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Class Information
Number: 257/E21.233
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Using mask (epo) > Characterized by their size, orientation, disposition, behavior, shape, in horizontal or vertical plane (epo)
Description: This subclass is indented under subclass E21.231. This subclass is substantially the same in scope as ECLA classification H01L21/308D.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.235 Characterized by process involved to create mask, e.g., lift-off mask, sidewall, or to modify the mask, e.g., pre-treatment, post-treatment (epo) 264
257/E21.234 Characterized by their behavior during process, e.g., soluble mask, redeposited mask (epo) 88
257/E21.236 Process specially adapted to improve resolution of mask (epo) 57


Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8637407 Methods of forming fine patterns in semiconductor devices Jan. 28, 2014
8614143 Simultaneous via and trench patterning using different etch rates Dec. 24, 2013
8563443 Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen Oct. 22, 2013
8461054 Method of manufacturing liquid crystal display device Jun. 11, 2013
8431458 Methods of forming a nonvolatile memory cell and methods of forming an array of nonvolatile memory cells Apr. 30, 2013
8358010 Method for realizing a nanometric circuit architecture between standard electronic components and semiconductor device obtained with said method Jan. 22, 2013
8324111 Liquid crystal display device and method for fabricating the same Dec. 4, 2012
8304266 Manufacturing method of thin film transistor substrate of liquid crystal display panel Nov. 6, 2012
8247251 Method of fabricating light-emitting element Aug. 21, 2012
8206998 Method for manufacturing liquid discharge head Jun. 26, 2012
8198144 Pillar structure for memory device and method Jun. 12, 2012
8153522 Patterning mask and method of formation of mask using step double patterning Apr. 10, 2012
8138090 Method for forming fine patterns in semiconductor device Mar. 20, 2012
8110506 Methods of forming fine patterns in semiconductor devices Feb. 7, 2012
8062971 Dual damascene process Nov. 22, 2011
8030129 Method of fabricating nonvolatile memory device Oct. 4, 2011
7927976 Reinforced composite stamp for dry transfer printing of semiconductor elements Apr. 19, 2011
7927966 Method of manufacturing openings in a substrate, a via in substrate, and a semiconductor device comprising such a via Apr. 19, 2011
7888780 Semiconductor structures incorporating multiple crystallographic planes and methods for fabrication thereof Feb. 15, 2011
7883971 Gate structure in a trench region of a semiconductor device and method for manufacturing the same Feb. 8, 2011
7834425 Hybrid orientation SOI substrates, and method for forming the same Nov. 16, 2010
7825463 Semiconductor device having asymmetric bulb-type recess gate and method for manufacturing the same Nov. 2, 2010
7803714 Semiconductor through silicon vias of variable size and method of formation Sep. 28, 2010
7755172 Opto-electronic and electronic devices using N-face or M-plane GaN substrate prepared with ammonothermal growth Jul. 13, 2010
7749903 Gate patterning scheme with self aligned independent gate etch Jul. 6, 2010
7691688 Strained silicon CMOS on hybrid crystal orientations Apr. 6, 2010
7682981 Topography transfer method with aspect ratio scaling Mar. 23, 2010
7674667 CMOS structure including topographic active region Mar. 9, 2010
7649243 Semiconductor structures incorporating multiple crystallographic planes and methods for fabrication thereof Jan. 19, 2010
7601607 Protruded contact and insertion of inter-layer-dielectric material to match damascene hardmask to improve undercut for low-k interconnects Oct. 13, 2009
7541291 Reduction of feature critical dimensions Jun. 2, 2009
7541267 Reversed T-shaped finfet Jun. 2, 2009
7387955 Field effect transistor and method for manufacturing the same Jun. 17, 2008
7183217 Dry-etching method Feb. 27, 2007
6932916 Semiconductor substrate with trenches of varying depth Aug. 23, 2005
6927172 Process to suppress lithography at a wafer edge Aug. 9, 2005
6790781 Dual depth trench isolation Sep. 14, 2004
6770563 Process of forming a bottle-shaped trench Aug. 3, 2004
6723617 Method of manufacturing a semiconductor device Apr. 20, 2004
6709881 Method for manufacturing semiconductor and method for manufacturing semiconductor device Mar. 23, 2004
6670275 Method of rounding a topcorner of trench Dec. 30, 2003
6582889 Method for forming resist pattern and manufacturing method of thin-film element Jun. 24, 2003
6583060 Dual depth trench isolation Jun. 24, 2003
6579801 Method for enhancing shallow trench top corner rounding using endpoint control of nitride layer etch process with appropriate etch front Jun. 17, 2003
6576952 Trench DMOS structure with peripheral trench with no source regions Jun. 10, 2003
6566235 Process for producing semiconductor member, and process for producing solar cell May. 20, 2003
6555895 Devices and methods for addressing optical edge effects in connection with etched trenches Apr. 29, 2003
6479395 Methods for forming openings in a substrate and apparatuses with these openings and methods for creating assemblies with openings Nov. 12, 2002
6475919 Method for producing trenches for DRAM cell configurations Nov. 5, 2002
6475884 Devices and methods for addressing optical edge effects in connection with etched trenches Nov. 5, 2002

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