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Class Information
Number: 257/E21.226
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Chemical cleaning (epo) > Dry cleaning (epo)
Description: This subclass is indented under subclass E21.224. This subclass is substantially the same in scope as ECLA classification H01L21/306N2.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.227 With gaseous hydrogen fluoride (hf) (epo) 125

Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
6715497 Treatment to eliminate polysilicon defects induced by metallic contaminants Apr. 6, 2004
6713401 Method for manufacturing semiconductor device Mar. 30, 2004
6714300 Optical inspection equipment for semiconductor wafers with precleaning Mar. 30, 2004
6706334 Processing method and apparatus for removing oxide film Mar. 16, 2004
6706630 Method for forming an alloyed metal conductive element of an integrated circuit Mar. 16, 2004
6700202 Semiconductor device having reduced oxidation interface Mar. 2, 2004
6692579 Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence Feb. 17, 2004
6676764 Method for cleaning a substrate in selective epitaxial growth process Jan. 13, 2004
6677247 Method of increasing the etch selectivity of a contact sidewall to a preclean etchant Jan. 13, 2004
6676800 Particle contamination cleaning from substrates using plasmas, reactive gases, and mechanical agitation Jan. 13, 2004
6667244 Method for etching sidewall polymer and other residues from the surface of semiconductor devices Dec. 23, 2003
6664179 Semiconductor device production method and semiconductor device production apparatus Dec. 16, 2003
6663792 Equipment for UV wafer heating and photochemistry Dec. 16, 2003
6645852 Process for fabricating a semiconductor device having recess portion Nov. 11, 2003
6642153 Method for avoiding unetched polymer residue in anisotropically etched semiconductor features Nov. 4, 2003
6638855 Method of filling contact hole of semiconductor device Oct. 28, 2003
6630399 Titanium disilicide resistance in pinched active regions of semiconductor devices Oct. 7, 2003
6629538 Method for cleaning semiconductor wafers in a vacuum environment Oct. 7, 2003
6620251 Substrate processing method and substrate processing apparatus Sep. 16, 2003
6593282 Cleaning solutions for semiconductor substrates after polishing of copper film Jul. 15, 2003
6588437 System and method for removal of material Jul. 8, 2003
6589356 Method for cleaning a silicon-based substrate without NH4OH vapor damage Jul. 8, 2003
6586333 Integrated plasma treatment and nickel deposition and tool for performing same Jul. 1, 2003
6579807 Method for forming isolation regions on semiconductor device Jun. 17, 2003
6580104 Elimination of contaminants prior to epitaxy and related structure Jun. 17, 2003
6573181 Method of forming contact structures using nitrogen trifluoride preclean etch process and a titanium chemical vapor deposition step Jun. 3, 2003
6568408 Method and apparatus for removing a liquid from a surface of a rotating substrate May. 27, 2003
6569768 Surface treatment and capping layer process for producing a copper interface in a semiconductor device May. 27, 2003
6566271 Method of producing a semiconductor surface covered with fluorine May. 20, 2003
6562720 Apparatus and method for surface finishing a silicon film May. 13, 2003
6554950 Method and apparatus for removal of surface contaminants from substrates in vacuum applications Apr. 29, 2003
6551939 Plasma surface treatment method and resulting device Apr. 22, 2003
6551409 Method for removing organic contaminants from a semiconductor surface Apr. 22, 2003
6541434 Cleaning solution for semiconductor surfaces following chemical-mechanical polishing Apr. 1, 2003
6537876 Method of manufacturing a semiconductor capacitor having a hemispherical grain layer using a dry cleaning process Mar. 25, 2003
6534415 Method of removing polymer residues after tungsten etch back Mar. 18, 2003
6534412 Method for removing native oxide Mar. 18, 2003
6526997 Dry cleaning method for the manufacture of integrated circuits Mar. 4, 2003
6513538 Method of removing contaminants from integrated circuit substrates using cleaning solutions Feb. 4, 2003
6514886 Method for elimination of contaminants prior to epitaxy Feb. 4, 2003
6507031 Apparatus and method of irradiating ultraviolet light Jan. 14, 2003
6500766 Post-cleaning method of a via etching process Dec. 31, 2002
6500268 Dry cleaning method Dec. 31, 2002
6500605 Removal of photoresist and residue from substrate using supercritical carbon dioxide process Dec. 31, 2002
6494959 Process and apparatus for cleaning a silicon surface Dec. 17, 2002
6491764 Method and apparatus for removing a liquid from a surface of a rotating substrate Dec. 10, 2002
6489590 Laser removal of foreign materials from surfaces Dec. 3, 2002
6489241 Apparatus and method for surface finishing a silicon film Dec. 3, 2002
6479397 Method for forming isolation regions on semiconductor device Nov. 12, 2002

1 2 3 4 5 6 7 8

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