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Class Information
Number: 257/E21.232
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Using mask (epo) > Characterized by their composition, e.g., multilayer masks, materials (epo)
Description: This subclass is indented under subclass E21.231. This subclass is substantially the same in scope as ECLA classification H01L21/308B.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8679883 Method of separating nitride films from growth substrates by selective photo-enhanced wet oxidation and associated semiconductor structure Mar. 25, 2014
8637403 Locally tailoring chemical mechanical polishing (CMP) polish rate for dielectrics Jan. 28, 2014
8603921 Maintaining mask integrity to form openings in wafers Dec. 10, 2013
8563433 Process to form via hole in semiconductor wafer Oct. 22, 2013
8563371 Method of forming semiconductor device Oct. 22, 2013
8551846 Methods for fabricating semiconductor devices Oct. 8, 2013
8551883 Masking method Oct. 8, 2013
8497180 Transistor with boot shaped source/drain regions Jul. 30, 2013
8492259 Method of forming metal gate structure Jul. 23, 2013
8486741 Process for etching trenches in an integrated optical device Jul. 16, 2013
8486840 Inverse spacer processing Jul. 16, 2013
8481353 Method of separating nitride films from the growth substrates by selective photo-enhanced wet oxidation Jul. 9, 2013
8367446 Method for preparing patterned substrate by using nano- or micro- particles Feb. 5, 2013
8273666 Process to fabricate bottom electrode for MRAM device Sep. 25, 2012
8268712 Method of forming metal gate structure and method of forming metal gate transistor Sep. 18, 2012
8241973 Method for increasing penetration depth of drain and source implantation species for a given gate height Aug. 14, 2012
8173472 Semiconductor sensor and manufacturing method of sensor body for semiconductor sensor May. 8, 2012
8062971 Dual damascene process Nov. 22, 2011
7977141 Solid-state image pickup device and method of manufacturing the same Jul. 12, 2011
7951720 Method of forming a contact hole for a semiconductor device May. 31, 2011
7927897 Photoresist composition and method of manufacturing array substrate using the same Apr. 19, 2011
7902006 Method of manufacturing a thin film transistor array substrate Mar. 8, 2011
7858458 CMOS fabrication Dec. 28, 2010
7846844 Method for fabricating saddle type fin transistor Dec. 7, 2010
7838436 Bottom electrode for MRAM device and method to fabricate it Nov. 23, 2010
7821044 Transistor with improved tip profile and method of manufacture thereof Oct. 26, 2010
7759257 Precision synthesis of quantum dot nanostructures for fluorescent and optoelectronic devices Jul. 20, 2010
7754591 Method for forming fine pattern of semiconductor device Jul. 13, 2010
7749903 Gate patterning scheme with self aligned independent gate etch Jul. 6, 2010
7749864 Semiconductor device with a thinned semiconductor chip and method for producing the thinned semiconductor chip Jul. 6, 2010
7727797 Method for manufacturing organic thin film transistor substrate Jun. 1, 2010
7723230 Method for manufacturing semiconductor device and method for designing photomask pattern May. 25, 2010
7718081 Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes May. 18, 2010
7713755 Field angle sensor fabricated using reactive ion etching May. 11, 2010
7670925 Semiconductor device, method of manufacturing same, and apparatus for designing same Mar. 2, 2010
7655568 Method for manufacturing underlying pattern of semiconductor device Feb. 2, 2010
7638369 Semiconductor chip and method of fabricating the same Dec. 29, 2009
7629263 Semiconductor sensor production method and semiconductor sensor Dec. 8, 2009
7569913 Boron etch-stop layer and methods related thereto Aug. 4, 2009
7534727 Method for manufacturing semiconductor device May. 19, 2009
7534672 Tiered gate device with source and drain extensions May. 19, 2009
7495266 Strained silicon-on-silicon by wafer bonding and layer transfer Feb. 24, 2009
7494858 Transistor with improved tip profile and method of manufacture thereof Feb. 24, 2009
7482178 Chamber stability monitoring using an integrated metrology tool Jan. 27, 2009
7479433 Method for manufacturing semiconductor device Jan. 20, 2009
7462566 Method for manufacturing semiconductor device Dec. 9, 2008
7419581 Method for producing optically transparent regions in a silicon substrate Sep. 2, 2008
7378738 Method for producing self-aligned mask, articles produced by same and composition for same May. 27, 2008
7358102 Method for fabricating microelectromechanical optical display devices Apr. 15, 2008
7319073 Method of reducing silicon damage around laser marking region of wafers in STI CMP process Jan. 15, 2008

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