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Class Information
Number: 257/E21.224
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of semiconductor device (epo) > Device having at least one potential-jump barrier or surface barrier, e.g., pn junction, depletion layer, carrier concentration layer (epo) > Device having semiconductor body comprising group iv elements or group iii-v compounds with or without impurities, e.g., doping materials (epo) > Treatment of semiconductor body using process other than deposition of semiconductor material on a substrate, diffusion or alloying of impurity material, or radiation treatment (epo) > To change their surface-physical characteristics or shape, e.g., etching, polishing, cutting (epo) > Chemical or electrical treatment, e.g., electrolytic etching (epo) > Chemical cleaning (epo)
Description: This subclass is indented under subclass E21.215. This subclass is substantially the same in scope as ECLA classification H01L21/306N.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.225 Cleaning diamond or graphite (epo) 4
257/E21.229 Combining dry and wet cleaning steps (epo) 308
257/E21.226 Dry cleaning (epo) 377
257/E21.228 Wet cleaning only (epo) 878

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8703605 High yield and high throughput method for the manufacture of integrated circuit devices of improved integrity, performance and reliability Apr. 22, 2014
8647439 Method of epitaxial germanium tin alloy surface preparation Feb. 11, 2014
8569877 Metallic solderability preservation coating on metal part of semiconductor package to prevent oxide Oct. 29, 2013
8557705 Method of manufacturing semiconductor device and apparatus for manufacturing semiconductor device Oct. 15, 2013
8545640 Substrate processing method, storage medium storing computer program for performing substrate processing method, and substrate processing apparatus Oct. 1, 2013
8440517 FinFET and method of fabricating the same May. 14, 2013
8431443 Metallic solderability preservation coating on metal part of semiconductor package to prevent oxide Apr. 30, 2013
8367476 Metallic solderability preservation coating on metal part of semiconductor package to prevent oxide Feb. 5, 2013
8309472 Method of rapid thermal treatment using high energy electromagnetic radiation of a semiconductor substrate for formation of epitaxial materials Nov. 13, 2012
8277570 Method of preventing premature drying Oct. 2, 2012
8278186 Wafer cleaning method and wafer bonding method using the same Oct. 2, 2012
8268726 Method for fabricating semiconductor device Sep. 18, 2012
8268085 Methods for forming metal gate transistors Sep. 18, 2012
8268675 Passivation layer for semiconductor device packaging Sep. 18, 2012
8222136 Method of forming contacts for a semiconductor device Jul. 17, 2012
8207060 High yield and high throughput method for the manufacture of integrated circuit devices of improved integrity, performance and reliability Jun. 26, 2012
8183158 Semiconductor processing apparatus and method for using same May. 22, 2012
8153527 Method for reducing sidewall etch residue Apr. 10, 2012
8148272 Application of millisecond heating source for surface treatment Apr. 3, 2012
8138101 Manufacturing method for semiconductor device Mar. 20, 2012
8114739 Semiconductor device with oxygen-diffusion barrier layer and method for fabricating same Feb. 14, 2012
8076219 Reduction of watermarks in HF treatments of semiconducting substrates Dec. 13, 2011
8071480 Method and apparatuses for removing polysilicon from semiconductor workpieces Dec. 6, 2011
8058174 Method for treating semiconductor processing components and components formed thereby Nov. 15, 2011
7994066 Si surface cleaning for semiconductor circuits Aug. 9, 2011
7968506 Wet cleaning stripping of etch residue after trench and via opening formation in dual damascene process Jun. 28, 2011
7955440 Method for cleaning silicon wafer and apparatus for cleaning the silicon wafer Jun. 7, 2011
7951695 Method for reducing plasma discharge damage during processing May. 31, 2011
7871935 Non-plasma capping layer for interconnect applications Jan. 18, 2011
7846845 Integrated method for removal of halogen residues from etched substrates in a processing system Dec. 7, 2010
7838431 Method for surface treatment of semiconductor substrates Nov. 23, 2010
7829475 Baking method of quartz products, computer program and storage medium Nov. 9, 2010
7790583 Clean process for an electron beam source Sep. 7, 2010
7786013 Method of fabricating semiconductor device Aug. 31, 2010
7776757 Method of fabricating high-k metal gate devices Aug. 17, 2010
7767585 Method of cleaning and process for producing semiconductor device Aug. 3, 2010
7754612 Methods and apparatuses for removing polysilicon from semiconductor workpieces Jul. 13, 2010
7745337 Method of optimizing sidewall spacer size for silicide proximity with in-situ clean Jun. 29, 2010
7662727 Method for manufacturing semiconductor device background Feb. 16, 2010
7645695 Method of manufacturing a semiconductor element Jan. 12, 2010
7635601 Method of manufacturing semiconductor device and cleaning apparatus Dec. 22, 2009
7611918 CMOS image sensor and method for fabricating the same Nov. 3, 2009
7592267 Method for manufacturing semiconductor silicon substrate and apparatus for manufacturing the same Sep. 22, 2009
7560369 Method of forming metal line in semiconductor device Jul. 14, 2009
7524705 Method for manufacturing a semiconductor substrate and method for manufacturing a semiconductor device Apr. 28, 2009
7510967 Method for manufacturing semiconductor device Mar. 31, 2009
7479460 Silicon surface preparation Jan. 20, 2009
7432137 Method of manufacturing thin film transistor Oct. 7, 2008
7399708 Method of treating a composite spin-on glass/anti-reflective material prior to cleaning Jul. 15, 2008
7368381 Methods of forming materials May. 6, 2008

1 2 3

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