective epitaxial growth Oct. 7, 2008
7348280 Method for fabricating and BEOL interconnect structures with simultaneous formation of high-k and low-k dielectric regions Mar. 25, 2008
7316784 Method of patterning transparent conductive film, thin film transistor substrate using the same and fabricating method thereof Jan. 8, 2008
7309633 Semiconductor device including MOS field effect transistor having offset spacers or gate sidewall films on either side of gate electrode and method of manufacturing the same Dec. 18, 2007

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