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Class Information
Number: 257/E21.231
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Using mask (epo)
Description: This subclass is indented under subclass E21.215. This subclass is substantially the same in scope as ECLA classification H01L21/308.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.232 Characterized by their composition, e.g., multilayer masks, materials (epo) 322
257/E21.233 Characterized by their size, orientation, disposition, behavior, shape, in horizontal or vertical plane (epo) 120


Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8703616 Method for adjusting feature size and position Apr. 22, 2014
8679922 Method of producing semiconductor device and method of producing solid-state image pickup device Mar. 25, 2014
8673780 Methods of processing semiconductor substrates in forming scribe line alignment marks Mar. 18, 2014
8647896 Process for producing a substrate for a liquid ejection head Feb. 11, 2014
8633116 Dry etching method Jan. 21, 2014
8598037 Silicon etch with passivation using plasma enhanced oxidation Dec. 3, 2013
8574942 Method of forming silicon nanowires and method of fabricating lithium secondary battery using the same Nov. 5, 2013
8574926 Magnetic memory and manufacturing method thereof Nov. 5, 2013
8569821 Semiconductor devices and methods of forming the same Oct. 29, 2013
8563373 Semiconductor device having vertical channels and method of manufacturing the same Oct. 22, 2013
8557661 Methods of manufacturing a semiconductor device and a semiconductor memory device thereby Oct. 15, 2013
8551836 Semiconductor device and method of manufacturing the same Oct. 8, 2013
8546258 Method of fabricating metal contact using double patterning technology and device formed thereby Oct. 1, 2013
8530932 Replacement spacer for tunnel FETS Sep. 10, 2013
8518835 Methods of utilizing block copolymers to form patterns Aug. 27, 2013
8513717 Semiconductor device and method for manufacturing the same Aug. 20, 2013
8466064 Semiconductor integrated circuit device and method of manufacturing a semiconductor integrated circuit device Jun. 18, 2013
8466069 Method for manufacturing semiconductor device Jun. 18, 2013
8461050 Taper-etching method and method of manufacturing near-field light generator Jun. 11, 2013
8450213 Forming a membrane having curved features May. 28, 2013
8450122 Test structures and methods May. 28, 2013
8440536 Mask layout and method for forming vertical channel transistor in semiconductor device using the same May. 14, 2013
8441085 Method of manufacturing electronic apparatus and electronic apparatus May. 14, 2013
8426287 Method of manufacturing semiconductor device, solid-state imaging device, and solid-state imaging apparatus Apr. 23, 2013
8415805 Etched wafers and methods of forming the same Apr. 9, 2013
8409994 Gate trim process using either wet etch or dry etch approach to target CD for selected transistors Apr. 2, 2013
8409982 Method of forming solid blind vias through the dielectric coating on high density interconnect (HDI) substrate materials Apr. 2, 2013
8405185 Semiconductor device and semiconductor module including the same Mar. 26, 2013
8395213 Strained semiconductor using elastic edge relaxation of a stressor combined with buried insulating layer Mar. 12, 2013
8383522 Micro pattern forming method Feb. 26, 2013
8354323 Doped graphene electronic materials Jan. 15, 2013
8349741 Amorphous carbon deposition method for improved stack defectivity Jan. 8, 2013
8324111 Liquid crystal display device and method for fabricating the same Dec. 4, 2012
8309373 Method of manufacturing semiconductor device Nov. 13, 2012
8298879 Methods of fabricating metal oxide or metal oxynitride TFTS using wet process for source-drain metal etch Oct. 30, 2012
8268732 Methods of utilizing block copolymers to form patterns Sep. 18, 2012
8252693 Self-alignment for semiconductor patterns Aug. 28, 2012
8241923 Method for correcting mask pattern and method for manufacturing acceleration sensor and angular velocity sensor by using the method for correcting the mask pattern Aug. 14, 2012
8232152 Removing method of a hard mask Jul. 31, 2012
8227352 Amorphous carbon deposition method for improved stack defectivity Jul. 24, 2012
8222148 Method of manufacturing a semiconductor device Jul. 17, 2012
8211803 Spacer process for on pitch contacts and related structures Jul. 3, 2012
8178400 Replacement spacer for tunnel FETs May. 15, 2012
8159039 Superjunction device having a dielectric termination and methods for manufacturing the device Apr. 17, 2012
8153522 Patterning mask and method of formation of mask using step double patterning Apr. 10, 2012
8138097 Method for processing semiconductor structure and device based on the same Mar. 20, 2012
8101507 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus Jan. 24, 2012
8084832 Semiconductor device Dec. 27, 2011
8048787 Methods of forming semiconductor devices Nov. 1, 2011
8048810 Method for metal gate N/P patterning Nov. 1, 2011

1 2 3 4 5










 
 
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