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Class Information
Number: 257/E21.226
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Chemical cleaning (epo) > Dry cleaning (epo)
Description: This subclass is indented under subclass E21.224. This subclass is substantially the same in scope as ECLA classification H01L21/306N2.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7582536 |
Electronic device with reduced interface charge between epitaxially grown layers and a method for making the same |
Sep. 1, 2009 |
| 7566662 |
Method of dry cleaning silicon surface prior to forming self-aligned nickel silicide layer |
Jul. 28, 2009 |
| 7544603 |
Method of fabricating silicon nitride layer and method of fabricating semiconductor device |
Jun. 9, 2009 |
| 7524769 |
Method and system for removing an oxide from a substrate |
Apr. 28, 2009 |
| 7514357 |
Method of manufacturing a semiconductor device |
Apr. 7, 2009 |
| 7504267 |
Apparatus and method for cleaning glass substrates using a cool hydrogen flame |
Mar. 17, 2009 |
| 7479416 |
Thin film transistor array panel and manufacturing method thereof |
Jan. 20, 2009 |
| 7476609 |
Forming of a cavity in an insulating layer |
Jan. 13, 2009 |
| 7452810 |
Method of forming a barrier layer of a semiconductor device |
Nov. 18, 2008 |
| 7452822 |
Via plug formation in dual damascene process |
Nov. 18, 2008 |
| 7442639 |
Method of forming plug of semiconductor device |
Oct. 28, 2008 |
| 7432208 |
Method of manufacturing suspension structure |
Oct. 7, 2008 |
| 7393784 |
Method of manufacturing suspension structure and chamber |
Jul. 1, 2008 |
| 7342290 |
Semiconductor metal contamination reduction for ultra-thin gate dielectrics |
Mar. 11, 2008 |
| 7335521 |
Method for the production of multilayer discs |
Feb. 26, 2008 |
| 7276447 |
Plasma dielectric etch process including ex-situ backside polymer removal for low-dielectric constant material |
Oct. 2, 2007 |
| 7208428 |
Method and apparatus for treating article to be treated |
Apr. 24, 2007 |
| 7169704 |
Method of cleaning a surface of a water in connection with forming a barrier layer of a semiconductor device |
Jan. 30, 2007 |
| 7071095 |
Barrier metal re-distribution process for resistivity reduction |
Jul. 4, 2006 |
| 7067399 |
Method and apparatus for removal of surface contaminants from substrates in vacuum applications |
Jun. 27, 2006 |
| 7067433 |
Method to reduce the fluorine contamination on the Al/Al-Cu pad by a post high cathod temperature plasma treatment |
Jun. 27, 2006 |
| 7055532 |
Method to remove fluorine residue from bond pads |
Jun. 6, 2006 |
| 7056809 |
Method for ion treating a semiconductor material for subsequent bonding |
Jun. 6, 2006 |
| 7018929 |
Method for reducing a low volatility byproduct from a wafer surface following an etching process |
Mar. 28, 2006 |
| 7018925 |
Post high voltage gate oxide pattern high-vacuum outgas surface treatment |
Mar. 28, 2006 |
| 6992011 |
Method and apparatus for removing material from chamber and wafer surfaces by high temperature hydrogen-containing plasma |
Jan. 31, 2006 |
| 6979611 |
Method for fabricating semiconductor device |
Dec. 27, 2005 |
| 6979633 |
Method of manufacturing semiconductor device |
Dec. 27, 2005 |
| 6977229 |
Manufacturing method for semiconductor devices |
Dec. 20, 2005 |
| 6958286 |
Method of preventing surface roughening during hydrogen prebake of SiGe substrates |
Oct. 25, 2005 |
| 6949472 |
Method for high kinetic energy plasma barrier deposition |
Sep. 27, 2005 |
| 6946401 |
Plasma treatment for copper oxide reduction |
Sep. 20, 2005 |
| 6933228 |
Method of manufacturing of contact plug in a contact hole on a silicon substrate |
Aug. 23, 2005 |
| 6930771 |
Optical inspection equipment for semiconductor wafers with precleaning |
Aug. 16, 2005 |
| 6927198 |
Methods and apparatus for cleaning semiconductor substrates after polishing of copper film |
Aug. 9, 2005 |
| 6924239 |
Method for removal of hydrocarbon contamination on gate oxide prior to non-thermal nitridation using "spike" radical oxidation |
Aug. 2, 2005 |
| 6913654 |
Method for the removal of airborne molecular contaminants using water gas mixtures |
Jul. 5, 2005 |
| 6908567 |
Contaminant removal by laser-accelerated fluid |
Jun. 21, 2005 |
| 6894294 |
System and method for reducing charged particle contamination |
May. 17, 2005 |
| 6890859 |
Methods of forming semiconductor structures having reduced defects, and articles and devices formed thereby |
May. 10, 2005 |
| 6887794 |
Pre-cleaning method of substrate for semiconductor device |
May. 3, 2005 |
| 6869500 |
Method for processing a wafer and apparatus for performing the same |
Mar. 22, 2005 |
| 6867147 |
Method of surface treatment of semiconductor |
Mar. 15, 2005 |
| 6858503 |
Depletion to avoid cross contamination |
Feb. 22, 2005 |
| 6855207 |
Apparatus and system for eliminating contaminants on a substrate surface |
Feb. 15, 2005 |
| 6852242 |
Cleaning of multicompositional etchant residues |
Feb. 8, 2005 |
| 6848454 |
Method of manufacturing semiconductor device |
Feb. 1, 2005 |
| 6840249 |
Method for cleaning a semiconductor device |
Jan. 11, 2005 |
| 6838396 |
Bilayer ultra-thin gate dielectric and process for semiconductor metal contamination reduction |
Jan. 4, 2005 |
| 6837963 |
Semiconductor device, method of producing a semiconductor device, and semiconductor substrate cleaning apparatus used for the production method |
Jan. 4, 2005 |
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